5-1 結論
本篇論文經由光性與電性的量測,探討 3.3 ML 應力鬆弛產生缺陷而引發載子空 乏的InAs/InGaAs DWELL 結構特性,並予以熱退火 650℃和 700℃作為進一步研究,
主要針對量子躍遷機制的改變來討論。
首先 DLTS 的量測顯示此缺陷捕捉載子濃度小於 TEM 觀測到的缺陷濃度及量子 點濃度,表示缺陷不足以完全空乏量子點中的電子;且在光性的分析中比較了未鬆 弛到鬆弛QD 的演變,發現 3.3 ML 樣品的 PL 頻譜在低溫仍有很明顯量子點訊號存 在可被量測到。
此外也探討熱退火效應的影響,致使 PL 頻譜分別有藍移 15 meV~39 meV 的現 象。另外也經由一系列的電性量測來探討應力鬆弛後的量子躍遷現象,首先我們配 合PL 與 C-V、C-F 量測,初步證明所量測的量子躍遷訊號。接著針對 C-F 量測與理 論公式的擬合做延伸的討論,發現載子在高溫不像一般正常 QD 兩階段式的躍遷,
而是直接跳上鄰近的導帶,並隨著偏壓由淺到深能階跳出,As grown 樣品約由 120 meV~210 meV,隨熱退火溫度升高導致的能皆提升,也造成跳出的能階變淺。低溫 熱能不足便直接穿遂,並估算低溫的穿遂時間,由基態 ms 變化到激發態µs 等級。
此外也說明低溫穿遂前看到的tunneling barrier height 即是高溫躍遷而上的活化能,
所有數據分析都能相互印證配合我們所提出的論點。而會造成此機制的改變,是因 為應力鬆弛產生缺陷造成QD 下方形成一很大的空乏區抑制載子的穿遂現象。
另外在缺陷探討上,As grown 與熱退火 650℃樣品在-3 V~-3.5 V 處的缺陷類型 較接近之前定義的E2 misfit 缺陷,而熱退火 700℃樣品表面處的缺陷由於會隨 DLTS 填充偏壓達飽和,因此初步判定非 threading 缺陷,可能是過於熱退火導致的 As 點 缺陷。
5-2 未來展望
未來可以朝以下方面更深入的去研究:首先是關於缺陷的部分,在本篇論文並 沒有詳細的去探討,因此針對缺陷更深入的分析可能要尋求其他方式才算完整,考 慮到一系列熱退火時間的比較,造成缺陷能帶越來越寬,使能階淺的那一部分被量 測到。另外,熱退火700℃後在表面產生的缺陷,也需要更多的佐證。而針對樣品做 照光的研究,去分析載子在缺陷與量子點能階之間的遷移,也是增進缺陷特性探討 的方式。
在 3.3 ML 樣品曾經分析過存在一約 0.22 eV 的 capture barrier[31],若將此 barrier 以 Schottky 接面公式來計算空乏寬度,再利用經由縱深分布圖所模擬出的能帶看出 的空乏寬度,兩者亦可做個比較。
另一方面可以深入研究的,是關於實驗室另一項針對 QD 樣品的研究[51]:在 QD 中加入 N 產生缺陷,再經由熱退火造成 emission time 的變化,與本篇論文所探 討的應力鬆弛產生缺陷不同來源,但都可以藉此來調變躍遷時間,在未來 QD 記憶 元件的應用方面,或許是個有發展性的初步研究。
參考文獻
[1] P. Hawrylak, Phys. Rev. B 60, 5597 (1999).
[2] U. Banin, Y. Cao, D. Katz, O. Millo, Nature 400, 542 (1999).
[3] Tzy-Rong Lin, Mao-Kuen Kuo, Bo-Ting Liao and Kuo-Pin Hung, “Mechanical and optical properties of InAs/GaAs self-assembled quantum dots,” Bulletin of the College of Engineering, N.T.U., No. 91 (2004).
[4] M. V. Maximov, B. V. Volovik, D. A. Bedarev, A. Yu. Egorov, A. E. Zhukov, A. R.
Kovsh, N. A. Bert, V. M. Ustinov, P. S. Kop’ev, Zh. I. Alferov, N. N. Ledentsov, D.
Bimberg, I. P. Soshnikov, and P.Werner, Appl. Phys. Lett. vol. 75, 2347 (1999)
[5] D. L. Huffaker, G. Park, Z. Zou, O.B Shchekin, and D.G. Deppe, “1.3µm room-temperature GaAs-based quantum dot laser,” Appl. Phys. Lett. vol. 73,pp.
2564-2566 (1998).
[6] Y. Arakawa and K. Sakaki, ”Evanescent-light guiding of atoms through hollow optical fiber for optically controlled controlled atomic deposition,” Appl. Phys. Lett.
vol.40,pp.939-941 (1982).
[7] H. Drexler, D. Leonard, W. Hansen, J. p. Kotthaus, and P. M. Petroff, ” Spectroscopy of Quantum Levels in Charge-Tunable InGaAs Quantum Dots,” Phys. Rev. Lett.
73,pp.2252-2255 (1994).
[8] D. L. Huffaker and D.G. Deppe, “Electroluminescence efficiency of 1.3µm wavelength InGaAs/GaAs quantum dots,” Appl. Phys. Lett. vol. 73,pp. 520-522 (1998).
[9] National Science and Technology Program for Nanoscience and Nanotechnology, research plan, 2004.01.18
[10] Seongsin M. Kim, “Review on recent development of quantum dots: From optoelectronic devices to novel bio-sensing applications,” Proc. of SPIE, Vol. 4999, 423 (2003).
[11] T. Itoh, Y. Iwabuchi, M. Katanoka, Physica Status Solidi B vol. 145, 567 (1988).
[12] D. Bimberg, M. Grundmann, and N. N. Ledentsov, “Quantum Dot Heterostructures,”
(Wiley, 1999)
[13] F. C. Frank, and J. H. van der Merwe, Proc. Roy. Soc. London A, vol. 198, pp.205 (1949).
[14] M. Volmer, and A. Weber, Z. Phys. Chen., vol. 119, pp.277 (1926).
[15] I. N. Stranski, and L. Von Krastanov, Akad. Wiss Lit. Main Math. Natur. K1. Iib, vol.
146, pp.797 (1939).
[16] F. Heinrichsdorff,A. Krost, D.Bimberg, A. O. Kosogov and P.
Werner, ”InAs/InGaAs/GaAs quantum dots with high lateral density grown by MOCVD,” Appl. Surf. Scie, vol.123, pp.725-728 (1998).
[17] V. M. Ustinov,N. A. Maleev,A. E. Zhukov, A.R. Kovsh, A. Yu. Egorov, A. V. Lunev, B. V. Volovil, I. L. Krestnikov, Yu. G. Musikhin, N. A. Bert, P.S. Kop’ev, Zh. I. Alferov, N. N. Ledentsov and D. Bimberg, ”InAs/InGaAs quantum dot structures on GaAs substrares emitting at 1.3μm,” Appl. Phys. Lett. vol. 74,pp. 2815-2817 (1999).
[18] M. V. Maximov et al., ”Quantum dots formed by activated spinodal decomposition of InGa(Al)As alloy on InAs stressors,”Physica E, vol.7, pp.326-330 (2000).
[19] D. Huffaker, G. Park, Z. Zou, O. B. Shchekin, and D. Deppe, J. Select. Topics Quantum Electron. vol. 6, 452 (2000).
[20] S. Kim, H. Mohseni, M. Erdtmann, E. Michel, C. Jelen, and M. Razeghi, Appl. Phys.
Lett. vol.73, 963 (1998).
[21] C. Balocco et al., “Room-temperature operations of memory devices based on self-assembled InAs quantum dot structures”, Appl. Phys. Lett. 85, 5911 (2004)
[22] M. Geller et al., “A write time of 6 ns for quantum dot-based memory structures”, Appl. Phys. Lett. 92, 092108 (2008)
[23] O. Stier, M. Grundmann, and D. Bimberg, ”Electric and optical properties of strained quantum dots modeled by 8-band k·p theory”, Phys. Rev. B 59, 5688 (1999).
[24] Ming Gong, Kaimin Duan, Chuan-Feng Le, Rita Magri, Gustavo A. Narvaez, and Lixin He, “Electronic structure of self-assembled InAs/InP quantum dots: Comparison with self-assembled InAs/GaAs quantum dots”, Phys. Rev. B 77, 045326 (2008).
[25] A. Persano, A. Cola, A. Taurino, M. Catalano, and M. Lomascolo, “Electronic structure of double stacked InAs/GaAs quantum dots: Experiment and theory”, J. Appl.
Phys. 102, 094314 (2007).
[26] W. Lei et al., “Probing the band structure of InAs/GaAs quantum dots by capacitance-voltage and photoluminescence spectroscopy”, Appl. Phys. Lett. vol.92, 193111 (2008).
[27] D.L. Losee, J. Appl. Phys. 46, 2204 (1975).
[28] G. Vicent, D. Bois, P. Pinard, J. Appl. Phys. 46, 5173 (1975).
[29] D.V. Lang, “Deep-level transient spectroscopy: A new method to characterize traps in semiconductors”, J. Appl. Phys. 45, 3023 (1974).
[30] Dieter K. Schroder, “Semiconductor Material and Device Characterization”-2nd ed.
(New York :Wiley 1998).
[31] 林士傑,交通大學電子物理研究所碩士論文, ”砷化銦厚度對砷化銦/砷化銦鎵量 子點中電子放射與捕捉影響研究” (2003)
[32] 蕭茹雄,交通大學電子物理研究所博士論文, ”分子束磊晶法於砷化鎵基板製作 1.3 微米半導體雷射” (2005)
[33] J. F. Chen et al., “Relaxation-induced lattice misfits and their effects on the emission properties of InAs quantum dots”, Nanotechnology, 18, 35 (2007)
[34] 陳宜屏,交通大學電子物理研究所碩士論文, ”氮含量與砷化銦厚度對砷化銦/砷
化鎵量子點光性影響” (2003)
[35] P. B. Joyce et al., “Optical properties of bilayer InAs/GaAs quantum dot structures:
Influence of strain and surface morphology”, Phys. Rev. B 66, 075316 (2002).
[36] M. O. Lipinski, H. Schuler, O. G. Schmidt, and K. Eberl, “Strain-induced material intermixing of InAs quantum dots in GaAs”, Appl. Phys. Lett. 77, 1789 (2000)
[37] A. Markus, J.X. Chen, C. Paranthoen, and A. Fiore, ”Simultaneous two-state lasing in quantum-dots lasers”, Appl. Phys. Lett. 82, 1818 (2003).
[38] R. Leon, Yong Kim, C. Jagadish, M. Gal, J. Zou, and D. J. H. Cockayne, Appl. Phys.
Lett. 69, 1888 (1996)
[39] A. Chahboun et al., “Further insight into the temperature quenching of photoluminescence from InAs/GaAs self-assembled quantum dots”, J. Appl. Phys. 103, 083548 (2008).
[40] 汪炎宗, 交通大學電子物理研究所碩士論文, ”InAs 量子點應力鬆弛所引發缺陷 對量子躍遷之影響” (2007)
[41] 黃文鏑,交通大學電子物理研究所碩士論文, ”InAsSb/GaAs 自聚式量子點之電性 研究” (2005)
[42] C. M. A. Kapteyn et al., “Hole and electron emission from InAs quantum dots”, Appl.
Phys. Lett. 76, 1573 (2000)
[43] C. M. A. Kapteyn, F. Heinrichsdorff, O. Stier, R. Heitz, M. Grundmann, N. D.
Zakharov, and D. Bimberg, “Electron escape from InAs quantum dots”, Phys. Rev. B 60, 14265 (1994)
[44] J. Iba´nez, R. Leon, D. T. Vu, S. Chaparro, S. R. Johnson, C. Navarro, and Y. H.
Zhang, “Tunneling carrier escape from InAs self-assembled quantum dots”, Appl.
Phys. Lett. 79, 2013 (2001)
[45] E. N. Korol et al., “Ionization of impurity states in semiconductors by an electric field”, Sov. Phys. -Solid State, 19, 1327 (1977)
[46] C. M. A. Kapteyn et al., ”Carrier emission processes in InAs quantum dots”, Physica E, 7, 388 (2000)
[47] M. Geller et al., ”Hole capture into self-organized InGaAs quantum dots”, Appl. Phys.
Lett. 89, 232105 (2006)
[48] W. -H. Chang et al., “Hole emission processes in InAs/GaAs self-assembled quantum dots”, Phys. Rev. B, vol.66, 195337 (2002)
[49] Raffaele Colombelli et al., “Conduction-band offset of single InAs monolayers on GaAs”, Appl. Phys. Lett. 76, 1146 (2000)
[50] 謝明芳,交通大學電子物理研究所碩士論文, ”自聚式 InAs 量子點上覆蓋 InAlAsI/InGaAs 複合層之研究” (2004)
[51] 余之周,交通大學電子物理研究所碩士論文, ”熱退火隊攙入氮砷化銦量子點電子 放射率之影響” (2007)