• 沒有找到結果。

To verify the chip design, we first measured the small signal S-parameters. Fig. 3.1

shows the on-wafer measurement data, which show a 20 dB gain and 17 dB input

and output return loss- this is consistence with EM post-simulation data.

1 2 3 4 5 6 7 8

-40 -30 -20 -10 0 10 20

S11 S22 S21

Symbol:measured data Line: modeled data

d B

Frequency (GHz)

Fig. 3.1. Measured and simulated gain and return loss for CMOS PA.

Fig. 3.2 shows the measured RF power results of the amplifier. The output power

at 1 dB compression (P1dB) increases with increasing bias voltage from conventional

1.8, 2.5 to 2.75 V. Such increase of desired higher output RF power is consistent with

- 22 -

simulation. Under 2.5 V bias operation, a P1dB of 20.8 dBm and power gain of 20 dB

are measured with 30% PAE. The P1dB increases to 21.5 dBm at higher 2.75V bias

condition with still compatible 19.6 dB power gain and 29.6% PAE.

Good adjacent channel power ratio (ACPR) is an important linearity factor for PAs.

Fig. 3.3 shows the measured ACPR with standard W-CDMA π/4 QPSK modulation on

different bias voltage. Here the ACPR improves with increasing operation voltage

from 1.8, 2.5 to 2.75V monotonically. At the 2.75 V bias voltage, an ACPR of -56 dBc

at 0 dBm output power or -30 dBc at 20 dBm output power was measured, which is

competitive to the data of the power amplifiers designed for better linearity [15]. In

addition, IP3 point is an important factor, the Fig.3.4 ~ Fig.3.6 show up the IP3 point

with different supply voltage. The output IP3 point of 1.8V, 2.5V and 2.75V is 22dBm,

26dBm and 36dBm. So it shows that the linearity increases with larger supply

voltage.

- 23 -

-10 -5 0 5 10

8 10 12 14 16 18 20 22

24 measurement 2.5V

measurement 2.75V simulation 2.5V simulation 2.75V

Output Power (dBm)

Input Power (dBm)

Power-Added Efficiency (%)

Gain (dB)

0 10 20 30 40 50 60

Fig. 3.2. Measured and simulated RF output power, gain and PAE of designed PA using high breakdown voltage asymmetric-LDD MOSFETs.

-10 0 10 20

-60 -40 -20

ACPR (dBc)

OUTPUT POWER (dBm) VDD =1.8V

VDD = 2.5V VDD = 2.75V

fi Fig. 3.3. Measured ACPR of designed PA using high breakdown voltage

asymmetric-LDD MOSFETs.

- 24 -

-12 -10 -8 -6 -4 -2 0 2 4 6 8 10 12

-50 -40 -30 -20 -10 0 10 20 30

O U T P U T P O W E R ( d B m )

INPUT POWER (dBm)

fund IM3 IM5

Fig. 3.4 measurement data of third order inter modulation with 1.8V supply voltage.

-12 -10 -8 -6 -4 -2 0 2 4 6 8 10 12

-50 -40 -30 -20 -10 0 10 20 30

O U T P U T P O W E R ( d B m )

INPUT POWER (dBm)

fund IM3 IM5

Fig.3.5 measurement data of third order inter modulation with 2.5V supply voltage.

- 25 -

-30 -25 -20 -15 -10 -5 0 5 10 15 20

-100 -90 -80 -70 -60 -50 -40 -30 -20 -10 0 10 20 30 40

O U T P U T P O W E R ( d B m )

INPUT POWER (dBm)

fund IM3 IM5

Fig. 3.6 measurement data of third order inter modulation with 2.75V supply voltag

Chapter 4

COMPARISON

The die photo of fabricated CMOS PA is shown in Fig. 2.16, which has a chip area of

1m×1.1m. Table 4.1 summarizes the performance comparison with reported CMOS

PA [10]-[16]. The fabricated PA using high breakdown voltage asymmetric-LDD

MOSFETs shows the large P1dB of 21.5 dBm, high gain of 20.4 dB, and good 29.6%

PAE at 2.4 GHz. Those power performances are better than other reported designs

shown in Table 4.1, with added merits of simple single-ended design, using standard

foundry technology and compact on-chip matching.

- 26 -

Table 4.1 The comparison table of Asymmetry MOS and conventional PAs.

Ref. Freq.

(GHz) voltage Pout (dBm) Gain (dB) PAE (%)

Width/Pow er density

by P1dB(W/m

m)

Matchin g

technolog y

[10] 5 1.8 19.2@1dB 7.1 17.5 1.28mm/0.065 On chip 0.18um [11] 5.2 1.8 17.4/15.4@1

dB 15.1 27.1 0.6mm/0.058 On chip 0.18um

[12] 5.8 1 20.5@1dB ~8 27

(Drain) 9.6mm/0.012 On chip 90nm

[13] 2.4/5.2 1.8 9.7@2.4GHz 19.5@5.2GHz

3.7@2.4GH z 24@5.4GHz

15.3@5.2

GHz 1.92mm/0.046 On chip 0.18um

[14] 3.7~8.

8 1.8 19

15.6@1dB 8.24 25 0.96mm/0.038 On chip 0.18um [15] 2~2.45 2.5 16.3@1dB 18 --- 4.2mm/0.01 Off chip 0.13um

[16] 2.4 2.5 20@1dB 11.2 28 0.96mm/0.1 Off chip 0.25um

This

work 2.4

2.5 22.7

20.8@1dB 20 30

2mm/0.071 On chip 0.18um

2.75 23.2

21.5@1dB 19.6 29.6

- 27 -

Chapter 5

CONCLUSION

We have designed an asymmetric-LDD MOS transistor which has ~twice drain

breakdown voltage to the conventional one. Besides, the power amplifier has been

designed by single ended on chip design and fabricated by TSMC 0.18um 1P6M

process without any process modification. The excellent power performance shows

20dB power gain, and 20.8dBm P1dB compression power and 22.7dBm saturate

output power with 30% PAE under 2.5V bias operation. And 20.4dB power gain,

21.5dBm P1dB compression power and 23.2dBm saturate output power with 29.6%

PAE under 2.75V bias operation. -41dBc ACPR at 15dBm output power, ~36dBm OIP3

with 2.75V supply voltage. The output power and linearity increase with larger

supply voltage, and PAE and power gain saturate at 2.75V. This research

demonstrated that the asymmetric-LDD MOS transistor successfully implemented on

a CMOS power amplifier with wonderful performance even with on chip matching

design. This design method has great opportunity to be future trend and realize SOC

of PA.

- 28 -

REFERENCE

[1] J.C. Guo, C. H. Huang, K. T. Chan, W. Y. Lien, C. M. Wu, and Y. C. Sun, “0.13μm low voltage logic base RF CMOS technology with 115GHz fT and 80GHz fMax ” 33rd European Microwave Conference, pp. 682-686, 2003.

[2] “How Bluetooth Technology Works”. Bluetooth SIG. Retrieved on 2008-02-01.

[3] M. C. King, T. Chang, and A. Chin “RF Power Performance of Asymmetric-LDD MOS Transistor for RF-CMOS SOC Design”, IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, VOL. 17, NO. 6, JUNE 2007. pp. 445 – 447.

[4] J. F. Chen J. Tao, P. Fang, and C. Hu, ” 0.35- m Asymmetric and Symmetric LDD Device Comparison Using a Reliability/Speed/Power Methodology”, IEEE ELECTRON DEVICE LETTERS, VOL. 19, NO. 7, JULY 1998. pp. 216-218.

[5] G. Krieger, R. Sikora, P. Cuevas, and M. Misheloff, “Moderately doped NMOS (M-LDD)—hot electron and current drive optimization,” IEEE Trans. Electron Devices, vol. 38, p. 121, Jan. 1991.

[6] T. H. Lee, H. Samawati, and H. R. Rategh, “5-GHz CMOS wireless LANs,” in IEEE Transaction Microwave Theory and Technique, vol. 50, 2002, pp. 268-280.

[7] E. Chen, D. Heo, M. Hamai, J. Laskar, and D. Bien, “0.24-um CMOS technology for Bluetooth power applications,” in Proc. IEEE Radio and Wireless Conference, 2000, pp.

163-166.

[8] A. Litwin, O. Bengtsson, and J. Olsson, “Novel BiCMOS compatible, short channel LDMOS technology for medium voltage RF and power applications,” in IEEE MTT-S International Microwave Symposium Dig., 2002, pp.35-38.

[9] K.-E. Ehwald, B. Heinemann, W. Roepke, W. Winkler, H. Rücker, F. Fuernhammer, D.

Knoll, R. Barth, B. Hunger, H. E. Wulf, R. Pazirandeh, and N. Ilkov, “High performance RF LDMOS transistors with 5 nm gate oxide in a 0.25m SiGe:C BiCMOS technology,” in IEDM Tech. Dig., 2001, pp. 40.4.1-40.4.4.

[10] Y. Eo and K. Lee, “High efficiency 5 GHz CMOS power amplifier with adaptive bias control circuit,” 2004 IEEE RFIC Symp. Dig., Fort Worth, TX, June 2004, pp. 575-578.

- 29 -

[11] W. Zhang, E.-S. Khoo, and T. Tear, “A low voltage fully-integrated 0.18um CMOS power amplifier for 5GHz WLAN ,” Proc. 28th European Solid-State Circuits Conf., Florence, Italy, Sep. 2002, pp. 215-218.

[12] P. Haldi, D. Chowdhury, G. Liu and A. M. Niknejad , “A 5.8 GHz Linear Power Amplifier in a Standard 90nm CMOS Process using a 1V Power Supply,” in IEEE Radio Frequency Integrated Circuits Symp., 2007, pp.431-434.

[13] Y. Eo, and K. Lee, “ A 2.4GHz/5.2GHz CMOS power amplifier for dual-band applications,” 2004 IEEE MTT-S Int. Microwave Symp. Dig., Fort Worth, TX, June 2004, vol. 3, pp. 1539-1542.

[14] C. Lu, A-V. H. Pham, M. Shaw, and C. Saint “Linearization of CMOS Broadband Power Amplifiers through Combined Multi-gated Transistors and Capacitance Compensation”

IEEE Transaction On Microwave Theory And Techniques. Nov. 2007 pp. 2320-2328

[15] V. Knopik, B. Martineau, and D. Belot, “20 dBm CMOS class AB power amplifier design for low cost 2 GHz-2.45 GHz consumer applications in a 0.13μm technology,” Proc. IEEE Int. Symp. Circuits and Systems, Kobe, Japan, May 2005, vol. 3, pp. 2675-2678.

[16] C.-C. Yen, and H.-R. Chuang “A 0.25-µm 20-dBm 2.4-GHz CMOS Power Amplifier with an Integrated Diode Linearizer,” in IEEE Microwave & Wireless Components Letter, vol. 13, no. 2, 2003, pp45-47

相關文件