• 沒有找到結果。

A linear programming model for the control wafers downgrading problem

N/A
N/A
Protected

Academic year: 2021

Share "A linear programming model for the control wafers downgrading problem"

Copied!
8
0
0

加載中.... (立即查看全文)

全文

(1)

DOI 10.1007/s00170-003-1854-0 O R I G I N A L A R T I C L E

Shu-Hsing Chung · W.L. Pearn · He-Yau Kang

A linear programming model for the control wafers downgrading problem

Received: 17 March 2003 / Accepted: 30 June 2003 / Published online: 16 June 2004 Springer-Verlag London Limited 2004

Abstract This paper considers the control wafers downgrad-ing problem (CWDP) in the wafer fabrication photolithography area. The objective of the research is to minimize the total cost of control wafers, while maintaining the same level of production throughput. For the problem under a pulling control production environment, a linear programming model is presented to set the supply rate of new control wafers and the recycle and down-grading rates so as to minimize the total cost of control wafers. A numerical example is given to illustrate the practicality of the model. The sensitivity of the linear programming model solution to changes in the underlying parameter values is also investi-gated. The results demonstrate that the proposed model is an effective tool for determining the control wafers downgrading policy.

This paper presents a linear programming model that consid-ers the cost of new control wafconsid-ers, recycle and downgrading con-trol wafers in wafer fabrication. The proposed model improved the performance of control wafers management, and served as the basis for setting the usage rates of control wafers.

Keywords Control wafers· Downgrading · Linear programming model· Performance · Pull control

List of symbols

TRn The actual process quantity of product n

R The system throughput quantity in a planning period πn The product mix ratio for product n among all products γ The average rework rate in the system

S The set of product types

TCn j The number of times of using the jth grade control wafers in the process of product type n

PCn jThe expected amount of the jth grade control wafers needed in the process of product type n

S.-H. Chung (u) · W.L. Pearn · H.-Y. Kang Department of Industrial Engineering and Management, National Chiao Tung University,

Hsin-Chu, Taiwan, R.O.C. E-mail: t7533@cc.nctu.edu.tw

PT The length of planning period

j The sequencing grade numbering for control wafers Z The total cost of control wafers

A0 j The supply of new control wafers per day c0 j The new control wafers cost per unit cjj The recycle cost in loop j per unit

cij The downgrading cost from loop i to loop j per unit λj The supply rate of control wafers per day

dj The demand of control wafers per day Pjj The recycle ratio

Pij The downgrading ratio PjD The discard ratio

Prj The maximum recycle ratio Pdj The minimum discard ratio

1 Introduction

Control (monitor) wafers are employed for monitoring machine parameters including a series of precision parameters for the pro-duction processes in semiconductor wafer fabrication, and for maintaining manufacturing conditions. Control wafers are not only used to control the machine manufacturing capability, but also to increase the process yield. Each grade of control wafers is repeated for use in the same process until being downgraded or discarded. Any shortage of control wafers may result in a halt of machine operations and as a result may seriously affect the process yield and production planning. To avoid such situations from occurring, a large number of control wafers are usually prepared and stored for use. Consequently, it unnecessarily in-creases the work-in-process (WIP) level of control wafers. In order to simplify the development of an effective management system, we shall restrict our investigation of control wafers to the photolithography area of the wafer fabrication. In addition, the purpose of this research is to determine the minimum total cost of control wafers and to set the new supply rate of control wafers and the recycle and downgrading rates in each grade.

(2)

The rates calculated above can be used as target values for management. In practice, if the rates obtained in the floor are higher than the target values, a production planner can lower the usage rates to meet the target and to minimize the cost. On the other hand, if the actual rates are lower than the target rates, a production planner needs to consider the quality of raw control wafers and monitor the recycle process in order to increase the usage rates to meet the target. If relevant costs change as a result, target values must be recalculated.

For most factories, the WIP level of control wafers are set to 30%–50% of that for normal products [1]. An increase of the current control wafers level would result in an increase in the holding cost but with a decrease in the shortage cost. Therefore, a tradeoff must be made. Most common decisions in current in-dustrial practice often result in maintaining each grade of control wafer at its maximum service level. How to determine the man-agement parameters of control wafers for each grade is import-ant to performance measure for the control wafers downgrading problem (CWDP).

Spearman et al [2] first introduced the concept of the push system and developed the CONWIP pull system. They pointed out that CONWIP system is a suitable pull system in many dynamic environments. Chen and Lee [3] investigated the ef-fect of control/dummy (C/D) wafers with downgrading features on the push and the pull systems. Their result indicated that the pull system is preferable if the machine delay time is the primary concern, whereas the push system leads to better uti-lization of C/D wafers, and hence can significantly lower C/D wafer WIP level. Chung et al. [4] suggested a due date assign-ment model of fabs and discussed flow time control param-eters for performance evaluation. Kroese and Nicola [5] pro-posed a two-node tandem Jackson network model, and con-ducted a simulation study on the arrival and service parameters to estimate the overflow probability in the second buffer. Ku-mar and KuKu-mar [6] introduced the application of queuing net-work models to design and analyze semiconductor wafer fabs. They surveyed some of the sequencing rules and released poli-cies used in semiconductor manufacturing. Lin [1] studied the effectiveness of C/D wafers management system with repeated use policy in the furnace area using the pull system. They have assumed, however, that the distribution of C/D wafers qual-ity approximately follows a discrete uniform distribution, and developed a method to obtain the optimal WIP level of C/D wafers.

The purpose of this paper is to obtain the minimum total cost of control wafers. Under the production control of a pulling system, a linear programming model, which considers the inven-tory level to set the control wafers supply rate for each grade, is proposed.

The remainder of this paper is organized as follows. Section 2 introduces the control wafers loop system. Section 3 describes the construction of the linear programming model. In Sect. 4, a numerical example is investigated using the proposed linear programming model. The results are analyzed to show the ef-fectiveness of the proposed model. In Sect. 5, some concluding remarks are made.

2 An overview of the control loop system

In the wafer fabrication photolithography field, control wafers are utilized for monitoring and measuring the particle content, measuring photo-resistant coat thickness and uniformity, check-ing critical dimension, examincheck-ing alignment and inspectcheck-ing ex-posure [7]. The diagram of the operation of control wafers is depicted in Fig. 1. The use of control wafers can assure that the manufacturing process operations in photolithography satisfy the required manufacturing specifications. The control wafers are re-peatedly used until their immaculacy and thickness no longer conform to the process requirement. After passing through the in-use stage, the surface of control wafers will be contaminated or damaged. If the contamination of control wafers is too serious that they cannot recover from their clarity, the reuse of control wafers will further contaminate the clarity of machines and will no longer accomplish the function of monitoring. Therefore, for control wafers that do not conform to the process requirements, they are downgraded or discarded. To avoid contamination to the factory machines due to misusing control wafers, managers often apply a control wafers supply rule to different machines accord-ing to the requirement of processaccord-ing circumstances, such as the required immaculacy degree. In this paper, we will base the sur-face condition on the control wafers to judge whether the control wafers should be recycled, downgraded or discarded. The im-maculacy degree is set to be grade one if the particle number is less than 1 in 1 m3, grade two if less than 10 in 1 m3, grade three if less than 100 in 1 m3, and grade four if less than 1000 in 1 m3. The process of control wafers in a photolithography machine is similar to that of normal products, and the main purpose of control wafers is to test and monitor relevant process

(3)

ters. If the observed parameters conform to the parameter setting, products can be processed. On the other hand, if the observed pa-rameters no longer conform to the setting, fab papa-rameters must be adjusted first. The process of control wafers is shown in Fig. 2. In a typical photolithography machine, ultraviolet (UV) light from a light source passes through lenses and refracts to masks. UV light next passes through the masks and onto the wafer stage, while control wafers are put on the wafer stage to examine the relevant parameters of the process.

The loop system concept may be conveniently applied to illustrate the PUR process of control wafers, and is largely em-ployed in manufacturing systems, and computer/communication networks. The loop system and analysis presented here were originally developed by Jackson [8], and a tandem Jackson re-lated network model was developed by Kroese and Nicola [5]. In general, the reuse status of control wafers can be divided into (1) pre-disposition, (2) in-use, and (3) recycle [3]. This is termed the PUR process. The in-use control wafers in the photolithog-raphy area provide functions for product monitoring, equipment monitoring, breakdown and recovery monitoring, and preventive maintenance [1]. Control wafers can be categorized into several grades depending on their quality, that is, the amount of particle content on them.

Fig. 2. A simple typical diagram of a control wafer’s position in a machine

Fig. 3. The multiple loop control wafers system

The diagram of multi-loop control wafers system is depicted in Fig. 3. In Fig. 3, loop 0 contains new control wafers, loop D is the discard wafers collection, and A0 jis the new wafers supply rate to each loop j. Each loop j can be considered as a neu-ron, and the jth loop can be considered as the jth grade of the control wafers process. The demand rate of jth grade control wafers is dj, the recycle rate is Pjj, the downgrading rate is Pij (for i< j), the discard rate is PjD, and the supply rate isλj. Be-cause control wafers are used during the fabrication of regular products, certain amount of control wafers must be consumed each time the normal wafer products are produced. Therefore, the demand of control wafers is closely related to the system throughput, product mix ratio , and expected depletion amount of the jth grade control wafers.

The model developed here is based on the following assumptions:

1. The monthly throughput target is known 2. The product mix is known

3. The control wafers demand is spread evenly throughout the planning period so that the demand rate is reasonably constant

4. A shortage of control wafers is not allowed

5. Each PUR process consists of three stages of operation 6. The control wafers are classified into c grades

7. The maximum recycle ratio of control wafers for each grade is known

8. The minimum discard ratio of control wafers for each grade is known

3 A linear programming model

In the following, we develop a linear programming model to de-termine the supply rate, the recycle rate, and the downgrading rate for each grade of control wafer. The proposed model can be divided into three phases: (1) Calculating control wafers de-mand rate, (2) Analyzing control wafers supply rate and cost, and (3) Formulating the control wafers downgrading problem. The demand for each grade of control wafers depends on the

(4)

through-put target, the product mix ratio of normal products, and the rework of the workstation that processes control wafers.

A multi-loop system shall supply new control wafers when the total quantity of the recycle control wafers and the down-grading control wafers are insufficient in the loop. Under the minimum discard ratio, the supply rate is equal to the demand rate, and we can calculate the supply rate of new control wafers, the recycle rate and the downgrading rate for each grade of con-trol wafers. The total cost of concon-trol wafers for each grade is calculated by adding the costs of new control wafers, recycle control wafers, and downgrading control wafers.

Finally, the CWDP is formulated as a linear programming model, and its objective is to find the minimum total cost of con-trol wafers. The principal constraint is that the supply rate for each grade of control wafer must equal the sum of the new supply rate of control wafers, the recycle supply rate and the down-grading supply rate. The procedures for the four phases will be described in the next sections.

3.1 Control wafers demand of grade j

Note that in a stabilized manufacturing system, the expected ar-rival rate equals to the expected throughput rate. In addition, in the planning period, the throughput level equals to the release quantity. Therefore, with the throughput target, the product mix ratio and the rework rate for normal products, we can calculate the actual process quantity in the planning period:

TRn=R× πn× (1 + γ) , for each n . (1)

Control wafers can be categorized into several grades de-pending on their quality, that is, the amount of particle content in them. For every grade of control wafers, no matter what product type it is producing or what layer it is on, the PUR process is the same. The demand rate for grade j control wafers is calculated as follows: dj=  n∈S TRn× TCn j× PCn j× 1 PT , j= 1, 2, . . . , c . (2)

3.2 Control wafers supply of grade j

The loop system of control wafer is constructed by a pulling con-trol system, downgrade supply rate and PUR process procedures. In the jth loop, the supply and depletion of control wafers con-tinue repeatedly, and a balanced production and exhaustion loop system is adequate to solve CWDP. The basic structure of the control wafers PUR process and pull control is depicted in Fig. 4. In Fig. 4, the loop consists of three stages, and each stage consists of one machine for processing. Xj1 represents the pre-disposition stage, Xj2represents the in-use stage, and Xj3 rep-resents the recycle stage. At the pre-disposition stage, operations must be completed to make the control wafers complied with the manufacturing condition before they can be used. At the in-use

Fig. 4. The relationship between pull control and PUR process in the jth loop system

stage, control wafers are employed in wafer fabrication to mon-itor and control some machine functions. After control wafers pass through the pre-disposition and in-use stages, they either enter the recycle state, are downgraded, or are discarded. In the

jth loop, the new control wafers supply rate is A0 j, the recycle

supply rate isλjj, the downgrading supply rate isλij (for i< j), downgrading leave rate isλjk(for j< k), and the discard rate is λjD. If these control wafers enter the recycle state, they will be repeatedly used and remain in the PUR process.

When the jth loop declares a need of control wafers, control wafers can be supplied from the disposition stage. The pre-disposition stage (Xj1) supplies recycle or downgrading control wafers to meet the demand. If control wafers are not sufficient to meet the demand, the system can pull new control wafers for use. Therefore, in a stabilized system, the arrival rate of control wafers is equal to the leaving rate of control wafers. By equaliz-ing the supply rate to the demand rate derived in Eq. 3, we can determine the supply rate of new control wafers, the recycle sup-ply rate and the downgrading supsup-ply rate. Therefore, the supsup-ply rate for control wafers is calculated as follows:

λj= A0 j+ λjPjj+ j−1  i=1

λiPij, j= 1, 2, . . . , c . (3) The total cost of control wafers consists of the purchase cost for new control wafers, recycle process cost and downgrading process cost. New control wafers have the highest clarity and are suitable for all classes of production. As a result, the cost of new control wafers is the highest. Recycle control wafers are pro-duced by the single loop of the same grade. The grades must be considered in determining the cost. Downgrading control wafers are transferred from a higher grade to a lower grade, and the re-lationship between the two grades must be studied to set the cost. Control wafers of a higher grade have higher recycle and down-grading costs, and control wafers of the same grade have the same recycle/downgrading costs. The costs of new, recycle and downgrading control wafers will be discussed in the next section. 3.3 Formulation of the control wafers downgrading problem In this paper, a production planner’s objective is to minimize the total cost of control wafers in the system and to determine the op-timal supply rate of control wafers in the jth grade. A multi-loop system must supply enough control wafers for use in time, and shortage is not allowed. The operative constraints are as follows.

(5)

First, the demand rate of control wafers is equal to the supply rate of control wafers. The demand rate of control wafers is cal-culated by Eqs. 1 and 2. Second, as previously discussed, the supply rate of control wafers is equal to the supply rate of new control wafers plus the control wafers recycle rate and down-grade rates from upstream loops. Third, the sum of all ratios in the jth grade are equal to one. Fourth, the recycle ratio is less than a positive real number. Fifth, the discard ratio is more than a positive real numbers. Sixth, all supply rates and ratios are non-negative real numbers.

The objective and constraints are as follows:

Minimize Z= c  j=1 c0 jA0 j+ c  j j  i=1 cijλiPij (4) subject to dj= λj, j= 1, 2, . . . , c (5) λj= A0 j+ j  i=1 λiPij, j= 1, 2, . . . , c (6) c  ji Pij+ PjD= 1 , j= 1, 2, . . . , c (7) PjjPrj, j= 1, 2, . . . , c (8) PjDPdj, j= 1, 2, . . . , c (9)

where all variables are nonnegative. (10)

3.4 Strategy discussion

In order to justify the applicability of the proposed linear pro-gramming model, we consider some strategies to investigate the effects of different downgrading level policy on the system, and to optimize the control wafers managing strategy. The basic in-formation for four situations (1) without recycling and down-grading, (2) with recycling but not downdown-grading, (3) downgrad-ing with one level, and (4) downgraddowngrad-ing with multi-levels, are presented here. In the first model, the initial supply node is con-sidered, and the downgrading level is 0. That is, only new control wafers are supplied, and neither recycling nor downgrading is permitted. In the second model, the downgrading level is also 0. The model consists of new and recycled control wafers in the system, but downgrading is not allowed. In the third model, the downgrading level is 1. The model has new, recycle, and down-grading control wafers in the system. However, downdown-grading is only allowed for one level. Finally, the fourth model consists of multi-loops and the downgrading level is c. The model is similar to the third model, but the control wafers of a specific level can be downgraded to several other levels.

Strategy I: Without recycling and downgrading

In Strategy I, we let the supply node be loop 0, and loop 0 contains only new control wafers. The recycle and the downgrad-ing events do not happen in this model. The model is matched with a pulling control system and the demand rate equals the

supply. The constraint of Eq. 6 for this model becomes

λj= A0 j, j= 1, 2, . . . , c . (11)

Strategy II: With recycling but not downgrading

In Strategy II, the downgrading event does not happen in the model, but the recycle event does. The model is also matched with a pulling control system. The supply rate is calculated by adding up new control wafers supply rate and the recycle supply rate. Equation 6 for this model becomes

λj= A0 j+ λjPjj, j= 1, 2, . . . , c . (12) Strategy III: Downgrading with one level

In Strategy III, both recycle and downgrading events happen in the model. However, downgrading is permitted for only one level. The supply rate is calculated by adding the new control wafers the supply rate, the recycle supply rate and the downgrad-ing supply rate. The constraint of Eq. 6 for this model becomes λj= A0 j+ λjPjj+ λj−1Pj−1 j, j= 1, 2, . . . , c . (13) Strategy IV: Downgrading with multi-levels

In Strategy IV, both recycle and downgrading events hap-pen in the model. The multi-loop model considers all events and the interaction effect among loops. The model is matched with a pulling control system, and the supply rate is calculated by adding the new control wafers supply rate, the recycle supply rate and the downgrading supply rate. The constraint is as in Eq. 6.

4 Numerical example

The linearly programming model is implemented by using the software LINDO 5.01 to solve the CWDP. Each strategy aims to determine the minimum total cost of control wafers including the new control wafers cost, recycle process cost and downgrading process cost.

4.1 Basic input information

To investigate the effect of the management system on the plan-ning, actual data is taken from a wafer fabrication factory located in the Science-Based Industrial Park in Hsinchu, Taiwan. 1. Production information. In our production system, we have

five products A, B, C, D, and E. Product A and B are logic, while product C, D and E are memory products. The process of each product is different and unique.

2. Workstation information. There are 83 workstations in our production system.

3. Master production scheduling (MPS) information. The prod-uct mix for prodprod-uct A, B, C, D, and E is 5, 7, 3, 4, and 1, respectively. The monthly output target (R) is 630 lots. In order to achieve the throughput target and the mix, CON-WIP rule is adopted and the CON-WIP level of normal wafers for

(6)

Table 1. The number of times for control wafers demand for each lot of normal product and each grade

A B C D E

Grade 1 6 4 6 7 5

Grade 2 5 6 5 6 9

Grade 3 9 7 8 6 5

Grade 4 3 4 6 5 3

Table 2. The unit cost of c0 j, cjjand cijof control wafers in each grade Cij i= 0 i= 1 i= 2 i= 3 i= 4 j= 1 100 80 j= 2 100 70 70 j= 3 100 60 60 60 j= 4 100 50 50 50 50

the system is set to be 270 lots. The planning period (PT) is 28 days, and the rework rate (γ) is set to be zero.

4. Machine data for control wafers. In the photolithography area, process engineers disaggregate control wafers into four grades in the process. The depletion of control wafers is re-lated to the amount of product processed. In addition, the relationship between control wafer depletion and the corres-ponding workstation is known. The number of times used for grading j control wafers for each lot of each product type, TCn j, is shown in Table 1, and the usage per lot (PCn j) is a constant (i.e., 1 piece).

5. Cost types of the control wafers. The costs for using con-trol wafers include new concon-trol wafer cost, recycle cost and downgrading cost. The unit cost of control wafers for each cost type and for each grade is shown in Table 2.

6. PUR process. In each loop j, the PUR process consists of three stages of operation, and each stage is represented by a workstation.

7. The maximum recycle ratio (Prj) for each grade of control wafer is set to be 0.80.

8. The minimum discard ratio (Pdj) for each grade of control wafers is set to be 0.10.

4.2 Experimental result and sensitivity analysis

The results of the four strategies are shown in Tables 3, 4, 5 and 6. The optimum costs are calculated for the model and the

Table 3. The rates for Strategy I

Loop j dj A0 j PjD

j= 1 123 123 1

j= 2 129 129 1

j= 3 165 165 1

j= 4 95 95 1

Table 4. The rates for Strategy II

Loop j dj A0 j Pjj PjD

j= 1 123 24.6 0.80 0.20

j= 2 129 25.8 0.80 0.20

j= 3 165 33.0 0.80 0.20

j= 4 95 19.0 0.80 0.20

Table 5. The rates for Strategy III

Loop j dj A0 j P1 j P2 j P3 j P4 j j= 1 123 60.70 0.51 j= 2 129 0.00 0.39 0.62 j= 3 165 0.00 0.00 0.28 0.78 j= 4 95 0.00 0.00 0.00 0.12 0.80 j= D 0.10 0.10 0.10 0.20

Table 6. The rates for Strategy IV

Loop j dj A0 j P1 j P2 j P3 j P4 j j= 1 123 60.70 0.51 j= 2 129 0.00 0.37 0.64 j= 3 165 0.00 0.00 0.26 0.80 j= 4 95 0.00 0.02 0.00 0.10 0.80 j= D 0.10 0.10 0.10 0.20

costs are compared using different downgrading levels, as shown in Table 7.

For the first strategy, new wafers are used for each loop, and no recycling or downgrading is allowed. For example, in loop 1, as shown in Table 3, 123 control wafers are demanded, and all are from new control wafers. Once they are used, they will be discarded. Therefore, PjD= 1. As a result, the total cost for this strategy is the highest.

For the second strategy, each loop requires new wafers. The recycle rate and the discard rate are 0.80 and 0.20, respectively, for each loop. Since each loop can acquire new wafers and no downgrading is allowed, the total cost is the second highest.

For the third strategy, new wafers can only be introduced in the first loop. For other loops, only recycle and downgrading control wafers can be used. In addition, downgrading is permit-ted for one level. For instance, control wafers of loop 1 can only be downgraded to loop 2, but not loop 3 or 4, etc. As shown in Table 5, 60.70 new control wafers are used in the first loop, and the recycle rate of loop 1 is 0.51. Some control wafers of loop 1

Table 7. Costs of control wafers

Strategies c0 jA0i cjjλjPjj cijλiPij Z

Strategy I 51 200.00 0.00 0.00 51 200.00

Strategy II 10 240.00 26 816.00 0.00 37 056.00 Strategy III 6070.00 22 158.80 6549.54 34 778.34 Strategy IV 6070.00 22 520.96 6143.10 34 734.06

(7)

Table 8. Effects of dj, Prjand Pdjon the CWDP Changing parameters c0 jA0i cjjλiPii cijλiPij Z The dj 111, 116, 149, 86 5480.00 22 330.39 6330.71 34 141.10 multi-loop 123, 129, 165, 95 6070.00 22 520.96 6143.10 34 734.06 model 135, 142, 182, 105 6690.00 23 907.30 4751.12 35 348.12 Prj 0.72 7140.00 19 569.24 8238.70 34 947.94 0.80 6070.00 22 520.96 6143.10 34 734.06 0.88 5310.00 25 224.97 4047.00 34 581.97 Pdj 0.09 5653.00 22 944.96 6052.53 34 650.49 0.10 6070.00 22 520.96 6143.10 34 734.06 0.11 6487.00 22 097.21 6233.30 34 817.51

are downgraded to loop 2, with a downgrading rate of 0.39. Since they cannot be further downgraded, the unsuitable control wafers are discarded with a discard rate of 0.10.

For Strategy IV, downgrading is permitted without restriction in levels. From Table 6, we can see that control wafers of loop 1 can be downgraded to loop 4 with a downgrading rate of 0.02. Since this strategy best uses each piece of control wafer, its total is the lowest, with $ 34, 734.06 per day. Based on the results, we find that the proposed mutli-loop model performs quite well in setting the recycle ratio, the downgrading ratio, and the new con-trol wafers depletion rate for each concon-trol wafer grade. However, notice that the results of Strategy III and IV are almost identical. Therefore, Strategy III is nearly optimal.

As discussed before, the rates obtained under the four strate-gies can be used as target values for management. In practice, if the actual rates obtained on the floor are higher than the target rates, we can lower the usage rates to meet the target and mini-mize the cost. For example, if the actual recycle rate for loop 1 is 0.60 (while the target rate is 0.51 under Strategy III and IV), we can downgrade controls wafers of loop 1 more often and still have a low cost. However, if the actual rates are lower than the target rates, we need to further consider whether raw con-trol wafers of a higher quality should be used. Also, the recycle process probably needs to be monitored in order to increase the usage rates and to meet the target. For instance, if the recycle rate is 0.30 in loop 1 (while the target rate is 0.51 under Strategy III and IV), we have to check why control wafers cannot be recy-cled more often. Could it be simply the policy of not recycling too often, or could it be that the particle content of the control wafers used is too high to meet the recycle requirement? A com-prehensive study should be done in order to make the correct actions toward meeting the target rates. If relevant costs change as a result, target rates must be recalculated.

Now, consider a situation in which only one of dj, Prj and Pdj changes by a fixed proportion while the other parameters remain unchanged. The following sensitivity measures are then calculated for 10% changes in the parameters on either side. Table 8 summarizes these results. Based on the sensitivity analy-sis, we can infer the following:

1. An increase in demand rate djor minimum discard ratio Pdj, or a decrease in the maximum recycle ratio Prj causes in-creases in the total new control wafers cost.

2. An increase in demand rate djor maximum recycle ratio Prj or a decrease in minimum discard ratio Pdj causes increases in the total recycle cost.

3. An increase in the minimum discard ratio Pdjor a decrease in the demand rate dj or maximum recycle ratio Prj causes increases in the total downgrading cost.

4. The total cost Z increases with an increase in the demand rate dj or minimum discard ratio Pdj, or a decrease in the max-imum recycle ratio Prj. The total cost Z is more sensitive to the parameter djthan the others.

5 Conclusions

A production management system for CWDP poses new chal-lenges to wafer fabrication and proposing a proper downgrading rule of control wafers is an important task. The use of control wafers is closely related to many critical factors such as the pro-duction throughput, product mix, and priority mix. In this paper, a multi-loop model is proposed to determine the supply rate, the recycle ratio, and the downgrading ratio for each control wafer grade. A numerical experiment demonstrates that applying the proposed model can minimize the total cost. In addition, sensitiv-ity analysis is performed to examine the effect of the parameters. According to these results, the proposed model is more sensitive with respect to the demand rate dj than the others. The analysis provided in this study can be very useful for managers in decid-ing whether they should have a downgraddecid-ing policy. For future research, we can focus on stochastic nature of demand that sat-isfy the minimum cost as well as achieving the manufacturers’ planning target. Also, a model for a work-in-process level of con-trol wafers may be established.

Acknowledgement This research is supported in part by grant

NSC90-2218-E009-015.

References

1. Lin YL (2000) The design of inventory control model for dummy/control wafers at the furnace area in the wafer fab. Dissertation, National Chiao Tung University, Hsin-Chu, Taiwan

2. Spearman ML, Woodurff DL (1990) CONWIP: A pull alternative to Kanban. Int J Prod Res 28(5):879–894

(8)

3. Chen HC, Lee CE (2000) Control and dummy wafers management. J Chin Inst Ind Eng 17(4):437–449

4. Chung SH, Yang MH, Cheng CM (1997) The design of due date as-signment model and the determination of flow time control parameters for the wafer fabrication factories. IEEE Trans Compon Packag Manuf Technol 20(4):278–287

5. Kroese DP, Nicola VF (1999) Efficient simulation of a tandem Jackson net-work. Proceedings of the 1999 Winter Simulation Conference, pp 411–419

6. Kumar S, Kumar PR (2001) Queuing network models in the design and analysis of semiconductor wafer fabs. IEEE Trans Robot Automat 17(5):548–561

7. Xiao H (2001) Introduction to semiconductor manufacturing technology. Prentice-Hall, New York

數據

Fig. 1. The operation of a control wafer
Fig. 2. A simple typical diagram of a control wafer’s position in a machine
Fig. 4. The relationship between pull control and PUR process in the jth loop system
Table 8. Effects of d j , Pr j and Pd j on the CWDP Changing parameters  c 0 j A 0i  c jj λ i P ii  c ij λ i P ij Z The d j 111, 116, 149, 86 5480.00 22 330 .39 6330.71 34 141 .10 multi-loop 123, 129, 165, 95 6070.00 22 520 .96 6143.10 34 734 .06 model

參考文獻

相關文件

Primal-dual approach for the mixed domination problem in trees Although we have presented Algorithm 3 for finding a minimum mixed dominating set in a tree, it is still desire to

In particular, we present a linear-time algorithm for the k-tuple total domination problem for graphs in which each block is a clique, a cycle or a complete bipartite graph,

Then, we recast the signal recovery problem as a smoothing penalized least squares optimization problem, and apply the nonlinear conjugate gradient method to solve the smoothing

Chen, The semismooth-related properties of a merit function and a descent method for the nonlinear complementarity problem, Journal of Global Optimization, vol.. Soares, A new

Programming languages can be used to create programs that control the behavior of a. machine and/or to express algorithms precisely.” -

n Media Gateway Control Protocol Architecture and Requirements.

For Experimental Group 1 and Control Group 1, the learning environment was adaptive based on each student’s learning ability, and difficulty level of a new subject unit was

The objective of this study is to establish a monthly water quality predicting model using a grammatical evolution (GE) programming system for Feitsui Reservoir in Northern