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New Advanced Process of Ultrathin Oxynitride
on the Characteristics of nMOSFET
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New Advanced Process of Ultrathin Oxynitride
on the Characteristics of nMOSFET
Student
Chien-Hung Yeh
Advisor
Dr. Chin-Fa Yeh
Dr. Jen-Chung Lou
A Thesis
Submitted to Department of Electronics Engineering & Institute of Electronics Engineering and Computer Science
National Chiao-Tung University in partial Fulfillment of the Requirements
for the Degree of Master of Science in
Electronics Engineering June 2007
Hsinchu, Taiwan, Republic of China