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Results and Discussion

6.2 Future Work

Besides double-gate MOSFET and SOI, there are still many structures of devices. In thesis, we discuss these two structures because of similarity in structure. Recently, ultra thin barrier device is proposed. Its structure is between double-gate and SOI MOSFET. On the other hand, double-gate structure will become single gate if we set thickness of bulk thicker and only one gate in our condition. In terms of structure, we can discuss several kinds of structures or characteristics of devices at the same time to make formula more general. By experience in this thesis, model more general may lose accuracy. Here, we only consider those direct outer conditions as regressor variables. Transformation of regressor variables may be important and efficient factors. Besides, we only use the most popular model -linear regression model. Advanced model may arise better results for more complicated data.

[1] M. Choi, L. Milor, and L. Capodieci, ”Simulation of the circuit performance impact of lithography in nanoscale semiconductor manufacturing”, Proceedings of Interna-tional Conference on Simulation of Semiconductor Processes and Devices, 3-5 Sep.

2003, pp. 219-222.

[2] Y. Li, T. W. Tang, and S. M. Yu, ”A Quantum Correction Model for Nanoscale Double-Gate MOS Devices Under Inversion Conditions”, Journal of Computational Electronics, Vol. 2, No. 2-4, Dec. 2003, pp. 491-495.

[3] J. W. Lee and Y. Li, ”Silicidation Enhanced Poly-Depletion and Flat Band Voltage Shift in Nanoscale Metal-Oxide-Silicon Structures”, Book of Abstracts of The 1st International Meeting on Applied Physics, Badajoz, Spain, Oct. 14-18, 2003, p. 798.

[4] S. C. Lo, J. H. Tsai, J. M. Hsu, and Y. Li, ”Quantum Mechanical Gate Current Sim-ulation in MOSFETs with Ultrathin Oxides”, Proceedings of The 2003 International

99

100 BIBLIOGRAPHY

Conference on VLSI, CSREA Press, Las Vegas, Nevada, USA June, 23-26, 2003, pp.

244-250.

[5] S. C. Lo, Y. Li, and J. H. Tsai, ”Quantum Mechanical Simulation of High-k Gate Dielectrics Metal-Oxide-Semiconductor Structures”, WSEAS Transactions on Elec-tronics, Vol. 1, No. 1, Jan. 2004, pp. 170-175.

[6] Y. Li, ”A Quantum Correction Poisson Equation for Metal-Oxide-Semiconductor Structure Simulation”, Semiconductor Science and Technology, Vol. 19, No. 7, July 2004, pp. 917-922.

[7] S. M. Ramey and D. K. Ferry, ”Implementation of Surface Roughness Scattering in Monte Carlo Modeling of Thin SOI MOSFETs Using the Effective Potential”, IEEE Transactions on Nanotechnology, Vol. 2, No. 2, June 2003, pp. 110-114.

[8] J. R. Watling, A. R. Brown, A. Asenov and D. K. Ferry, ”Quantum Corrections in 3-D 3-Drift 3-Diffusion Simulations of 3-Decanano MOSFETs Using an Effective Potential”, Simulation of Semiconductor Processes and Devices, 2001.

[9] Y. Li and S. M. Yu, ”A unified quantum correction model for nanoscale single-and double-gate MOSFETs under inversion conditions”, Nanotechnology, 2004, pp.

1009-1016.

[10] R. Akis, S. N. Miliˇci´c, D. K. Ferry and D. Vasileska, ”An Effective Potential Method for Includeing Quantum Effects Into the Simulation of Ultra-Short and Ultra-Narrow Channel MOSFETs”, Proceedings of the 4th International Conference on Modeling, 2001.

[11] J. R. Schrieffer, Semiconductor Surface Physics, University of Pennsylvania press, 1957, Philadelphia.

[12] Sze, S. M., Physics of semiconductor devices, 1981, John Wiley & Sons,Inc

[13] Sze, S. M., Semiconductor devices, physics and technology-2nd ed, 1985, John Wiley

& Sons,Inc

[14] Y. Li, H.-M. Lu, T.-W. Tang, and S. M. Sze, ”A Novel Parallel Adaptive Monte Carlo Method for Nonlinear Poisson Equation in Semiconductor Devices”, Mathematics and Computers in Simulation, Vol. 62, No, 3-6, March 2003, pp. 413-420.

[15] Y. Li and S.-M. Yu, ”A Parallel Adaptive Finite Volume Method for Nanoscale Double-Gate MOSFETs Simulation”, Journal of Computational and Applied Mathe-matics, Vol. 17., No. 1, March 2005, pp. 87-99

[16] D. J. Roulston, An Introduction to the physics of Semiconductor Devices, Oxford University Press, New York, 1999.

102 BIBLIOGRAPHY

[17] Y. Li, S.S. Chung, and J.-L. Liu, ”A Novel Approach for the Two-dimensional Sim-ulation of Submicron MoSFETs Using Monotone Iterative Method”, Proceedings of International Symposium onVLSI Technology, Systems, and Applications, pp. 27-30, 8-10 June 1999.

[18] Y. Li, J.-W. Lee, T.-W. Tang, T.-S. Chao, T.-F, Lei, and S. M. Sze,” Numerical Simu-lation of Quantum Effects in High-k Gate Dielectrics MOS Structures using Quantum Mechanical Models”, Computer Physics Communications, Vol. 147, No. 1-2, August 2002, pp. 214-217.

[19] M. G. Ancona, ”Quantum Correction to the Equation of State of an Electron Gas in a Semiconductor”, Physical Review B, Vol. 39, NO. 13, 1989, pp. 9536-9540.

[20] T. Ando, A. B. Fowler, and F. Stern, ”Electronic properties of two-dimensional sys-tems”, Review Modern Physics, Vol. 54, 1982, pp. 437.

[21] A. S. Spinelli, A. Benvenuti, ”Self-consistent Model for Quantum Effect in n-MOS Transistors”, IEEE Transactions on Electron Devices, Vol. 45, NO.6, 1998, pp. 1342-1349.

[22] T. Janik and B. Majkusiak, ”Influence of carrier energy quantization on the threshold voltage of metal-oxide-semiconductor transistor”, J. Appl. Phys., 1994, Vol. 75, pp.

5186-5190

[23] T. Ando, A. B. Fowler, and F. Stern, ”Electronic properties of twe-dimensional sys-tems”, Rev. Mod. Phys., 1982, Vol. 54, pp. 437-672.

[24] R. Rios and N. D. Arora, ”Determination of ultra-thin gate oxide thickness for CNOS structures using quantum effects”, in IEDM Tech. Dig., 1994, pp. 613-616.

[25] C. Ringhofer, C. Gardner and D. Vasileska, ”Effective potentials and quantum fluid models: A thermodynamic approach,” Inter. J. on High Speed Electronics and Systems 13, 771, 2003.

[26] C. Dewdney and B, J, Hiley, ”A quantum potential description of one-dimensional time-dependent scattering from square barriers and square wells,” Round. Phys., vol.

12, pp. 27-48, 1982.

[27] D. K. Ferry and J.-R. Zhou, ”Form of the quantum potential for use in hydrodynamic equations for semiconductor device modelling,” Physical Review B, vol. 48, pp. 7944-7950, 1993.

[28] P. Feynman amd H. Kleinert, ”Effective classical partition functions,” Physical Re-view A, vol. 34, pp. 5080-5084, 1986.

[29] Y. Li, ”A Comparative Study of Numerical Algorithms in Calculating Eigenpairs of the Master Equation for Portein Folding Kinetics”, Abstracts of the 10th International Workshop on Computational Electronics (IWEC-10), 24-27 Oct. 2004, pp. 201-202.

104 BIBLIOGRAPHY

[30] G. J. Iafrate, H. L. Grubin, and D. K. Ferry, ”Utilization of quantum distribution functions for ultra-submicron device transport”, Journal de Physique, Vol. 42(Colloq.

7), 1981, pp. 307-312.

[31] E. Wigner, ”On the quantum correction for thermodynamic equilibrium”, Phys. Rev., Vol. 40, 1932, pp. 749-759.

[32] D. K. Ferry, J. R. Barker, ”Open problems in quantum simulation in ultra-submicron devices”, VLSI Design, Vol.8, 1998, pp. 165-172.

[33] D. K. Ferry, ”Effective potential and the onset of quantization in ultrasmall MOS-FETs”, Superlattices and Microstructures, Vol. 28, 2000, pp.419-423.

[34] D. Vasileska and D. K. Ferry, ”Scaled Silicon MOSFETs: Universal Mobility Behav-iou”, IEEE Trans. Electron Dev., Aprial 1997, Vol. 44, pp. 577-583

[35] D. K. Ferry, ”Simulation at the start of the new millennium: Crossing the quantum mechanical threshold”, VLSI Design, inpress.

[36] D. K. Ferry adn W. Howard, ”Negative Field-Effect Mobility on (100) Si Surfaces”, Rhys. Rev. Lett., Vol. 16, May 1966, pp. 797-799.

[37] Peter T. Brockwell, Richard A. Davis, Introduction to Time Series And Forecasting, 2nd ed, 2002, Springer-Verlag New ork, Inc.

[38] Douglas C. Montgomery, Elizabeth A.Peck, G. Geoffrey Vining, Introduction to Lin-ear Regression Analysis, 3rd ed, 2001, John Wiley & Sons, Inc.

[39] Wu, C.-F. Jeff, Experiments: planning, analysis. and parameter design optimization, 2000, John Wiley & Sons, Inc.

[40] Raymond H. Myers, Douglas C. Montgomery, Response Surface Methodology : process and product optimization using designed experiments, 2nd ed, 2002, John Wiley & Sons, Inc.

[41] G. E. P. Box and Norman R. Draper, Empirical Model-Building and Response Sur-faces, New York, Wiley, 1987.

[42] D. K. Ferry,R. Akis, D. Vasileska, ”Quantum effects in MOSFETs: Use of and effec-tive potential in 3D Monte Carlo simulation of ultra-short channel devices”, IEDM Technical Digest, Electron Devices Meeting, 2000, pp. 287-290

[43] D. K. Ferry, ”The onset of quantization in ultra-submicron semiconductor devices,”

Superlattices and Microstructures, Vol. 27, No. 2/3, 2000.

[44] Y. Li, H.-M. Chou, ”A comparative study of electrical characteristic on sub-10-nm double gate mosfets”, IEEE Transactions, Nanotechnology, Vol. 4, 2005, pp. 645-647.

106 BIBLIOGRAPHY

[45] M. leong, H.-S. Wong, E. Nowak, J. Kedzierski, and E. C. Hones. ”High performande double-gate device technology challenges and opportunities”, in Proc. Int. Quality electronic Design Symp., Mar. 18-21, 2002, pp. 492-495.

[46] L. Wei, Z. Chen, and K. Roy, ”Design and optimization of double gate SOI MOS-FET’s for low voltage low power circuits”, in Proc. IEEE Int. Silicon-on-Insulator Conf., Oct. 5-8, 1998, pp. 69-70.

[47] Y. Li and S. M. Yu, ”A two-dimensional quantum transport simulation of nanoscale double-gate MOSFET’s using parallel adaptive technique”, IEICE Trans. Inform.

Syst., Jul. 2004, Vol. E87-D, No. 7, pp. 1751-1758.

[48] J. Bude, ”MOSFET modeling into the ballistic regime,” in Proc. Int. Conf, Simulation Semiconductor Processes and Devices, 2000, pp. 23-26

[49] A. Abramo, A Cardin, L. Selmi, and E. Sangiorgi, ”Two-dimensional quantum me-chanical simulation of charge distribution in silicon MOSFETs”, IEEE Trans. Elec-tron Devices, Oct. 2000, Vol. 47, pp. 1858-1863.

[50] H. Tsuchiya and T. Miyoshi, ”Quantum transport modeling of ultrasmall semicon-ductor device”, IEICE Trans. Electron., 1999, Vol. E82-C, 880-888.

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