• 沒有找到結果。

第五章 製程應用製作大面積光學元件

6.2 未來研究方向

參考文獻

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附錄 A 作者簡介

姓名:朱映達 性別:男

生日:民國74 年 02 月 04 日 求學經歷:

國立台灣大學 機械工程學研究所 畢業(98.7) 國立台灣科技大學 高分子工程系(二技) 畢業(96.6) 國立高雄應用科技大學 機械工程科(五專) 畢業(94.6)

附錄 B 個人著作列表

 國際會議論文

1. S.Y. Yang*, T.C. Huang, P.H. Huang, F.S. Cheng, Y.T. Chu, and H.C. Lai,

“Large area nanoimprint equipment and processes”, The 1st Asian

Symposiumon Nano Imprint Lithography (ASNIL 2008), April 24-26, 2008,

Seoul, Korea. (Invited contribution)

2. Sen-Yeu Yang*, Tzu-Chien Huang, Yen-Hao Chen, Po-Hsun Huang, and

Ying-Ta Chu, “Effects of processing parameters on the form accuracy of

plastic aspheric lenses using a be-cu mold insert in injection molding process”, The Polymer Processing Society 24th Annual Meeting(PPS-24), June15-19, 2008, Salerno, ITALY.

3. Sen-Yeu Yang*, Tzu-Chien Huang, Yen-Hao Chen, Po-Hsun Huang, and

Ying-Ta Chu, “The effects of processing parameters on the oxidation of

Be-Cu alloy mold inserts in injection molding”, The 42nd

IUPAC World Polymer Congress(MACRO2008), June 29-July 4, 2008, Taipei,Taiwan.

4. Po-Hsun Huang, Tzu-Chien Huang, Yi-Ting Sun, Ying-Ta Chu and Sen-Yeu Yang*, “Fabrication of Large Area Resin Microlens Arrays

Using Gas-assisted Ultraviolet Embossing”, Asia Pacific Conference on

Optics Manufacture 2009(APCOM 2009), February 11-14, 2009,

Taipei,Taiwan.

 專利

1. 楊申語、黃子健、吳景棠、賴昕駿、朱映達“一種於滾輪表面製作微奈 米結構之方法",中華民國發明專利申請中,民國97 年。 

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