• 沒有找到結果。

Chapter 7 Conclusions and Future Works

7.2 Future Works

The study has clearly confirmed the fact that the energy level, surface coverage and growth mode of the core/shell electrodes play three important roles to enhance the efficiency of DSSCs. However, we may not complete the whole research of these topics. Some suggestions are listed below for future works

a. The interfacial energy levels at electrolyte/dye/shell/core interfaces should be further studied.

b. The mechanism of formation of dipole layers at electrolyte/dye/shell/core interfaces is important to investigate

c. Multi-shells and sintering model should be established for evaluating the coverage of electrolyte/dye/shell/core electrode.

d. The coverage model may apply to other devices, such as the electrode of Li-battery or quantum-dot solar cell.

e. Other kind of core/shell electrodes should be developed with the same analysis of the energy level, surface coverage and growth mode to enhance the efficiency of DSSCs.

f. The accuracy of the coverage and the energy levels measurements need to be confirmed. If the coverage in this study is confirmed to be less than 1, the energy levels should be modified accordingly.

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Vita

基本資料 姓名:田大昌 性別:男

出生年月:民國 57 年 10 月 電子信箱:[email protected]

學歷

國立交通大學材料科學與工程學研究所博士班(2004.9~2011.6) 國立台灣大學材料科學與工程學研究所碩士班(1992.9~1994.6) 國立台灣大學地質學系(1988.9~1992.6)

經歷

工研院材料所副研究員(1994~1999) 工研院材料所研究員(1999~至今)

工研院奈米中心兼任技術經理(2007~2011)

美國化學學會 Langmuir、ACS Appl. Mater. Interfaces 期刊評論員 (2009~至今)

專長:介面能階分析、核/殼材料覆蓋率分析、薄膜化態分析等。

著作

國際期刊論文

1. T. C. Tien, F. M. Pan, L. P. Wang, F. Y. Tsai, C. Lin, Coverage analysis for

10048 (2010).

2. T. C. Tien, L. C. Lin, L. S. Lee, C. J. Hwang, S. Maikap, Y. Shulga, Analysis of weakly bonded oxygen in HfO2/SiO2/Si stacks by using HRBS and ARXPS, J. Mater. Sci.: Mater. Electron., 21, 475 (2010).

3. A. Das, S. Maikap, C. H. Lin, P. J. Tzeng, T. C. Tien, T. Y. Wang, L. B.

Chang, J. R. Yang, M. J. Tsai, Ruthenium oxide metal nanocrystal capacitors with high-k dielectric tunneling barriers for nanoscale nonvolatile memory device applications, Microelectronic Engineering, 87, 1821 (2010).

4. T. C. Tien, F. M. Pan, L. P. Wang, C. H. Lee, Y. L. Tung, S. Y. Tsai, C. Lin, F. Y. Tsai, S. J. Chen, Interfacial energy levels and related properties of atomic-layer-deposited Al2O3 films on nanoporous TiO2 electrodes of dye-sensitized solar cells, Nanotechnology, 20, 305201 (2009).

5. C. P. Chen, T. C. Tien, B. T. Ko, Y. D. Chen, C. Ting, Energy level alignment at the anode of poly(3-hexylthiophene)/fullerene-based solar cells,

ACS Appl. Mater. Interfaces, 1(4). 741 (2009).

6. T. M. Chen, J. Y. Hung, F. M. Pan, L. Chang, S. C. Wu, T. C. Tien, Pulse electrodeposition of iridium oxide on silicon nanotips for field emission study, J. Nanosci. Nanotech., 9(5), 3264 (2009).

7. C. Lin, F. Y. Tsai, M. H. Lee, C. H. Lee, T. C. Tien, L. P. Wang, S. Y. Tsai, Enhanced performance of dye-sensitized solar cells by an Al2O3 charge-recombination barrier formed by low-temperature atomic layer deposition, J. Mater. Chem., 19, 2999 (2009).

8. S. Maikap, A. Das, T. Y. Wang, T. C. Tien, L. B. Chang, High-k HfO2 Nanocrystal Memory Capacitors Prepared by Phase Separation of Atomic-Layer-Deposited HfO2/Al2O3 Nanomixtures, J. Electrochem. Soc.,

156, 3, K28 (2009).

9. S. Maikap, S. Z. Rahaman, T. C. Tien, Nanoscale nonvolatile memory

characteristics using n-Si/SiO2/HfAlO nanocrystal/Al2O3/Pt capacitors,

Nanotechnology, 19, 435202 (2008).

10. Y. M. Shulga, T. C. Tien, C. C. Huang, S. C. Lo, V. E. Muradyan, N. F.

Polyakova, Y. C. Ling, R. O.Loutfy, A. P. Moravsky, XPS study of fluorinated carbon multi-walled nanotubes, J. Electron Spectroscopy, 160, 22 (2007).

11. S. Maikap, T. Y. Wang, P. J. Tzeng, T. C. Tien, L. S. Lee, J. R. Yang, M. J.

Tsai, Band offsets and charge storage characteristics of atomic layer deposited high-k HfO2/TiO2 multilayers, Appl. Phys. Lett., 90, 262901 (2007).

12. S. Maikap, P. J. Tzeng, H. Y. Lee, C. C. Wang, T. C. Tien, L. S. Lee, M. J.

Tsai, Physical and electrical characteristics of atomic layer deposited TiN nanocrystal memory capacitors, Appl. Phys. Lett., 91, 043114 (2007).

13. W. H. Tuan, T. C. Tien, Effect of addition of a small amount of silver on the microstructure and mechanical properties of YBa2Cu2O7−x, Mater. Chem.

Phys, 39, 72 (1994).

14. W. H. Tuan, T. C. Tien, Mechanical performance of YBa2Cu3O7−x-Ag composites, J. Mater. Sci. Lett., 13, 1019 (1994).

研討會論文

1. Ta-Chang Tien, Yu-Ming Wang, Jun-Chin Liu, C. S. Chou, New development in nanotechnology for solar cells, International nanotechnology exhibition and conference (Nano Tech 2010).

2. Ta-Chang Tien, Fu-Ming Pan, Lih-Ping Wang, Song-Yeu Tsai, Ching Lin,

Feng-Yu Tsai, 染料敏化太陽電池之殼/核電極之覆蓋率模型, 奈米元件 技術研討會 (SNDT 2010).

3. Lih-Ping Wang, Ta-Chang Tien, Fu-Ming Pan, Song-Yeu Tsai, Ching Lin, Feng-Yu Tsai, 氧化鋁於染料敏化太陽能電池 ALD 成長分析, 奈米元件 技術研討會 (SNDT 2010).

4. Ta-Chang Tien, Lih-Ping Wang, Chia-Hua Lee, Yung-Liang Tung, Song-Yeu Tsai, Ching Lin, Feng-Yu Tsai and Su-Jen Chen, 能帶對準在染 敏太電之ALD Al2O3/TiO2電極之研究, 第十三屆奈米工程暨微系統研討 會 (2009).

5. Ta-Chang Tien, Fu-Ming Pan, Chi-Chen Huang, Lih-Ping Wang, Chia-Hua Lee, Chih-Ping Chen, Energy Level Alignment in Organic Solar Cells using Electron Spectroscopy, 表面特性分析在奈米科技和材料研發的現況與進 展研討會 (2008).

6. Lih-Ping Wang, Ta-Chang Tien, Chia-Hua Lee, Ching Lin, Feng-Yu Tsai, Yung-Liang Tung, Song-Yeu Tsai, Thickness dependence of energy levels for ultrathin Al2O3-coated TiO2 mesoporous films, 中 國 化 學 會 年 會 (2008).