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超薄含氮氧化層創新製程技術應用在n型金氧半場效電晶體之特性研究

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New Advanced Process of Ultrathin Oxynitride

on the Characteristics of nMOSFET

(2)

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New Advanced Process of Ultrathin Oxynitride

on the Characteristics of nMOSFET

Student

Chien-Hung Yeh

Advisor

Dr. Chin-Fa Yeh

Dr. Jen-Chung Lou

A Thesis

Submitted to Department of Electronics Engineering & Institute of Electronics Engineering and Computer Science

National Chiao-Tung University in partial Fulfillment of the Requirements

for the Degree of Master of Science in

Electronics Engineering June 2007

Hsinchu, Taiwan, Republic of China

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