• 沒有找到結果。

1. 在 PVA-PDMS stack 之製程中,氧電漿處理後之塊狀 PDMS 需盡快拿去旋塗 PVA 水溶液,以防氧電漿處理之效果消失。旋塗後必須確認 PVA 水溶液佈滿欲旋塗 之 PDMS 表面,若沒塗滿會在撕除薄膜之步驟失敗。

2. 在多孔薄膜之製程中,將薄膜表面上之 PVA 洗淨後不可放置太久後才與 PDMS 流道接合,容易因表面髒汙造成接合失敗。

3. 在濃度場量化與量測時,需確保連接濃度梯度供給流道之出入口的四條管路長度 相同,以免壓差造成流道內部壓力不平衡。

4. 在濃度場量化與量測時,需遮蔽室內光源,防止開關燈造成影像亮度差異,且不 可移動顯微鏡之 XY 平台與光源。

5. 分析結果顯示孔隙數量過多時,濃度場之趨勢較難以辨別,可設計孔隙數量較少 之薄膜來進行研究。

6. 經由影像量測的結果顯示,實際多孔薄膜之孔徑與設計之孔徑誤差達到 74%至 119%,可能是製程時曝光時間過長導致過曝,可降低曝光時間以製出更精準的 孔隙。

7. 因流道尺寸較小,導致流道接合時對齊難度高。可設計一平台,下層固定微孔穴 流道,上層為可移動之 XYZ 平台,並可夾持濃度梯度供給流道,配合顯微鏡對 齊後再進行接合。

8. 本實驗尚未確認多孔薄膜之孔徑與孔隙數量對孔穴內流場的影響有多大,未來可 藉由μPIV 分析流場之影響後再置入浮游生物,觀察不同流場下濃度對浮游生物 的影響。

參考文獻

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附表

表 2.1 多孔薄膜之設計參數 Pore size

dp (μm)

Pitch of pores p (μm)

Number of pores np

Device abbreviation

Schematic

25 60 352 A Fig. 2.2 (c)

40 60 352 B Fig. 2.2 (c)

25 120 88 C Fig. 2.2 (d)

40 120 88 D Fig. 2.2 (d)

表 2.2 上層濃度梯度供給流道之母模微影製程參數

step setup value

Spin coating

Photoresist SU-8 2150

Time 1 (s) 20

Speed 1 (rpm) 500

Time 2 (s) 40

Speed 2 (rpm) 3000 Soft bake temperature 1 (C) 65

Soft bake time 1 (min) 10 Soft bake temperature 2 (C) 95 Soft bake time 2 (min) 30

Exposure

Alignment gap (m) 750 Exposure time (s) 40 Intensity (mW cm-2) 10.7 Exposure dose (mJ cm-2) 428 PEB temperature 1 (C) 65

PEB time 1 (min) 5 PEB temperature 2 (C) 95

PEB time 2 (min) 15

Development

Developer SU-8 developer Developing time (min) 10 Hard bake temperature (C) 150

Hard bake time (min) 30

表 2.3 下層微孔穴流道之母模微影製程參數

step setup value

Spin coating

Photoresist SU-8 2150

Time 1 (s) 420

Speed 1 (rpm) 500 Soft bake temperature 1 (C) 65

Soft bake time 1 (min) 10 Soft bake temperature 2 (C) 95 Soft bake time 2 (min) 120

Exposure

Alignment gap (m) 1000 Exposure time (s) 60 Intensity (mW cm-2) 10.7 Exposure dose (mJ cm-2) 642 PEB temperature 1 (C) 65

PEB time 1 (min) 15 PEB temperature 2 (C) 95 PEB time 2 (min) 30

Development

Developer SU-8 developer Developing time (min) 15 Hard bake temperature (C) 150

Hard bake time (min) 30

表 2.4 多孔薄膜母模微影製程參數

step setup value

Spin coating

Photoresist SU-8 2075

Time 1 (s) 30

Speed 1 (rpm) 500

Time 2 (s) 40

Speed 2 (rpm) 4000 Soft bake temperature 1 (C) 65

Soft bake time 1 (min) 3 Soft bake temperature 2 (C) 95

Soft bake time 2 (min) 9

Exposure

Alignment gap (m) 700 Exposure time (s) 30 Intensity (mW cm-2) 10.7 Exposure dose (mJ cm-2) 321 PEB temperature 1 (C) 65

PEB time 1 (min) 2 PEB temperature 2 (C) 95

PEB time 2 (min) 7

Development

Developer SU-8 developer Developing time (min) 10 Hard bake temperature (C) 150

Hard bake time (min) 30

附圖

(b)

plankton

nutrient

sea water

(c)

porous membrane plankton

microchannel gradient generator

(d)

p dp

Top view

plankton nutrient

sea water (a)

圖 2.1 微營養鹽濃度梯度元件示意圖

R550

R1500

R1000

8500

R500

R1000 125

unit: m

R1500

R550

(a)

(b)

(c) (d)

unit: m

500

1395

750

120° 120°

dpΧ88

dpΧ352

圖 2.2 光罩設計尺寸標示圖

(f) hard baking (e) developing

developer (d) post exposure baking (c) exposure

(b) soft-baking

Si wafer

SU-8 photoresist mask

(a) SU-8 spin coating

Si wafer

SU-8 photoresist mask

圖 2.3 矽晶圓母模製程步驟

SU-8 photoresist PVA

cured PDMS uncured PDMS Si wafer

Pre-curing PDMS (c) PDMS curing

(e) PVA spin coating

(f) PVA curing (a) PDMS mixing

prepolymer curing agent

(d) O2 plasma treatment (b) PDMS pouring

uncured PDMS

uncured PVA

圖 2.4 PVA-PDMS Stack 製程

uncured PDMS uncured PDMS

(c) PDMS curing

(d) peeling off

(e) hole drilling

gradient channel (a) PDMS mixing

cavity channel

prepolymer curing agent

(b) PDMS pouring

SU-8 photoresist cured PDMS uncured PDMS Si wafer

圖 2.5 PDMS 流道製程

(e) removing PVA-PDMS stack

SU-8 photoresist PVA cured PDMS uncured PDMS Si wafer

(h) peeling off (g) bonding

(j) bonding (a) PDMS mixing

(b) PDMS pouring

Uncured PDMS

PVA-PDMS stack Metal

(c) membrane making

(d) water immersion

prepolymer curing agent

(f) O2 plasma treatment

porous PDMS membrane gradient channel

(i) O2 plasma treatment

cavity channel gradient channel & membrane

圖 2.6 PDMS 多孔滲透薄膜與微營養鹽濃度梯度元件組裝製程

beaker

dichroic mirror cube

objective 2.5x device

mirror

gradient channel

cavity channel

圖 2.7 實驗設備配置圖

normalized grayscale value, I

normalized concentration, C

0.0 0.2 0.4 0.6 0.8 1.0

nor m a li z ed gr ays ca le va lue , I

0.0

圖 2.9 染劑水溶液正規化灰階值與濃度之校正曲線圖

normalized concentration, C

coordinate, y (m)

0 20 40 60 80 100 120 140 160 180

n o rm al iz ed c o n ce n tr at io n , C

x

1000 m 1000 m

1000 m

(a)

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

1000 m

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.1 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.03,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.2 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.06,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.3 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.09,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.4 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.03,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.5 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.06,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.6 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.09,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.7 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.03,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.8 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.06,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.9 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.09,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.10 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.03,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.11 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.06,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: A

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.12 孔徑為 25 μm,孔隙間距為 60 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.09,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.13 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.03,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.14 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.06,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.15 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.09,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.16 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.03,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.17 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.06,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.18 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.09,對齊方式為平行擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.19 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.03,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.20 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.06,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.21 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.09,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

圖 3.22 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.03,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.06 Recavity = 0

(b)

Regradient = 0.06 Recavity = 0.03

(c)

Regradient = 0.06 Recavity = 0.06

(d)

Regradient = 0.06 Recavity = 0.09

圖 3.23 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.06,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: C

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.09 Recavity = 0

(b)

Regradient = 0.09 Recavity = 0.03

(c)

Regradient = 0.09 Recavity = 0.06

(d)

Regradient = 0.09 Recavity = 0.09

圖 3.24 孔徑為 25 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為反向流,

Regradient固定為 0.09,對齊方式為垂直擺放之孔穴內濃度場

1000 m 1000 m

1000 m 1000 m

water, dye, outlet, Membrane: D

normalized concentration

1.0

0.8

0.6

0.4

0.2

0.0 (a)

Regradient = 0.03 Recavity = 0

(b)

Regradient = 0.03 Recavity = 0.03

(c)

Regradient = 0.03 Recavity = 0.06

(d)

Regradient = 0.03 Recavity = 0.09

圖 3.25 孔徑為 40 μm,孔隙間距為 120 μm,濃度梯度供給流道之流向為同向流,

Regradient固定為 0.03,對齊方式為平行擺放之孔穴內濃度場

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