加高溫度後氣體不易吸附且電子分布情形會往高溫會增加場發射出 來的電子電流也會增大。
4-6 Nb tip 不同吸附氣體電流穩定性比較
在通入不一樣的惰性氣體會導致針尖的電流在一開始變小有可能是 氣體吸附在針尖上，當場發射 1hr 後在針尖上的氣體都跑光了所以會 慢慢退吸附，也有可能是吸附氣體在上面的擴散造成其他稜線也會亮 導致於電流的增加，而 Ar 氣的吸附比起其他氣體還要強 1hr 後增加 幅度比起其餘氣體要小。
4-7 Nb tip 不同吸附氣體 F-N plot 比較
通入越大分子量的惰性氣體時 F-N plot 的斜率會上升，表面功函數上 升，而斜率不僅僅只會影響場增益係數，在通入不同氣體吸附時或許 要考慮其他的因素。
參考文獻
[8]Chang C-C, Kuo H-S, Tsong T T and Hwang I-S , “A fullycoherent electron beam from a noble-metal covered W(111)single-atom emitter Nanotechnology Nanotechnology”.20 115401.(2009)
[9]Gadzuk, J. W. “Many-body tunneling-theory approach to field emission of electrons from solidsSurface Science”.15.3 (1969) [10]superconductivity
[11]Uehara, Y., et al. “Single NbO nano-crystal formation on low
for Atomic-Resolution Scanning Tunneling
Microscopy/Spectroscopy”.Japanese Journal of Applied Physics 49.2R (2010)
[13]Nagaoka, K., et al. “Monochromatic electron emission from the macroscopic quantum state of a superconductor. ” Nature 396.6711 (1998)
[14]Hasselbach, Franz. “Progress in electron-and ion-interferometry.”
Reports on Progress in Physics 73.1 (2010)
[15]Hans-Werner Fink , “Point source for ions and electrons”,Phys. Scr.
38 260,(1988)
[16] Hans-Werner Fink, “Mono-atomic tips for scanning tunneling microscopy”,IBM J. Res. Dev. 30,460 (1986)
[17][3] T. Y. Fu, L. C. Cheng, C. H. Nien and T. T. Tsong, “Method of Creating a Pd-Covered Single Atom Sharp W Pyramidal Tip: Mechanism and Energetic of Its Formation”, Phys. Rev. B 64 , 113401-04 (2001).
[18]Hong-Shi Kuo, “Noble Metal/W(111) Single-Atom Tips and Their Field Electron and Ion Emission Characteristics ”,Jpn. J. Appl. Phys. 45 8972(2006)
[19] T.E. Madey, C.-H. Nien, K. Pelhos, J.J. Kolodziej, I.M. Abdelrehim, H.-S. Tao,“Coexistence of {011} facets with {112} facets on W(111) induced by ultrathin films of Pd”, Phys. Rev. B 59,10335 (1999)
[20] A. P. Janssen and J. P. Jones, “The sharpening of field emitter tips by ion sputtering”, J. Phys. D: Appl. Phys. 4118,(1971)
[21]Moh’d Rezeq, Jason Pitter, Robert Wolkow, “Tungsten nanotip
fabrication byspatially controlled field-assisted reaction with nitrogen”, J.
Chem. Phys.124,204716 (2006)
[22] Binh, V.T. and N. Garcia, “On the Electron and Metallic Ion
Emission from Nanotips Fabricated by Field-Surface-Melting Technique -Experiments on W and Au Tips”. Ultramicroscopy. 42(1992)
[23]S. K. Guharay and J. Orloff, “Ion Beams and Their Applications in High-ResolutionProbe Formation”,IEEE Trans. Plasma Sci. 33, 1911 (2005)
[24]Giannuzzi, L. A.; Drown, J. L.; Brown, S. R.; Irwin, R. B.;
Stevie,F.Micro. “Applications of the FIB lift-out technique for TEM specimen preparation.”Res. Technol.,41, 285. (1998)
[25] P Ted Liang, Alan Stivers, Richard Livengood, Pei-Yang
Yan,Guojing Zhang, and Fu-Chang Lo,“Progress in extreme ultraviolet mask repair using a focused ion beam”,J. Vac. Sci. Technol. B 18, 3216
(2000)
[26] L. W. Swanson, G. A. Schwind and A. E. Bell, “Measurement of the energy distribution of a gallium liquid metal ion source”, J. Appl. Phys.
51, 3453 (1980)
[27]Kuo H-S, Hwang I-S, Fu T-Y, Hwang Y-S, Lu Y-H, Lin C-Y,Tsong T T and Hou J-L,“A single-atom sharp iridiumtip as an emitter of gas field ion sources”.Nanotechnology.20 335701(2009)
[28]熱穩定單原子針的製備、特性與應用前景,物理雙月刊(廿九卷一 期) 2007 年二月
[29]Fowler, Ralph Howard, and L. Nordheim. “Electron emission in intense electric fields.”Proceedings of the Royal Society of London.
Series A, Containing Papers of a Mathematical and Physical Character (1928)
[30]E. W. Muller, “Work Function of Tungsten Single Crystal Planes Measured by the Field Emission Microscope”,Z. Physik, 106,541
[31]陳晏清, “鋪覆超薄膜於針狀金屬表面之現象研究”,國立台灣師範 大學碩士論文(2011)
[32]E. W. Muller, T. T. Tsong, “Field Ion Microscopy Principles and Applications”,American Elsevier Publishing Company(1969)
[33]林砡君, “覆銠、銥於鎢針上產生的皺化行為及其相關研究”,國立 台灣師範大學碩士論文 (2005)
[34] Che, J. G., et al. “Faceting induced by ultrathin metal films: A first principles study.” Physical review letters 79.21 (1997)
[35]Szczepkowicz, Andrzej, et al. “A comparison of adsorbate-induced faceting on flat and curved crystal surfaces.”Surface science 599.1(2005) [36]Tsong, Tien T. “Atom-Probe Field Ion Microscopy: Field Ion
Emission, and Surfaces and Interfaces at Atomic Resolution.”Cambridge University Press,(2005)
[37]真空技術與應用,行政院國家科學委員會精密儀器發展中心.
(2001)
Microscope.”Journal of Electron Microscopy 15.4(1966)
[39]蘇冠宇,“場離子顯微鏡研究(1)量測覆銥單原子針場發射與場離子 電流(2)鈮(100)表面觀察.”國立台灣師範大學碩士論文(2011)
[40]李育賢,“以蝕刻吸附法備製覆銥鎢單原子級針尖與場發射電子電 流量測.”國立台灣師範大學碩士論文(2009)