第四章 結論與建議
4.2 建議
（a）分析完整 OES 機制(Ex : Ozone、NO2……etc)，並朝醫療應用研究。
（b）以氬氣電漿為主，分析不同參數(介電質材料、頻率、氧氣比例……)。
（c）Floating 電極的改進，朝發展 Air 電極頭設計。
25
參考文獻
[1] Akamatsu H., and Ichikawa K., “Characteristics of atmospheric pressure plasma jet generated by compact and inexpensive high voltage modulator”, Surface &Coatings Technology , (2011).
[2] Bibinov N.K., Fateev A.A., and Wiesemann K., “On the influence of metastable reactions on rotational temperatures in dielectric barrier discharge in He-N2 mixtures”, J.Phys.D: Appl. Phys.34 1819-1826, (2001).
[3] Benedikt J., Raballand V., Gyl A.Y., Focke K. and Keudell A.V., “Thin film deposition by means of atmospheric pressure microplasma jet ”, Plasma Phys. Control. Fusion 49 B419–B42, (2007).
[4] Chiang M.H., Liao K.C., Lin I.M., Lu C.C., Huang H.Y., Kuo C.L., and Wu J.S.,
“Modification of Hydrophilic Property of Polypropylene Films by a Parallel-Plate Nitrogen-Based Dielectric Barrier Discharge Jet”, IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 6 , (2010).
[5] Chiang M.H., Wub J.Y., Li Y.H., Wu J.S., Chen S.H., and Chang C.L., “Inactivation of E. coli and B. subtilis by a parallel-plate dielectric barrier discharge jet
”, Surface & Coatings Technology , (2010).
[6] Feng Y., Ren C.S., Nie Q.Y., and Wang D.Z., “Study on the Self-organized pattern in an
26
Atmospheric Pressure Dielectric Barrier Discharge Plasma Jet”, IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 5 , (2010)
[7] Hus Y.W., Yang Y.J., Wu A.Y., and Hsu C.C., “Downstream Characterization of an Atmospheric Pressure Pulsed Arc Jet”, Plasma Chem Plasma Process, (2010)
[8] Hus Y.W., Yang Y.J., Wu A.Y., and Hsu C.C., “Surface modification of polyethleneterephthalate by an atmospheric-pressure plasma source”, Surface &Coating Technology, 187, 172-176, (2004)
[9] IWASAKI , TAKEDA K., ITO M., YARA T., UEHARA T. and HOR M., “Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma”, Japanese Journal of Applied Physics Vol.
46, No. 23, 2007, pp. L540–L542, (2007).
[10] Kong M.G., Nie Q.Y., Ren C.S., Wang D.Z., Li S.Z. and Zhang J.L., “Self-organized pattern formation of an atmospheric pressure plasma jet in a dielectric barrier discharge configuration”, Appl. Phys. Letters 90 221504, (2007).
[11] Lee H.W., Nam S.H., H A.A., Mohamed H., Kim C.C. and Lee J.K., “Atmospheric Pressure Plasma Jet Composed of Three Electrodes: Application to Tooth Bleaching”, Plasma Processes and Polymers, Vol.7, 274-280, (2010).
[12] Li S.Z., Wu Q., Zhang J., Wang D., and Uhm H.S., “Development of an atmospheric pressure homogeneous and cold Ar/O2 plasma source operating in glow discharge”,
27
PHYSICS OF PLASMAS 17, 063506, (2010).
[13] Leveille V., and Coulombe S., “Atomic Oxygen Production and Exploration of Peaction Mechanisms in a He-O2 Atmospheric Pressure Glow Discharge Torch”, Plasma Processes and Polymers, (2006)
[14] Mahoney J., Zhu W., Johnson V.S., Becker K.H., and Lopez J.L., “Electrical and optical emission measurements of a capillary dielectric barrier discharge”, The EUROPEAM PHYSICAL JOURNAL D, (2010)
[15] Park H.S., Kim S.J., Joh H.M., Chung T.H., Bae S.H., and Leem S.H., “Optical and electrical characterization of an atmospheric pressure microplasma jet with a capillary electrode”, PHYSICS OF PLASMA 17, 033502, (2010)
[16] Schutze A., Jeong J.Y., Babayan S.E., Park J., Selwyn G.S. and Hicks R.F., “The Atmospheric-Pressure Plasma Jet: A Review and Comparison to Other Plasma Sources
”, IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 26, NO. 6, (1998).
[17] Wagner H.E., Brandenburg K., Kozlov K.V., Sonnenfeld A., Michel P., and Brhnke J.F.,
“The barrier discharge : basic properties and applications to surface treatment”, Vacuum 71 417-436, (2003).
28
Plasma Gas He
Power supply DC quasi pulsed Dielectric material Ceramic 1(mm) Dielectric distance 0.8 (mm)
Flow rate 20、30、50 (slm) Frequency 20、40、60 (kHz) Power 60 - 200 (W)
表格 3. 1 電漿測試條件
Parameters Varying operation conditions Fixed operating conditions
1. Dielectric material Ceramic 1 mm & Quartz 1 mm(60 - 180 W)
1. 30 slm He
2. Dielectric distance : 0.8 mm 3. Frequency : 60 kHz 2. Delectric distance 0.2, 0.3, 0.5, 0.8 and 1.5 mm (60 - 180 W)
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
3. Flow rate, Frequency and Power
Flow rate :10, 15, 20 and 30 slm Frequency : 20, 30, 40, 50 and 60 kHz Power : 60 -180 W
1. Dielectric material : Quartz 1 mm 2. Delectric distance : 0.5 mm
4. Distance of power and ground 10, 15, 20 and 25 mm (60 - 180 W)
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5. Add Oxygen Oxygen : 0, 0.03, 0.05, 0.07, 0.09, 0.1, 0.2, 0.3, 0.5, 0.7 and 1.0 %
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5.Distance of power and ground : 10 mm 6.Power : 120 W
6. Power efficiency 60 - 180 W
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5.Distance of power and ground : 10 mm
7. Floating electrode (A) without floating & with floating (60 - 180 W)
1. 30 slm He and Ar
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 1.0 mm 5.Distance of power and ground : 10 mm & 2 mm
表格 3. 2 Post-discharge 電漿測試條件.
29
Parameters Varying operation conditions Fixed operating conditions
Temperature X axis : 0, 10, 20, 30, 40 and 50 mm Z axis : 5 (Trot), 10 and 15 mm
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5. Distance of power and ground : 10 mm 6. Power : 120 W
表格 3. 3 Post-discharge 電漿溫度測試條件.
Parameters Varying operation conditions Fixed operating conditions
OES Post-discharge & discharge
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5. Distance of power and ground : 10 mm 6. Power : 120 W
OES (Post - discharge) Z axis : 2.5 (Trot), 7.5, 12.5 and 17.5 mm
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5. Distance of power and ground : 10 mm 6. Power : 120 W
OES (Post - discharge adding Oxygen) Oxygen : 0, 0.03, 0.05, 0.07, 0.09, 0.1, 0.2, 0.3, 0.5, 0.7 and 1.0 %
1. 30 slm He
2. Dielectric material : Quartz 1mm 3. Frequency :60 kHz
4. Delectric distance : 0.5 mm
5. Distance of power and ground : 10 mm 6. Power : 120 W
7. Z=2.5 mm
表格 3. 4 OES 電漿測試條件.
圖 1. 1 各種氣體的 Paschen Curves (Vbreakdown voltage VS pd) [Schutze et al. 1998].
30
圖 1. 2 各種常壓電漿電極設計形式. (a) 電漿火炬(Plasma torch); (b) 暈光放電(Corona discharge); (c) 介電質屏蔽放電(DBD); (d) 常壓電漿束(APPJ) [Schutze et al. 1998].
圖 1. 3 介電質屏蔽放電 (DBD)與電極各種設計[Schutze et al. 1998].
圖 1. 4 介電質屏蔽常壓電漿(DBD)系統)[Masahiro. I.et al, 2007].
31
圖1. 5 不同氧氣比例之接觸角比較圖[Masahiro. I.et al, 2007].
圖 1. 6 常壓電漿束(APPJ)鍍膜系統[Benedilt J. et al, 2007].
圖1. 7 常壓電漿束(APPJ-DBD)鍍膜系統[Chiang M.H. et al, 2010].
32
圖1. 8 常壓電漿束(APPJ)鍍膜系統[ Lee H.W. et al. 2010
].
圖1. 9 牙齒經過電漿美白的比較圖[ Lee H.W. et al. 2010
].
33
圖1. 10 Power與ground電極成上下形式的常壓電漿系統[Feng. Y. et al, 2010].
圖1. 11 流道寬度不同的電漿比較圖[Feng. Y. et al, 2010].
34
圖1. 12 平板型無介電質材料的RF電極設計圖[Li. S.Z. et al, 2011].
圖1. 13 不同氧氣比例比較O 777比較圖[Li. S.Z. et al, 2011].
35
圖 2. 1 DC pulse -常壓平板型介電質屏蔽電漿束( DBD - APPJ )系統
圖 2. 2 常壓電漿 DBD 電極設計圖
36
圖 2. 3 常壓電漿 DBD 電極設計組裝圖
圖 2. 4 常壓電漿 floating 電極設計圖
圖 2. 5 脈衝電源供應器前視圖
37
圖 2. 6 脈衝電源供應器後視圖
圖 2. 7 電漿密度模式定義
38
圖 2. 8 氣體供給系統-調壓閥
圖 2. 9 氣體供給系統-浮子流量計與 MFC
39
圖 2. 10 實驗腔體
圖 2. 11 單眼相機
圖 2. 12 高壓探棒、電流感測器與耐高壓電容
40
圖 2. 13 示波器值顯示之圖(Lissajous figure) [ Wagner H.E. et al. 2003
].
圖 2. 14 水銀溫度計
圖 2. 15 光譜儀
41
圖 3. 1 Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm), 20 (kHz), 50 (slm)
and 60 (W).
圖 3. 2 Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm), 60 (kHz), 50 (slm)
and 120 (W).
42
圖 3. 3 不同流量 Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm), 20 (kHz)
and 60 (W).
圖 3. 4 不同功率 Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm), 20 (kHz)
and 60 (W).
43
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Frequancy : 20 (kHz)
Number of channels
Input power (W)
50 slm 30 slm 20 slm
圖 3. 5 不同流量，固定 20 (kHz) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8
(mm).
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Frequancy : 40 (kHz)
Number of channels
Input power (W)
50 slm 30 slm 20 slm
圖 3. 6 不同流量，固定 40 (kHz) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8
(mm).
44
40 60 80 100 120 140 160 180 200 220
12 14 16 18 20 22 24
Plasma gas : He Gap : 0.8 (mm)
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Frequancy : 60 (kHz)
Number of channels
Input power (W) 50 slm
30 slm 20 slm
圖 3. 7 不同流量，固定 60 (kHz) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8
(mm).
圖 3. 8 不同頻率 Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm), 30 (slm)
and 60 (W).
45
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Flow rate : 20 (slm)
Number of channels
Frequency (kHz)
圖 3. 9 固定流量 20 (slm) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8 (mm).
20 30 40 50 60
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Flow rate : 30 (slm)
Number of channels
Frequency (kHz)
圖 3. 10 固定流量 30 (slm) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8
(mm).
46
Dielectric material : Ceramic 1 (mm) Breakdown power : 60 (w)
Flow rate : 50 (slm)
Number of channels
Frequency (kHz)
圖 3. 11 固定流量 50 (slm) Pure He discharge, Ceramic 1 (mm), Dielectric distance 0.8
(mm).
圖 3. 12 比較不同介電質材料 60–120 W 電漿比較圖, 30 slm Pure He discharge.
47
Quartz Voltage Ceramic Voltage Quartz Current Ceramic Current
Input power (W)
Voltage (kV) Frequancy : 60 (kHz)
Current (mA)
圖 3. 14 比較不同介電質材料 I-V 電性圖, 30 slm Pure He discharge, Dielectric distance 0.8
mm.
48
圖 3. 15 不同功率, 固定 Dielectric distance 0.3 (mm), Pure He discharge, Quartz 1 (mm), 60
(kHz).
圖 3. 16 不同功率, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 60 (kHz).
49
圖 3. 17 不同功率, 固定 Dielectric distance 0.8 (mm), Pure He discharge, Quartz 1 (mm) , 60 (kHz).
圖 3. 18 不同功率, 固定 Dielectric distance 1.5 (mm), Pure He discharge, Quartz 1 (mm) , 60 (kHz).
50
圖 3. 19 不同 Dielectric distance 的電壓比較圖, Pure He discharge, Quartz 1 (mm), 30 (slm).
圖 3. 20 不同 Dielectric distance 的電流比較圖, Pure He discharge, Quartz 1 (mm), 30 (slm).
51
圖 3. 21 不同 flow rate, 固 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 20 (kHz), 100 (W).
圖 3. 22 不同 flow rate, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 30 (kHz), 300 (W).
52
圖 3. 23 不同 flow rate, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 40 (kHz), 60 (W).
圖 3. 24 不同 flow rate, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 50 (kHz), 150 (W).
53
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 20 (kHz)
30 slm Voltage 20 slm Voltage 15 slm Voltage 30 slm Current 20 slm Current 15 slm Current
Input power (W) distance 0.5 (mm), Frequency 20 (kHz).
54
30 slm Voltage 20 slm Voltage 15 slm Voltage 30 slm Current 20 slm Current 15 slm Current
Input power (W)
Voltage (kV)
Gas : He
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 30 (kHz)
0 distance 0.5 (mm), Frequency 30 (kHz).
60 80 100 120 140 160 180
30 slm Voltage 20 slm Voltage 15 slm Voltage 30 slm Current 20 slm Current 15 slm Current
Input power (W)
Voltage (kV)
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 40 (kHz)
圖 3. 28 不同 flow rate 的電壓與電流比較圖, Pure He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), Frequency 40 (kHz).
55
30 slm Voltage 20 slm Voltage 15 slm Voltage 30 slm Current 20 slm Current 15 slm Current
Input power (W)
Voltage (kV)
Gas : He
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 50 (kHz)
30 distance 0.5 (mm), Frequency 50 (kHz).
60 70 80 90 100 110 120 130 140 150 160 170 180
30 slm Voltage 20 slm Voltage 15 slm Voltage 30 slm Current 20 slm Current 15 slm Current
Input power (W)
Voltage (kV)
Gas : He
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz)
50 distance 0.5 (mm), Frequency 60 (kHz).
56
圖 3. 31 不同 Frequency, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 30 (slm), 100 (W).
圖 3. 32 不同 Frequency, 固定 Dielectric distance 0.5 (mm), Pure He discharge, Quartz 1 (mm) , 15 (slm), 60 (W).
57
58
59
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Flow rate : 15 (slm)
圖 3. 38 不同頻率與功率的電壓比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 15 (slm).
60
Current ( mA)
Frequency (kHz) Gas : He
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Flow rate : 15 (slm)
圖 3. 39 不同頻率與功率的電流比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 15 (slm).
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
圖 3. 40 不同頻率與功率的電壓比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 20 (slm).
61
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Current ( mA)
Frequency (kHz)
圖 3. 41 不同頻率與功率的電流比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 20 (slm).
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
圖 3. 42 不同頻率與功率的電壓比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 30 (slm).
62
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Current ( mA)
Frequency (kHz)
圖 3. 43 不同頻率與功率的電流比較圖，Pure He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm)與 30 (slm).
Dielectric material : Quartz 1 (mm) Frequancy : 60 (kHz)
Breakdown power : 60 (w) 10 (mm) Voltage
Input power (W)
Voltage (kV) Dielectric distance 0.5 (mm), frequency 60(kHz)與 30 (slm).
63
圖 3. 45 不同氧氣比例比較圖， He discharge, Quartz 1 (mm), Dielectric distance0.5 (mm),
frequency 60(kHz), 120 (W)與 30 (slm).
圖 3. 46 不同氧氣比例比較圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
64
Dielectric material : Quartz 1 (mm) Plasma power : 120 (w)
Frequancy : 60 (kHz)
0
frequency 60(kHz), 120 (W)與 30 (slm).
-6 -4 -2 0 2 4 6
Dielectric material : Quartz 1 (mm) Frequancy : 60 (kHz)
Breakdown power : 60 (w)
Charge (nC)
Voltage (kV)
圖 3. 48 Lissajous Figure， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 60 (W)與 30 (slm).
65
40 60 80 100 120 140 160 180 200 220
20 25 30 35 40 45 50 55 60
Power Efficiency Plasma gas : He Flow rate : 30 (slm) Gap : 0.5 (mm)
Dielectric material : Quartz 1 (mm) Frequancy : 60 (kHz)
Breakdown power : 60 (w)
Efficiency (%)
Input power (W)
圖 3. 49 不同功率電漿吸收效率比較圖， He discharge, Quartz 1 (mm), Dielectric distance
0.5 (mm), frequency 60(kHz), 60 (W)與 30 (slm).
圖 3. 50 比較有 Floating 電極 60–120 W 電漿比較圖, 30 slm Pure He discharge.
66
with floating Voltage (kV) with floating Current (mA) without floating Voltage (kV) without floating Current (mA)
Input power (W)
Voltage (kV) Dielectric : Quartz 1 (mm) Gap : 1.0 (mm)
Frequancy : 60 (kHz)
Current (mA)
圖 3. 52 比較 Floating 電極 150–180 W 電漿比較圖, 30 slm Pure He discharge.
67
圖 3. 53 Floating 電極 60 W 電漿圖, 30 slm Pure Ar discharge 與 60 kHz.
245 246 247 248 249
0 20 40 60 80 100 120
Intensity (a.u.)
λ (µm)
Sim (340 K) Exp
Flow rate : 30 (slm) Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) Spectrum : NO - γ position : 5 (mm)
圖 3. 54 量測 OES, NO - γ 計算其 Rotational Temperature 為 340 K(67℃), △λ= 0.005 nm, Integration time = 200 nm.
68 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (W)
圖 3. 55 不同位置電漿溫度分布圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
160 180 200 220 240 260 280 300
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Post - Discharge
NO 267.22 distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
69
160 180 200 220 240 260 280 300
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Discharge
NO 267.22
圖 3. 57 Discharge 180-280 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance
0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
260 280 300 320 340 360 380 400 420
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Post - Discharge
Intensity (a.u.)
圖 3. 58 Post - discharge 280-400 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
70
260 280 300 320 340 360 380 400 420
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Discharge
Intensity (a.u.)
圖 3. 59 Discharge 280-400 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance
0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
300 302 304 306 308 310 312 314 316 318
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Post - Discharge
Intensity (a.u.)
Wavelength (nm) OH 309
圖 3. 60 Discharge OH 309 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance
0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
71
380 400 420 440 460 480 500 520 540 560 580 600 620 640 660 680 0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Post - Discharge
N III 420
圖 3. 61 Post - discharge 400-650 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
380 400 420 440 460 480 500 520 540 560 580 600 620 640 660 680 0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Discharge
Intensity (a.u.)
圖 3. 62 Discharge 400-650 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
72
600 650 700 750 800 850 900
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Post - Discharge
Intensity (a.u.)
圖 3. 63 Post - Discharge 650-900 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric
distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
600 650 700 750 800 850 900
0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : Discharge
Intensity (a.u.)
圖 3. 64 Discharge 650-900 nm 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
73
圖 3. 65 N2 於電漿中受到電子的撞擊，產生激發態與放光反應能階表.
圖 3. 66 NO 於電漿中受到 N2 激發態的撞擊，產生激發態與放光反應能階表.
74
100 125 150 175 200 225 250 275 300
Plasma gas : He Flow rate : 30 (slm) Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w)
(mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
175 200 225 250 275 300 325 350 375 400 425
N2+ 391.44 N2 380.5
Plasma gas : He Flow rate : 30 (slm) Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w)
(mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
75
圖 3. 69 不同 Z 軸距離 Post - Discharge 400 - 650 nm 光譜圖， He discharge, Quartz 1
(mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
450 500 550 600 650 700 750 800 850 900 950
Intensity (a.u)
Wavelength (nm) 17.5 (mm)
12.5 (mm) 7.5 (mm) 2.5 (mm) Plasma gas : He Flow rate : 30 (slm) Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w)
He I 706
O 844 O I 777
O 725 He I 668
圖 3. 70 不同 Z 軸距離 Post - Discharge 650 - 900 nm 光譜圖， He discharge, Quartz 1
(mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
76 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : 2.5 (mm)
Intensity (a.u.)
O2 Concentration (%)
NO 271.32 nm
(mm), frequency 60(kHz), 120 (W)與 30 (slm).
0.0 0.2 0.4 0.6 0.8 1.0 Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : 2.5 (mm)
Intensity (a.u.)
O2 Concentration (%)
圖 3. 72 不同氧氣比例 N2 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).
77
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : 2.5 (mm)
Intensity (a.u.)
O2 Concentration (%)
圖 3. 73 不同氧氣比例 He 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5
(mm), frequency 60(kHz), 120 (W)與 30 (slm).
0.0 0.2 0.4 0.6 0.8 1.0
Dielectric : Quartz 1 (mm) Gap : 0.5 (mm)
Frequancy : 60 (kHz) Input power : 120 (w) position : 2.5 (mm)
Intensity (a.u.)
O2 Concentration (%)
圖 3. 74 不同氧氣比例 O atom 光譜圖， He discharge, Quartz 1 (mm), Dielectric distance 0.5 (mm), frequency 60(kHz), 120 (W)與 30 (slm).