使用的合成奈米柱方法不能在已粗糙化過的太陽能電池上做完整的包覆，
使得抗反射效果不如預期的佳，這部分仍有改善空間。另外對於氧化鋅奈 米柱的垂直度、表面型態的改變與反射率、穿透率的影響，也是可以做為 更進一步研究的方向。
圖5-1 成長氧化鋅奈米柱於矽基板與多晶矽太陽能電池表面沉積氮化矽抗 反射層之反射率比較
5-2 奈米壓印
實驗中利用電子束微影以及溼式蝕刻製程製作整齊奈米結構，藉由改 變微影參數、蝕刻時間，完成了在入射光波長300~1000nm 低反射率矽基材 模板。在壓印過程中，由於自製的壓印機有壓力不均勻的問題，一般的壓 印方式不能有效完整的轉印整個範圍的奈米結構提供後續的量測。藉由壓 印方式的改變，成功的將結構轉印至PMMA 高分子薄膜上，並且有很好的 抗反射效果，完成了具有奈米結構的PMMA 抗反射薄膜。在後續的製程將 薄膜貼附在多晶矽太陽能電池表面，藉由降低反射率，轉換效率可以提升 本身的30%(10.413.5%)。由於實驗中採用貼附的方式，平坦性較差，也 會造成含有氣泡的問題。若能藉由壓印過程中的真空以及加壓，相信能有 更好的效果，另外，壓印完成後的脫模方式需要降低對表面結構以及基板 的破壞也是日後要改善的實驗方向。
參考文獻
[1] L.L. Kazmerski,“Solar photovoltaics R&D at the tipping point: A 2005 technology overview”, Journal of Electron Spectroscopy and Related Phenomena 150 (2006) 105–135.
[2] W.Hoagland et al., “Solar energy”, Sci.Amer, Vol.273, pp.170-173, 1995.
[3] M. A. Green, K. Emery, D. L. King, Y. Ishikawa, and W. Warta, Prog.
Photovoltaics 14, 455 (2006).
[4] S.M.Sze et al., “Semiconductor Device Physics and tehnology”, 2nd edition,John Wiley & Sons. Inc., New York,1981.
[5] 蔡進譯著,“超高效率太陽電池-從愛因斯坦的光電效應談起”, 物理雙 月刊（廿七卷五期）(2005), 701-719.
[6] Chih-Hung Sun et al., “Broadband moth-eye antireflection coatings on silicon”, Appl. Phys. Lett. 92, 061112 (2008).
[7] Frank L. Pedrotti, INTRODUCTION TO OPTICS, Second Edition, 1993.
[8] 李正中著,“薄膜光學與鍍膜技術”,藝軒圖書出版社(1999) pp.37-41 [9] 丁嘉仁著,“次波長結構抗反射膜片發展現況”,機械工業雜誌 282 期
(2009) pp.71.
[10] 陳永彬著,“以干涉微影方法製作光學抗反射結構之應用研究”,機械工 業雜誌 (2007) pp.27.
[11] Kenji Sogo et al., “Reproduction of fine structures by nanocasting lithography” Microelectron. Eng. 84 (2007) 909–911.
[12] Brian G. Prevo et al., “Convective Assembly of Antireflective Silica Coatings with controlled Thickness and Refractive Index”. Chem. Mater.
2005, 17, 3642-3651.
[13] K Hadob´as et al., “Reflection properties of nanostructure-arrayed silicon surfaces”, Nanotechnology 11 (2000) 161–164.
[14] Y C Chang et al., “Design and fabrication of a nanostructured surface combining antireflective and enhanced-hydrophobic effects”,
Nanotechnology 18 (2007) 285303.
[15] Yoshiaski KANAMORI et al., “Broadband Antireflection Gratings for Glass Substrates Fabricated by Fast Atom Beam Etching”, Jpn. J. Appl.
Phys. Vol.39 (2000) pp.735-737.
[16] Gong-Ru Lin et al., “ Low refractive index Si nanopillars on Si substrate”, Appl. Phys. Lett. 90, 181923 (2007).
[17] Sen Wang et al., “Simple lithographic approach for subwavelength structure antireflection”, Appl. Phys. Lett. 91, 061105 (2007).
with moth eye anti-reflection coating”, Thin Solid Films 516 (2008) 7167–7170.
[19] Chih-Hung Sun et al., “Templated fabrication of large area subwavelength antireflection gratings on silicon”, Appl. Phys. Lett. 91, 231105 (2007).
[20] Chia-Jen Ting et al., “Low cost fabrication of the large-area anti-reflection films from polymer by nanoimprint/hot-embossing technology”,
Nanotechnology 19 (2008) 205301.
[21] Chia-Tien Wu et al., “Self-organized tantalum oxide nanopyramidal arrays for antireflective structure”, Appl. Phys. Lett. 90, 171911 (2007).
[22] Peng Jiang et al., “Two-dimensional nonclose-packed colloidal crystals formed by spincoating”, Appl. Phys. Lett. 89, 011908 (2006).
[23] Yun-Ju Lee et al., “ZnO Nanostructures as Efficient Antireflection Layers in Solar Cells”, Nano Lett. Vol. 8 No.5 1501-1505 (2008).
[24] M. Krunks et al., “Nanostructured solar cell based on spray pyrolysis deposited ZnO nanorod array”, Solar Energy Materials & Solar Cells 92 (2008) 1016-1019.
[25] Hong-Yang Chen Thesis, “Hybrid ZnO nanorods array /polymer
nanojunction photovoltaic solar cells”, National Chiao Tung University.
[26] T. J. Boyle et al., “Precursor structural influences on the final ZnO
nanoparticle morphology from a novel family of structurally characterized zinc alkoxy alkyl precursors”, Chem. Mater., 2004, 16, 3279-3288.
[27] L. E. Greene et al., “General route to vertical ZnO nanowire arrays using textured ZnO seeds”, Nano Lett., 2005, 5, 1231.
[28] K. Govender et al., “Understanding the factors that govern the deposition and morphology of thin films of ZnO from aqueous solution”, Mater.
Chem., 2004, 14, 2575.
[29] R. W. Nosker et al., “Madelung Constants Near Principal Nonpolar Faces of Wurtzite and Zincblende Crystals”, Surf. Sci., 1970, 19, 291.
[30] L. Spanhel, M. et al., “Semiconductor clusters in the sol-gel process:
quantized aggregation, gelation, and crystal growth in concentrated zinc oxide colloids”, J. Am. Chem. Soc., 1991, 113, 2826.
[31] C. Pacholski et al., “Self-assembly of ZnO: From nanodots, to nanorods”, Angew. Chem. Int. Ed., 2002, 41, 1188.
[32] B. Liu, H. C. Zeng, “Room temperature solution synthesis of
monodispersed single-crystalline ZnO nanorods and derived hierarchical nanostructures”, Langmuir, 2004, 20, 4196.
[33] L. Vayssieres et al., “Purpose-built anisotropic metal oxide material: 3D highly oriented microrod array of ZnO”, J. Phys. Chem. B., 2001, 105,
3350.
[34] L. Vayssieres et al., “Three-dimensional array of highly oriented crystalline ZnO microtubes”, Chem. Mater., 2001, 13, 4395.
[35] S. Yamabi, H Imai, “Growth conditions for wurtzite zinc oxide films in aqueous solutions”, J. Mater. Chem., 2002, 12, 3773–3778.
[36] L. E. Greene, M. Law, J. Goldberger, F. Kim, J. C. Johnson, Y. Zhang, R.
J. Saykally, P. Yang, Angew. Chem. Int. Ed., 2003, 42, 3031.
[37] L. E. Greene et al., “General route to vertical ZnO nanowire arrays using textured ZnO seeds”, Nano Lett., 2005, 5, 1231.
[38] Q. Li, V. Kumar, Y. Li, H. Zhang, T. J. Marks, R. P. H. Chang, Chem.
Mater., 2005, 17, 1001.
[39] Y. Tak, K. Yong, “Controlled growth of well-aligned ZnO nanorod array using a novel solution method”, J. Phys. Chem. B., 2005, 109, 19263.
[40] Zeyan Wang et al., “Growth of high transmittance vertical aligned ZnO nanorod arrays with polyvinyl alcohol by hydrothermal method”, Mat.
Lett. 63 (2009) 130–132.
[41] Huimin Gao et al., “The effect of growth conditions on the properties of ZnO nanorod dye-sensitized solar cells”, Materials Research Bulletin 43 (2008) 3345–3351.
[42] Min Guo et al., Journal of Solid State Chemistry 178 (2005) 3210–3215.
[43] Kazuko Takanezawa et al., J. Phys. Chem. C 2007, 111, 7218-7223.
[44] 陳守仁等著,“奈米轉印技術發展現況”, 機械工業雜誌(2005)pp.36.
[45] Chuan-Yi Chan Thesis, “Application for Large-Scaled Flexible Organic Lignt Emitting Displays”, National Cheng Kung University.
[46]
http://www.itrs.net/, International Technology Roadmap for
Semiconductors website.[47] Stephen Y. Chou et al., “Imprint of sub-25 nm vias and trenches in polymers”, Appl. Phys. Lett. Vol.67(21),pp3114-3116,1995.
[48] Stephen Y. Chou et al., “Sub-10 nm imprint lithography and applications”, J.Vac.Technol.B15,2897(1997).
[49] M. Colburn et al., “Step and flash imprint lithography: A new approach to high-resolution patterning”, Proc. of SPIE, Vol.3676, pp.379, 1999.
[50] Y. Xia, G. M. Whitesides, Angew. Chem. Int. Vol.37, pp.550-575, 1998.
[51] Stephen Y. Chou Chris Keimel & Jian Gu,, “Ultrafast and direct imprint of nanostructures in silicon”, Nature Vol.417, pp835 - 837, 2002.
[52] Xiaogan Liang , Wei Zhang, Mingtao Li, Qiangfei Xia, Wei Wu, Haixiong Ge, Xinyu Huang, Stephen Y. Chou, Nano Lett. Vol.5, No.3, pp527-530, 2005.
[53] Stephen Y. Chou Chris Keimel & Jian Gu., “Ultrafast and direct imprint of nanostructures in silicon”, Nature Vol.417, pp835 - 837, 2002.
[54] M. Colburn, et al., “Step and flash imprint lithography: A new approach to high-resolution patterning” , Proc. of SPIE, Vol.3676, pp.379, 1999.
[55] X Cheng et al., “A combined-nanoimprint-and-photolithography patterning technique”, Microelectron.Eng.71.277 (2004).
[56] X Cheng et al., “One-step lithography for various size patterns with a hybrid mask-mold”, Microelectron.Eng.71.288 (2004).
[57] ELS-7500EX TFE Electron Beam Lithography System InstrumentManual, ELIONIX Inc.
[58] Peter Van Zant, Microchip Fabrication : a practical guide to semiconductor processing, 4th ed.
[59] C.M. Yang et al.“ Textured Structure Optimization of Crystalline Silicon Solar Cells Using Ray-Tracing Simulation and Anisotropic Etching
Techniques”, Journal of Materials Science and Engineering, Vol. 38, No. 4, PP. 201-205 (2006).
[60] Zih Han Liou Thesis, Development of nanoimprint techniques and their applications with a home-made nanoimprintor, National Chiao Tung University.
[61] Y.Kanamori , E.Roy , Y.Chen , “Antireflection sub-wavelength gratings fabricated by spin-coating replication”, Microelectron. Eng. 78-79 (2005) 287-293.