Chapter 4 Analysis and Discussion
4.3 Evidence of Long-range Coulomb Interactions
Finally, in Figure 4.9 we quote simulated transconductance at V
d
= 1.0 V and Vg
of 0.75 and 1.0 V above threshold [1] versus Lm
, for comparison with measured transconductance at Vd
= 0.8 and 1.0 V in this work. Evidently, the dimension of our devices, which is carefully chosen to meet the criterion, lies across the activation point of long-range Coulomb effects. With above evidence, we further argue that the long-range Coulomb interactions would be the main factor for performance degradation in ultra-short devices.16
Chapter 5 Conclusion
In this work, TCAD-based inverse modeling has been carried out with aim reconstruct the process parameters. Consequently, interesting and useful results have been created. First, the overlap region for short-channel device can be accurately determined. Also the halo implant P
halo
, which has a significant impact on the substrate doping concentration and further affect the inversion layer charge density, is also solved by calculating the free electron density in the channel region from 2D simulation. Moreover, the parasitic source/drain resistance (R
sd ) is also extracted from the calibration model. In addition, we also provide experimental method to estimate theR
sd for the comprehensive analysis.Second, the resulting temperature power-law exponent (γ) as extracted from our experimentally-determined additional mobility data points out that the long-range Coulomb interactions exist in the metallurgical channel length less than about 40 nm.
Thus, experimental evidence of long-range Coulomb interactions has been drawn.
Furthermore, underlying physical origins have all been distinguished for short channel device. Therefore, long-range Coulomb effect, which is not to be ignored in ultra-short devices, has been for the first time experimentally corroborated in the device samples under study.
17
References
[1] M. V. Fischetti , S. Jin , T.-W. Tang , P. Asbeck , Y. Taur , S. E. Laux , M. Rodwell and N. Sano, “Scaling MOSFETs to 10 nm: Coulomb effects, source starvation, and virtual source model,” J. Comput. Electron., vol. 8, p.60 , 2009.
[2] M. V. Fischetti and S.E. Laux, “Long-range Coulomb interactions in small Si devices. Part Ⅰ: Performance and reliability,” J. Appl. Phys., vol. 89, no. 2, pp.
1232-1248, January 2001.
[3] K. Rim, S. Naeasimha, M. Longstreet, A. Mocuta, and J. Cai, “Low field Mobility characteristics of sub-100 nm unstrained and strained si MOSFETs,” in IEDM
Tech. Dig. , pp. 43-46, 2002.
[4] Antoine Cros, Krunoslav Romanjek, Dominique Fleury, Samuel Harrison, Robin Cerutti, Philippe Coronel, Benjamin Dumont, Arnaud Pouydebasque, Romain Wacquez, Blandine Duriez, Romain Gwoziecki, Frederic Boeuf, Hugues Brut, Gerard Ghibaudo and Thomas Skotnicki, “Unexpected mobility degradation for very short devices: A new challenge for CMOS scaling,” in IEDM Tech. Dig., pp.
663-666, 2006.
[5] Vincent Barral, Thierry Poiroux, Daniela Munteanu, Jean-Luc Autran, and Simon Deleonibus, ‘Experimental investigation on the quasi-ballistic transport: part II—backscattering coefficient extraction and link with the mobility,” IEEE Trans.
Electron Devices, vol. 56, no. 3, pp. 420-430, March. 2009.
[6] P.Packan, S.Cea, H.Deshpande, T.Ghani, M.Giles, O.Golonzka, M.Hattendorf, R.Kotlyar, K.Kuhn, A.Murthy, P.Ranade, L.Shifren, C.Weber and K.Zawadzki,
“High performance Hi-K + metal gate strain enhanced transistors on (110) Silicon,” in IEDM Tech. Dig., pp. 63-66, 2008.
[7] M. V. Fischetti, “Long-range Coulomb interactions in small Si devices Part II.
18
Effective electron mobility in thin-oxide structures,” J. Appl.Phys., vol. 89, no. 2, pp. 1232–1250, Jan. 2001.
[8] Ming-Jer Chen, Li-Ming Chang, Shin-Jiun Kuang, Chih-Wei Lee, Shang-Hsun Hsieh, Chi-An Wang, Sou-Chi Chang, and Chien-Chih Lee,
“Temperature-oriented mobility measurement and simulation to assess surface roughness in ultrathin-gate-oxide ( ~1 nm) nMOSFETs and Its TEM evidence,”
IEEE Trans. Electron Devices, vol. 59, no. 4, pp. 949-955, April. 2012 .
[9] Schred, http://nanohub.org/resources/schred.
[10] M. J. Chen, C. C. Lee, and K. H. Cheng, “Hole effective masses as a booster of self-consistent six-band k‧p simulation in inversion layers of pMOSFETs,”
IEEE Trans. Electron Devices, vol. 58, pp. 931-937, April 2011.
[11] S. Takagi and M. Takayanagi, “Experimental evidence of inversion-layer mobility lowering in ultrathin gate oxide metal-oxide-semiconductor field-effect-transistors with direct tunneling current,” Jpn. J. Appl. Phys., vol.
41, pt. 1, no. 4B, pp. 2348-2352, Apr. 2002.
[12] TCAD. http://www.synopsys.com/Tools/TCAD/Pages/default.aspx.
[13] D.W. Lin, M. L. Cheng, S.W.Wang, C. C.Wu, and M. J. Chen, “A novel method of MOSFET series resistance extraction featuring constant mobility criteria and mobility universality,” IEEE Trans. Electron Devices, vol. 57, no. 4, pp.
890–897, Apr. 2010.
[14] K. Romanjek, F. Andrieu, T. Ernst, and G. Ghibaudo, "Improved split C-V method for effective mobility extraction in sub-0.1-μm Si MOSFETs," IEEE
Electron Devices Letters, vol. 25, no. 8, pp. 583-585, Aug. 2004.
19
Figure 1.1 Schematic of electron transport under long-range Coulomb interactions with S/D plasmons
.
oxide
N + N +
S/D plasmons
P + halo P + halo
20
Figure 1.2 Flowchart of inverse modeling in this work.
CV & IV fitting
Evidence for Long-range Coulomb Interactions
from S/D
Inverse Modeling
Doping Profile, Ninv, Rsd
Effective Mobility
Additional Mobility and Temperature Dependence
Power-Law
To Determine Main Source of Mobility Degradation for Short
Channel Device
21
0.0 0.5 1.0 1.5 2.0
-5.0x10
-60.0 5.0x10
-61.0x10
-51.5x10
-52.0x10
-52.5x10
-53.0x10
-53.5x10
-54.0x10
-5I b I g
I d
C u rr e n t (A )
Gate Voltage (V) T=292K
T=330K T=360K T=380K
I s
V
d=0.05V L g =1 m
Figure 2.1 Temperature-dependent terminal currents at V
d
=0.05V versus Vg
for Lg
=1μm.22
0.0 0.5 1.0 1.5 2.0
0.0 5.0x10
-51.0x10
-41.5x10
-42.0x10
-42.5x10
-4V
d=0.05V L g =65nm
I g &I b I s &I d
C u rr e n t (A )
Gate Voltage (V) T=292K
T=330K T=360K T=380K
Figure 2.2 Temperature-dependent terminal currents at V
d
=0.05V versus Vg
for Lg
=65nm.23
0.0 0.5 1.0 1.5 2.0
0.0 5.0x10
-51.0x10
-41.5x10
-42.0x10
-42.5x10
-4V
d=0.05V L
g
=50nm
Cu rr en t ( A)
Gate Voltage (V) T=292K
T=330K T=360K T=380K
I s &I
d
I g &I
b
Figure 2.3 Temperature-dependent terminal currents at V
d
=0.05V versus Vg
for Lg
=50nm.24
-3 -2 -1 0 1
0.0 0.4 0.8 1.2 1.6 2.0
C ap ac ita nc e ( F/ cm
2)
Gate Voltage (V) Experiment
Schred [9]
Simulation [10]
W/L=10/1 m N
poly=1e20cm
-3P
sub=4e17cm
-3t
ox=1.27nm
Figure 2.4 Comparison of the measured and simulated gate capacitance versus gate voltage.
25
Figure 2. 5 TEM image of the sample.
<001>
<110>
26
Figure 2.6 The schematic diagram for current flow of nMOSFETs with large gate tunneling current. Besides, I
S
<0 and Id
>0.27
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 10
-1010
-910
-810
-710
-610
-510
-410
-310
-2
L
m(nm) 1000 48 33 Exp
TCAD
C ha nn el C ur re nt (A )
T=292K
Gate Voltage (V)
W=1 m t
ox=1.27nm
N
sde=4.95e20cm
-3P
halo=2.5e19cm
-3P
sub=4e17cm
-3V
d=1.0V
V
d=0.05V
Figure 3.1 Measured and simulated I
ch
versus Vg
at T=292K and Vd
=0.05 and 1V.28
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 10
-1010
-910
-810
-710
-610
-510
-410
-310
-2
L
m(nm) 1000 48 33 Exp
TCAD
C ha nn el C ur re nt (A )
T=330K
Gate Voltage (V)
W=1 m t
ox=1.27nm
N
sde=4.95e20cm
-3P
halo=2.5e19cm
-3P
sub=4e17cm
-3V
d=1.0V
V
d=0.05V
Figure 3.2 Measured and simulated I
ch
versus Vg
at T=330K and Vd=
0.05 and 1V.29
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 10
-1010
-910
-810
-710
-610
-510
-410
-310
-2
L
g(nm) 1000 65 50 Exp
TCAD
C ha nn el C ur re nt (A )
T=360K
Gate Voltage (V)
W=1m t
ox=1.27nm
N
sde=4.95e20cm
-3P
halo=2.5e19cm
-3P
sub=4e17cm
-3V
d=1.0V
V
d=0.05V
Figure 3.3 Measured and simulated I
ch
versus Vg
at T=360K and Vd
=0.05 and 1V.30
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 10
-1010
-910
-810
-710
-610
-510
-410
-310
-2
L
m(nm) 1000 48 33 Exp
TCAD
C ha nn el C ur re nt (A )
T=380K
Gate Voltage (V)
W=1m t
ox=1.27nm
N
sde=4.95e20cm
-3P
halo=2.5e19cm
-3P
sub=4e17cm
-3V
d=1.0V
V
d=0.05V
Figure 3.4 Measured and simulated I
ch
versus Vg
at T=380K and Vd
=0.05 and 1V.31
Figure 3.5 Calibrated 2D simulation structure for L
g
=1μm and hence Lm
=1μm. WD
is the width of the mid-channel depletion region.W D
=45.53nm
P-type substrate
Depletion edge
Spac er Spac er
Drain
Silicide Silicide
Halo Halo
Con t act Con t act N + -Poly Gate
Source
Doping Conc. (cm -3 ) L g =1µm
L m ≈1µm
32
Figure 3.6 Calibrated 2D simulation structure for L
g
=65nm and hence Lm
=48nm. WD
is the width of the mid-channel depletion region.
N + -Poly Gate
W D = 57.27nm Depletion edge P-type substrate
Spacer Spacer
Con tact Con tact
Silicide Silicide
Source Drain
Halo
L g =65nm
Doping Conc. (cm -3 )
L m =48nm
33
Figure 3.7 Calibrated 2D simulation structure for L
g
=50nm and hence Lm
=33nm. WD
is the width of the mid-channel depletion region.
N + -Poly Gate
W D = 65.75nm Depletion edge P-type substrate
Spacer Space r
Con tact Con tact
Silicide Silicide
Source Drain
Halo
L g =50nm
Doping
Conc. (cm -3 )
L m =33nm
34
-5.0x10
-70.0 5.0x10
-71.0x10
-61.5x10
-62.0x10
-62.5x10
-60.0
5.0x10
191.0x10
201.5x10
202.0x10
202.5x10
20L=65nm
e D e n s it y ( cm
-3)
Y (cm) area=N
invFigure 3.8 The free electron density under the surface 30nm at one position of the channel region.
35
Figure 3.9 The schematic diagram for inversion layer charge density of metallurgical length L
m
=1μ m.36
Figure 3.10 The schematic diagram for inversion layer charge density of metallurgical length L
m
=48nm.37
Figure 3.11 The schematic diagram for inversion layer charge density of metallurgical length L
m
=33nm.38
Figure 3.12 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 1μm at T= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.39
Figure 3.12 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 1μm at T= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.40
-0.04 -0.03 -0.02 -0.01 0.00 0.01 0.02 0.03 0.04 0.05 0.0
-0.04 -0.03 -0.02 -0.01 0.00 0.01 0.02 0.03 0.04 0.05 0.0
Figure 3.13 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 48nm atT= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.41
-0.04 -0.03 -0.02 -0.01 0.00 0.01 0.02 0.03 0.04 0.05 0.0
-0.04 -0.03 -0.02 -0.01 0.00 0.01 0.02 0.03 0.04 0.05 0.0
Figure 3.13 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 48nm at T= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.42
-0.02 -0.01 0.00 0.01 0.02 0.03
0.0
-0.02 -0.01 0.00 0.01 0.02 0.03
0.0
Figure 3.14 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 33nm at T= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.43
-0.02 -0.01 0.00 0.01 0.02 0.03
0.0
-0.02 -0.01 0.00 0.01 0.02 0.03
0.0
Figure 3.14 The calculated N
inv
along the channel direction under interface 30nm for Lm
= 33nm at T= (a) 292K, (b) 330K, (c) 360K, and (d) 380K.44
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 0.0
5.0x10
121.0x10
131.5x10
132.0x10
132.5x10
13N in v ( cm -2 )
Gate Voltage (V)
T=292K T=330K T=360K T=380K L
m=1 m L
m=48nm L
m=33nm
Figure 3.15 Simulated N
inv
versus gate voltage.45
Figure 3.16 Simulation structure for R
sd
assessment.46
0.8 1.0 1.2 1.4 1.6 1.8
80 90 100 110 120 130
R sd ( m )
Gate Voltage (V) V
d=0.05V
R
sdcalculated by TCAD simulation
Figure 3.17Simulated R
sd
versus Vg
at T=292K.47
48
0.0 0.2 0.4 0.6 0.8 1.0
0 20000 40000 60000 80000 100000
Er r ([ cm
2/(V *s ) ]
2)
R
sd=123.1 - m
=0.33
0=700cm
2/V*s
Figure 3.19 The extracted R
sd
by using the experimental method [13].49
(a)
(b)
Figure 3.20 Extracted temperature-dependent effective mobility versus N
inv
for different Lm
with Rsd
= (a) 100Ω-μm and (b) 120Ω-μm.T=292K T=330K T=360K T=380K
T=292K T=330K T=360K T=380K
50
T=292K T=330K T=360K T=380K
T=292K T=330K T=360K T=380K
(b)
Figure 4.1 Extracted temperature-dependent additional mobility versus N
inv
for Lm
=48 and 33nm with Rsd
= (a) 100Ω-μm and (b) 120Ω-μm.51
240 280 320 360 400 440 480
200 300 400 500 600 700 800 1000 900 1100
33nm device 48nm device
R
sd=120 - m
R
sd=120 - m R
sd=100 - m R
sd=100 - m
N
inv=1x10
13cm
-2
add T
A dd iti on al M ob ili ty
add( cm 2 /V s )
Temperature (K)
Figure 4.2 Extracted additional mobility at N
inv
=1x1013
cm-2
versus temperature with Rsd
as a parameter. The power-law coefficient γ is obtained by data fitting.52
5 10 15 20 25
300 400 500 600 700 800 900 1000
add, extra=1/
add
(33nm)-1/
add
(48nm) R
sd=120 - m
R
sd=100 - m
ad d, e xt ra ( cm
2/V s )
N
inv( x10
12cm
-2)
T=292K T=330K T=360K T=380K
Figure 4.3 Extracted temperature-dependent μ
add
,extra
versus Ninv
with Rsd
as a parameter.53
240 280 320 360 400 440 480 450
500 550 600 650 700 750 800 850
add T
N
inv=1x10
13cm
-2
add, extra=1/
add
(33nm)-1/
add
(48nm)
R
sd=120 - m
R
sd=100 - m
ad d , e xt ra ( cm
2/V s )
Temperature (K)
Figure 4.4 Extracted μ
add, extra
at Ninv
=1x1013
cm-2
versus temperature, along with corresponding power-law coefficient γ.54
Figure 4.5 Simulated conduction-band edge, subband levels, and Fermi level versus position for L
m
= 1μm at Vg
= (a) 1V, (b) 1.2V, and (c) 1.5V.55
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
Figure 4.6 Simulated conduction-band edge, subband levels, and Fermi level versus position for L
m
= 48nm at Vg
= (a) 1V, (b) 1.2V, and (c) 1.5V.56
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
-0.06 -0.04 -0.02 0.00 0.02 0.04 0.06 -0.2
Figure 4.7 Simulated conduction-band edge, subband levels, and Fermi level versus position for L
m
= 33nm at Vg
= (a) 1V, (b) 1.2V, and (c) 1.5V.57
5 6 7 8 9 10 11 12
-1.6 -1.4 -1.2 -1.0 -0.8 -0.6 -0.4
R
sd=120 - m R
sd=100 - m
Po w er -L aw E xp on en t
N
inv( x10
12cm
-2)
from simulated bulk-phonon-limited mobility (P
sub=1x10
18cm
-3)
from extracted
add, extra
Figure 4.8 Comparison of temperature power-law exponent of extracted μ
add, extra
and simulated bulk phonon-limited mobility, plotted versus Ninv
.58
10 100 1000
0 500 1000 1500 2000 2500 3000 3500
Tr ab sc on du ct an ce (S /m )
Metallurgical Channel Length (nm)
2D-MC: full-Coulomb effects 2D-MC: no Coulomb effects Vd=0.8V (this work)
Vd=1.0V (this work)
Figure 4.9 Comparison of measured transconductance in this work and simulated ones with and without Coulomb effects [1].
59
Table 1 The length of the overlap region for different L
gate
, and the metallurgical channel length (Lm
=Lgate
-ΔL).60
(a)
(b)
(c)
Table 2 The subband population for different metallurgical channel length at gate voltages of (a) 1V, (b) 1.2V, and (c) 1.5V.