未來研究方向

製作光學擴散板、增光膜(brightness enhanced film, BEF)或超薄型導光板、雙面 微結構導光板等具微結構之大面積薄型光學元件。如圖 6-3 所示，新設計之壓

(a) 上模腔

(b) 下模腔

圖6-1 有效壓印區域大小為 320 mm × 240 mm 的壓印模腔

(a)

(b)

圖6-2 壓印模腔固定於直立式射出機之示意圖

圖6-3 大面積紫外光固化氣壓壓板式壓印製程示意圖

圖6-4 大面積菲涅爾鏡片壓印複製結果

圖6-5 15 吋顯示器用之增亮膜壓印複製結果

圖6-6 15 吋顯示器用之網點式導光板壓印複製結果

圖6-7 大面積紫外光固化氣囊輔助壓印製程與設備示意圖

參考文獻

[1] H. Becker, and C. Gärtner, “Polymer based micro-reactors,” Reviews in Molecular Biotechnology, Vol. 82, pp. 89-99 (2001).

[2] Jenoptik Mikrotechnik, Datasheet of HEX03 hot embossing system. (2002).

[3] M. T. Gale, “Replicated Diffractive Optics and Micro-Optics”, Optics & Photonics News, Vol. 14, pp. 24-29, 2003.

[4] M. Heckele and W. K. Schomburg, “Review on micro molding of thermoplastic polymers”, Journal of Micromechanics and Microengineering, Vol. 14, R1-R14, 2004.

[5] 張哲豪，流體微熱壓製程開發研究，國立台灣大學博士論文，民國 93 年 6 月。

[6] Bender M, Otto M, Hadam B, et al. “Fabrication of nanostructures using a UV-based imprint technique,” Microelectronic Engineering, Vol. 53, pp. 233-236, 2000.

[7] J. H. Chang and S. Y. Yang, “Gas Pressurized Hot Embossing for Transcription of Micro-features,” Microsystem Technologies, Vol. 10, pp76-80, 2003.

[8] J. H. Chang, F. S. Cheng, C. C. Chao, Y. C. Weng, S. Y. Yang, and L. A. Wang,

“Direct imprinting using soft mold and gas pressure for large area and curved surfaces”, J. Vac. Sci. Technol. A, Vol. 23, pp. 1687-1690, 2005.

[9] J. H. Chang and S. Y. Yang, “Development of Fluid-Based Heating and Pressing Systems for Micro Hot Embossing,” Microsystem Technologies, Vol. 11, pp.396-403, 2005.

[10] B. Vratzov, A. Fuchs, M. Lemme, W. Henschel, and H. Kurz, “Large scale ultraviolet-based nanoimprint lithography,” J. Vac. Sci. Technol. B, Vol. 21 2760-2764, 2003.

excellent uniformity, high yield, and fast nanoimprint across a 100 mm field”, Nano Lett., Vol. 6, pp. 2438 -2441, 2006.

[12] J. H. Jeong, K. D. Kim, Y. S. Sim, H. K. Sohu, and E. S. Lee, “A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp,”

Microelectronic Engineering, Vol. 82, 2005, pp. 180-188.

[13] H. Lee and G.. Y. Jung, “Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin,” Microelectronic Eng., Vol. 77, pp.168-174, 2005.

[14] H. Lee, S. Hong, K. Yang, and K. Choi, “Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography,”

Microelectronic Eng., Vol. 83, pp.323-327, 2006.

[15] M. L. Berre, J. Shi, C. Crozatier, G.. V. Casqquillars, and Y. Chen,

“Micro-aspiration assisted lithography,” Microelectronic Enginnering, Vol. 84, pp.

864-867, 2007

[16] S. Y. Yang, F. S. Cheng, S. W. Xu, P. H. Huang, and T. C. Huang, “Fabrication of Microlens Arrays Using UV Micro-Stamping with Soft Roller and Gas-pressurized Platform” Microelectronic Engineering, Vol. 85, pp. 603-609, 2008.

[17] F. S. Cheng, S. Y. Yang, and C. C. Chen, “Novel hydrostatic pressuring mechanism for soft UV-inprinting processes” Journal of Vacuum Science and Technology B, Vol. 26, pp. 132-136, 2008.

[18] M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, H. Nounu, M.

Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, “Step and Flash Imprint Lithography: A new approach to high-resolution patterning,” Proc. of SPIE, Vol. 3676, pp. 379-389, 1999.

[19] P. Dannberg, R. Bierbaum, L. Erdmann, and A. Braeuer, “Wafer scale integration of micro-optic and optoelectronic elements by polymer UV reaction molding,”

Proc. of SPIE, Vol. 3631, pp. 244-251, 1999.

[20] S. M. Kim, D. Kim, and S. Kang, “Replication of micro-optical components by ultraviolet-molding process,” Journal of Microlithography, Microfabrication, and Microsystems, Vol. 2, pp. 356-359, 2003.

[21] J. H. Jeong, K. D. Kim, D. G. Choi, J. H. Choi, and E. S. Lee, “Ultraviolet nanoimprint lithography applicable to thin-film transistor liquid-crystal display,”

Proc. Of SPIE, Vol. 6517, 6517161-6517168, 2007.

[22] S. J. Liu and Y. C. Chang, “A novel soft-mold roller embossing method for the rapid fabrication of micro-blocks onto glass substrate,” Journal of Micromechanics and Microengineering, Vol. 17, 172-179, 2007.

[23] H. Lee, S. Hong, K. Yang, and K. Choi, “Fabrication of 100nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography,” Applied Physics Letters, Vol. 88, 143112, 2006.

[24] S. H. Ahn, J. W. Cha, H. Myung, S. M. Kim and S. Kang, “Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns,”

Appl. Phys. Lett., Vol. 89, pp. 2131011-2131013, 2006.

[25] 陳雅雯，光學膜片紫外光固化轉寫成形之有限元素分析研究，國立交通大學

民國95 年 6 月。

[30] 許淑雯，氣壓輔助滾輪紫外光轉印製程之開發與應用，國立台灣大學碩士論 文，民國96 年 6 月。

[31] C. Y. Chang, S. Y. Yang, L. S. Huang and K. H. Hsieh “Fabrication of polymer microlens arrays using capillary forming with a soft mold of micro-holes array and UV-curable polymer,” Optics Express, Vol. 14, pp. 6253-6258, 2006.

[32] X. D. Huang, L. R. Bao, X. Cheng, L. J. Guo, and S. W. Pang, A. F. Yee, “Reversal imprinting by transferring polymer from mold to substrate”, J. Vac. Sci. Technol. B, Vol. 20, No. 6, pp. 2872-2876, 2002.

[33] W. Hu, B. Yang, C. Peng, and S. W. Pang, “Three-dimensional SU-8 structures by reversal UV imprint,” J. Vac. Sci. Technol. B, Vol. 24, pp. 2225-2229, 2006.

[34] B. Yang, C. Peng, and S. W. Pang, “Multiple level nanochannels fabricated using reversal UV nanoimprint,” J. Vac. Sci. Technol. B, Vol. 24, pp. 2984-2987, 2006.

[35] N. Kehagias, V. Rebound, G. Chansin, M. Zelsmann, C. Jeppeses, C. Schuster, M.

Kubenz, F. Reuther, G. Gruetzner, and C. M. Sotomayor Torres, “Reverse-contact UV nanoimprint lithography for multilayered structure fabrication”, Nanotechnology, Vol. 18, pp. 2954-2957, 2005.

[36] K. S. Han, S. H. Hong, and H. Lee, “Fabrication of complex nanoscale structures on various substrates,” Applied Physics Letters, Vol. 91, 123118, 2007

[37] H. Hiroshima, S. Inoue, N. Kasahara, J. Taniguchi, I. Miyamoto, and M. Komoro,

“Uniformity in patterns imprinted using photo-curable liquid polymer,” Jpn. J.

Appl. Phys., Vol. 41, pp. 4173-4177, 2002.

[38] A. Fuchs, M. Bender, U. Plachetka, U. Hermanns, and H. Kurz, “Ultraviolet-based nanoimprint at reduced environment pressure,” J. Vac. Sci. Technol. B, Vol. 23, pp.

2925-2928, 2005.

[39] P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, M.

Stewart, J. Ekerdt, S. V. Sreenivasan, J. C. Wolfe, and C. G. Willson, “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography,” J. Vac. Sci. Technol. B, Vol. 17, pp.

2965-2969, 1999.

[40] D. J. Resnick, S. V. Sreenivasan, and C. G. Wilison, “Step & flash imprint lithography,” Mater. Today, Vol. 8, pp. 34-42, 2005.

[41] X. Liang, H. Tan, Z. Fu, and S. Y. Chou, “Air bubble formation and dissolution in dispensing nanoimprint,” Nanotechnology, Vol. 18, in press, 2007.

[42] H. Hiroshima, M. Komuro, N. Kasahara, Y. Kurashima, and J. Taniguchi,

“Elimination of pattern defects of nanoimprint under atmospheric conditions,” Jpn.

J. Appl. Phys., Vol. 42, pp. 3849-3853, 2003.

[43] H. Hiroshima and M. Komuro “Control of bubble defects in UV nanoimprint,” Jpn.

J. Appl. Phys., Vol. 46, pp. 6391-6394, 2007.

[44] H. Hiroshima and M. Komuro, “UV-nanoimprint with the assistance of gas condensation at atmospheric environment pressure,” J. Vac. Sci. Technol. B, Vol.

25 2333-2336, 2007.

附錄一 作者簡介

姓名：黃柏勳 性別：男

生日：民國73 年 07 月 14 日 求學經歷：

國立台灣大學 機械工程學研究所 畢業(97.7)

國立台灣科技大學 機械工程系（二技） 畢業(95.6)

國立高雄應用科技大學 機械工程科（五專） 畢業(93.6) E-mail：[email protected]

附錄二 個人著作

„ 國際期刊論文(SCI, EI)

1. Tzu-Chien Huang, Po-Hsun Huang, Sen-Yeu Yang*, and Tai-Yu Ko,

“Improving Flow Balance during Filling a Multi-Cavity Mold with Modified Runner Systems” International Polymer Processing. (accepted, in press) [SCI]

2. L.T. Jiang, T.C. Huang, C.R. Chiu, C.Y. Chang, S.Y. Yang*, and P.H. Huang,

"Direct Fabrication of Rigid Microstructures on A Metallic Roller Using A Dry Film Resist," Journal of Micromechanics and Microengineering, Vol.18, No.1, in press (2008). [SCI, EI]

3. Po-Hsun Huang, Tzu-Chien- Huang, Yi-Ting Sun, and S. Y. Yang*,

“Fabrication of large-area resin microlens array using gas-assisted ultraviolet embossing”, Optics Express, Vol.16, No. 5, 3041-3048 (2008) [SCI, EI] (was reported by Photonics Spectra magazine: May 2008, Gas-assisted embossing and UV-curing combine to make microlens arrays)

4. Tzu-Chien Huang, Jian-Ren Ciou, Po-Hsun Huang, Kuo-Huang Hsieh, and Sen-Yeu Yang*, “Fast fabrication of integrated surface-relief and particle-diffusing plastic diffusers by use of a hybrid extrusion roller embossing” Optics Express, Vol.16, No.1, 440-447 (2008). [SCI, EI]

5. Sen-Yeu Yang*, Fang-Sung Cheng, Sue-Wen Xu, Po-Hsun Huang, and Tzu-Chien Huang, “Fabrication of Microlens Arrays Using UV Micro-Stamping with Soft Roller and Gas-pressurized Platform”

Microelectronic Engineering, Vol.85, No. 3, 603-609 (2007). [SCI, EI]

6. Sen-Yeu Yang*, Tzu-Chien Huang, Po-Hsun Huang, and Tai-Yu Ko,” Study on flow imbalance during filling a multi-cavity mold using a H-type runners”, Key Engineering Materials, Vol.364-366, 1306-1311 (2008). [EI]

„ 投稿、審稿中之國際期刊

1. Po-Hsun Huang, Tzu-Chien Huang, Yi-Ting Sun, and Sen-Yeu Yang*,

“Bubble-free large area replication of microstructures using gas-assisted UV embossing with complete reversal imprinting and gap-retained vacuuming”, Journal of Micromechanics and Microengineering, (under peer review process) 2. Sen-Yeu Yang*, Tzu-Chien Huang, Jian-Ren Ciou, Po-Hsun Huang, and

microstructure using extrusion roller-embossing” Journal of The Chinese Society of Mechanical Engineers. (under peer review process)

3. Sen-Yeu Yang*, Tzu-Chien Huang, Jian-Ren Ciou, Po-Hsun Huang, and Jing-Tang Wu, “Direct melt transcription of microstructure using extrusion roller embossing” Polymers for Advanced Technologies (under peer review process)

4. Po-Hsun Huang, Tzu-Chien Huang, Jian-Wei Chen, Yi-Ting Sun, and Sen-Yeu Yang*, “Microlens array with high transcription fabricated using modified reversal imprinting process” (in preparation)

5. Po-Hsun Huang, Tzu-Chien Huang, Jian-Wei Chen, Yi-Ting Sun, and Sen-Yeu Yang*, “Large-area optical elements fabricated using reversal gas-assisted UV imprinting” (in preparation)

„ 國際會議論文

1. Po-Hsun Huang, Jian-Wei Chen, Tzu-Chien Huang, Yi-Ting Sun, and Sen-Yeu Yang*, “Modified reversal imprinting for fabricating microlens array with high height transcription,” 34th International Conference on Micro- and Nano-Engineering (MNE 2008), 15-18 Sep 2008, Athens, Greece. (submitted) 2. S.Y. Yang*, T.C. Huang, P.H. Huang, F.S. Cheng, Y.T. Chu, and H.C. Lai,

“Large area nanoimprint equipment and processes”, The 1st Asian Symposium on Nano Imprint Lithography (ASNIL 2008), 24-26 April 2008, Seoul, Korea.

(Invited contribution)

3. Po-Hsun Huang, Tzu-Chien- Huang, Sen-Yeu Yang*, Yi-Ting Sun, and John G.

Loeser, “Large-area microlens arrays fabricated by integrated gas-assisted UV-curing embossing with UV-LED array lamp”, The 52nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2008), 27-30 May 2008, Portland, Oregon, USA.

4. Sen-Yeu Yang*, Tzu-Chien- Huang, Jian-Ren Ciou, Po-Hsun Huang, and John G. Loeser, “Diffusers with both surface-relief and particle-diffusing functions fabricated using hybrid extrusion roller embossing”, The 52nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2008), 27-30 May 2008, Portland, Oregon, USA.

5. Sen-Yeu Yang*, Tzu-Chien Huang, Jian-Ren Ciou, Po-Hsun Huang, and Jing-Tang Wu, “A preliminary experiment of direct transcription of microstructure using extrusion roller-embossing” International Conference on Advanced Manufacturing Technology 2007 (ICAM 2007), 26-30 Nov 2007, Tainan, Taiwan.

6. Fang-Sung Cheng, Po-Hsun Huang, Sue-Wen Xu, and Sen-Yeu Yang*,

"Fabrication of Microlens Arrays Using Soft Roller Embossing with Gas-Pressurized Platform," 33rd International Conference on Micro- and Nano-Engineering (MNE 2007), 23-26 Sep 2007, Copenhagen, Denmark.

7. Sen-Yeu Yang*, Tzu-Chien Huang, Po-Hsun Huang, Tai-Yu Ko,” Study on flow imbalance during filling a multi-cavity mold using a H-type runners”, Asia Pacific Conference on Optics Manufacture 2007 (APCOM 2007), 11-13 Jan 2007, Hong Kong, China.

„ 國內研討會論文

1. Sen-Yeu Yang*, Tzu-Chien Huang, Po-Hsun Huang, Tai-Yu Ko,” Effects of Processing Conditions on flow imbalance during filling a multi-cavity mold using a H-type runners”, Annual Meeting of the Polymer Society 2007, 19-20 Jan 2007, Taipei, Taiwan.

2. Chao-Chang A. Chen*, and Po-Hsun Huang, “Injection Molding of Thin Plate with Double-Side Micro Features” 5th National Conference on Precision Manufacturing, 11-12 Nov 2006, Kaohsiung, Taiwan.

3. Chao-Chang A. Chen*, Po-Hsun Huang, Wen-Pin Liu, and Ching-Hui Yeh,

“Effects of Geometric Features to Fiber Orientation in Injection Molding Process” Mold Conference 2006, 17-18 Aug 2006, Taipei, Taiwan.

4. Min-Wen Wang*, Kai-Hsiang Chang, and Po-Hsun Huang, “Process Parameters Optimization on Injection Molding of a Micromechanics Part”

Annual Meeting of the Polymer Society 2004, 21-22 Feb 2004, Taipei, Taiwan.