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Light emission enhancement of GaN-based light -emitting diodes via

GaN-based light-emitting diodes via the hierarchical structure: SiO

2

nanorods/p-GaN microdomes

§ 6-1 Introduction

Nitride-based light emitting diodes (LEDs) have been utilized in various

applications, such as displays, cell phones, and general lighting.[1] The huge

commercial success is the main driving force of the intensive research efforts in this

field. As the internal quantum efficiencies (IQE) of InGaN-based quantum wells have

been well above 60% due to the advance of epitaxial growth technologies, the

external quantum efficiencies (EQE), being mostly below 50%, are still in need of

effective approaches for further improvement. One of the hurdles to be overcome is

the large difference in refractive index (n) between the air (n=1) and GaN (n~2.5) [2],

leading to a very limited critical angle, θc~23o, for light escape from the

air/semiconductor interface. Numerous studies on light extraction enhancement of

GaN LEDs had been reported.[3-5] Surface roughening is among the popular methods.

Roughening GaN surface via wet or dry etching technologies has recently been

reported.[6-8] It is demonstrated that the textured surfaces can result in enhanced light

trapping by the scattering effects on the roughened surface. Furthermore, IQE of

LEDs can also be improved by the texturing of p-GaN, which is due to the relaxation

of in-plane strain and consequent reduction of piezoelectric field.[9,10]

Moreover, a variety of nanostructures have been introduced to avoid the abrupt

change of refractive index at air/device interface to reduce the interface reflection,

leading to improved light extraction/harvesting efficiency. For examples, the

improved light-harvesting of solar cells can be realized using nanostructures as ZnO

nanorods [11-13], Si nanowires [14], SiO2nano-honeycombs [15], etc. On the other

hand, the light emission intensity of GaN LEDs can be enhanced via ZnO nanorods

[16-19], micropillars [20] and pyramid structures [21,22] due to the improved light

extraction. Among the materials for light-harvesting nanostructures, SiO2 is a

promising candidate due to its intermediate refractive index (n~1.55 at 460 nm) [23]

between air and GaN, the low absorption in visible region [24,25], and the wide

bandgap of 8.9 eV [25], which is well above the emission energies of nitride-based

LEDs. As Yik Khoon et al. reported [26], SiO2 nanostructures obtained by the

fabrication with photoresist-free and wafer-scale-uniformity capabilities are

particularly applicable to photon extraction from LEDs. Besides, it is recently found

that SiO2 nanostructures can be produced by a nature lithography technique utilizing

simple annealing process.[27] Therefore, SiO2nanorods arrays (NRAs) produced by a

self-assembled Ag nanoparticles and dry etching method hold a great promise for

solid-state lighting, and yet relevant studies has been scarcely reported. It is worth to

be mentioned that hierarchical structures integrating nano- and micro-scale roughness

usually present superior and unique functionalities, which are expected to bring

additional advantages beyond single structures.[28,29] For example, the hierarchical

ZnO NRA/silica microsphere structure is investigated to have large light scattering

efficiency due to the further light-scattering enhancement by ZnO NRAs.[30] The

reported nano-/micro- structure is a promising candidate for photovoltaic and

optoelectronic device applications.

In this study, we fabricated the hierarchical SiO2 NRA/p-GaN microdome

structure on GaN-based LEDs, in order to improve the light extraction efficiencies.

Bare p-GaN microdomes are regarded as scattering centers, which help enhance the

LED light output by 16.7 % at 20 mA. Upon the microdomes, the added SiO2NRAs

can further reduce the internal total reflections by mitigating the index change of

air/GaN interface. LEDs employing the hierarchical structure exhibit an excellent

improvement of output intensity by up to 36.8 %, which is attributed to the efficient

scattering effect on the surface texture and the improved impedance match between

air and GaN. Finite-difference time-domain (FDTD) simulations solving Maxwell’s

equations are performed to simulate the light propagation across the nanostructure

interfaces. The results show that the hierarchical surface structure leads to additional

photons escaping from the air/device interface, and thus results in the enhanced light

extraction. The proposed concept in this study should benefit the development of

nitride-based LEDs and many other optoelectronic devices.

§ 6-2 Experiment

The MQW blue LEDs were grown by metal–organic chemical vapor deposition

on c-plane sapphire substrates. The layer structures consist of fifteen periods of

intentionally undoped In0.15Ga0.85N (2.4 nm)/GaN (14 nm) MQWs, sandwiched by a

2.5-μm n-type (Si-doped) and a 0.2-μm p-type (Mg-doped) GaN layer. The free

carrier concentrations for n-type and p-type GaN are around 2×1018 cm-3 and 5×1017

cm-3, respectively. Ammonia (NH3), trimethylgallium (TMG, for n-GaN and p-GaN),

triethylgallium (TEG, for MQWs), and trimethylindium (TMI) were used as the

precursors. Surface morphologies of p-GaN were controlled by TMGa flows and

substrate temperatures. For flat p-GaN, TMGa flow rate was 45 μmol/min and

substrate temperature was in the range of 950-1100 °C; for p-GaN microdomes,

TMGa flow rate was increased to more than 55 μmol/min and substrate temperature

was decreased to lower than 920 °C. In device fabrication, indium tin oxide (ITO)

was deposited by electron beam evaporation on p-GaN to form transparent ohmic

contacts. The 1×1 mm2 diode mesas were then defined by chlorine-based plasma

etching. The contacting scheme consists of fingered Ti/Al/Ni/Au metal grids with the

thicknesses of 20/400/20/2000 nm deposited on the ITO and n-GaN. To fabricate a

hierarchical structure, SiO2NRAs were performed on the p-GaN microdome LED via

the same procedures in chapter 5 (see Fig. 5.1).

§ 6-3 Results and Discussion

Fig. 6.1(a) and the inset are respectively the 45-degree-tilted and the

cross-sectional SEM images of p-GaN microdome surface. The geometric dimensions

of these p-GaN microdomes are 530 250 nm in height and 600 370 nm in

diameter. Fig. 6.1(b) and the inset are the 45-degree-tilted and the cross-sectional

images of SiO2 NRA/p-GaN microdome surface, respectively. These vertically

aligned SiO2NRAs are around 400 nm high and the diameters range from 50 to 150

nm.

Figure 6.1 (a) and the inset are 45-degree tilted and cross-sectional surface images of p-GaN microdome LED respectively. (b) and the inset are 45-degree tilted and cross-sectional surface images of SiO2NRA/p-GaN microdome LED respectively.

The electrical characteristics (I-V curves) of the LEDs are presented in the inset

of Fig. 6.2. The devices with p-GaN microdomes and SiO2NRAs/p-GaN microdomes

respectively show the forward voltages of 3.17 V and 3.21 V at the driving current of

20 mA, which are slightly smaller than that (3.23 V) of the flat device. The result is

attributed to the improved ohmic contact resistance due to the increased contact area

of microdomed surfaces. Furthermore, the slightly higher operation voltage of

NRA/microdome LED than bare microdome LED is attributed to the additional

increased series resistances, which are possibly caused by the additional surface

recombination centers and damage occurring during the RIE process of SiO2NRAs.

Fig. 6.2 shows the light intensity as a function of injection current (L-I curve) for Figure 6.1 (a) and the inset are 45-degree tilted and cross-sectional surface images of p-GaN microdome LED respectively. (b) and the inset are 45-degree tilted and cross-sectional surface images of SiO2NRA/p-GaN microdome LED respectively.

The electrical characteristics (I-V curves) of the LEDs are presented in the inset

of Fig. 6.2. The devices with p-GaN microdomes and SiO2NRAs/p-GaN microdomes

respectively show the forward voltages of 3.17 V and 3.21 V at the driving current of

20 mA, which are slightly smaller than that (3.23 V) of the flat device. The result is

attributed to the improved ohmic contact resistance due to the increased contact area

of microdomed surfaces. Furthermore, the slightly higher operation voltage of

NRA/microdome LED than bare microdome LED is attributed to the additional

increased series resistances, which are possibly caused by the additional surface

recombination centers and damage occurring during the RIE process of SiO2NRAs.

Fig. 6.2 shows the light intensity as a function of injection current (L-I curve) for Figure 6.1 (a) and the inset are 45-degree tilted and cross-sectional surface images of p-GaN microdome LED respectively. (b) and the inset are 45-degree tilted and cross-sectional surface images of SiO2NRA/p-GaN microdome LED respectively.

The electrical characteristics (I-V curves) of the LEDs are presented in the inset

of Fig. 6.2. The devices with p-GaN microdomes and SiO2NRAs/p-GaN microdomes

respectively show the forward voltages of 3.17 V and 3.21 V at the driving current of

20 mA, which are slightly smaller than that (3.23 V) of the flat device. The result is

attributed to the improved ohmic contact resistance due to the increased contact area

of microdomed surfaces. Furthermore, the slightly higher operation voltage of

NRA/microdome LED than bare microdome LED is attributed to the additional

increased series resistances, which are possibly caused by the additional surface

recombination centers and damage occurring during the RIE process of SiO2NRAs.

Fig. 6.2 shows the light intensity as a function of injection current (L-I curve) for

the three devices. The LED with SiO2NRA/p-GaN microdome structure exhibits the

highest emission intensities in the entire current range, which is believed to result

from the enhanced scattering effects on the hierarchical structure and the smoothened

transition of refractive index from GaN to air provided by the SiO2NRAs [31-33],

both of which greatly improve light extraction from the device.

Compared with flat LED, the emission intensities of bare microdome LED and

hierarchical LED exhibit the enhancements of 16.7 % and 36.8 % at 20 mA,

respectively. The enhancements of the two textured surfaces are attributed to the

improved light extraction or EQE caused by the roughened morphologies. Surface

roughening with p-GaN microdomes not only increases the total emission area but

also increases the variation of the optical incident angles at the interfaces between

GaN and air, which is believed to reduce the undesired total internal reflections within

GaN. Besides the enhancement of light extraction efficiency, the p-GaN roughening

can further improve the IQE of LEDs which has recently been disscussed.[3,9,34]

Accordingly, it is believed that the microdomed p-GaN can increase the LED light

output due to the improved light extraction and IQE. For the hierarchical structure, the

added SiO2 NRAs can be regarded as an intermediate medium with the gradient

refractive index further mitigating the abrupt index change between air and p-GaN

microdomes. This effective medium effect additionally suppresses the Fresnel

reflections from device to air. Consequently, the hierarchical structure results in the

most light extraction of LEDs.

Figure 6.2 Light-output intensity versus injection currents (L-I curves) of flat, p-GaN microdome, and SiO2NRA/p-GaN microdome LEDs. The inset is the corresponding I-V characteristics.

In order to reveal the light propagation across the roughened surface structures,

the distributions of electromagnetic fields within the device structures were simulated

by FDTD analysis. We modeled three different geometric features of the LEDs with

flat, p-GaN microdome, and SiO2 NRA/p-GaN microdome surfaces. Fig. 6.3(a)-(c)

visualize the time-averaged TE-polarized electric field intensity distributions, |Ey|, for

GaN blue LEDs with different surface conditions at 460 nm wavelength. All of the reflections from device to air. Consequently, the hierarchical structure results in the

most light extraction of LEDs.

Figure 6.2 Light-output intensity versus injection currents (L-I curves) of flat, p-GaN microdome, and SiO2NRA/p-GaN microdome LEDs. The inset is the corresponding I-V characteristics.

In order to reveal the light propagation across the roughened surface structures,

the distributions of electromagnetic fields within the device structures were simulated

by FDTD analysis. We modeled three different geometric features of the LEDs with

flat, p-GaN microdome, and SiO2 NRA/p-GaN microdome surfaces. Fig. 6.3(a)-(c)

visualize the time-averaged TE-polarized electric field intensity distributions, |Ey|, for

GaN blue LEDs with different surface conditions at 460 nm wavelength. All of the reflections from device to air. Consequently, the hierarchical structure results in the

most light extraction of LEDs.

Figure 6.2 Light-output intensity versus injection currents (L-I curves) of flat, p-GaN microdome, and SiO2NRA/p-GaN microdome LEDs. The inset is the corresponding I-V characteristics.

In order to reveal the light propagation across the roughened surface structures,

the distributions of electromagnetic fields within the device structures were simulated

by FDTD analysis. We modeled three different geometric features of the LEDs with

flat, p-GaN microdome, and SiO2 NRA/p-GaN microdome surfaces. Fig. 6.3(a)-(c)

visualize the time-averaged TE-polarized electric field intensity distributions, |Ey|, for

GaN blue LEDs with different surface conditions at 460 nm wavelength. All of the

calculated values are normalized to the ones of the excitation source. It can be seen

that the emitted field intensities (in air) of both p-GaN microdome and SiO2

NRA/p-GaN microdome devices are enhanced. Compared with the flat LED of Fig.

6.3(a), the p-GaN microdome structure, marked in Fig. 6.3(b), results in strong field

intensities on the roughened surface, indicating enhanced light scattering. Moreover,

in Fig. 6.3(c), one can see that the regions of SiO2NRAs/p-GaN microdomes further

strengthen field intensities inside the microdomes and NRAs, and lead to the most

scattering centers on the device surface. The strong scattering and re-bouncing of light

within SiO2NRAs/p-GaN microdomes signal an improved light extraction from the

device internal, which are supported by the observation that the light trapped inside

the device in Fig. 6.3(c) is less than that in Fig. 6.3(b) and this results in less field

intensity leaking out from the backside (through n-GaN and sapphire). In other words,

integrating SiO2 NRAs with p-GaN microdomes not only help light propagate across

the interfaces by avoiding the abrupt index transition from GaN to air but also

reinforce the field distribution within the roughness by increasing the light scattering

through the surfaces. As a result, this hierarchical structure leads to the most light

extraction.

Fig. 6.3(d) shows the normalized optical power, integrated over the marked

regions, as a function of time for the three LEDs. Steady-state power values for the

three devices are 0.647, 0.693 and 0.791, respectively. Compared with the flat LED,

the optical power enhancement of the two textured LEDs are 7.1 % and 22.3 %,

respectively. This indicates that these textured nanostructures can increase the number

of the photons leaving LEDs, and thus enhance light extraction efficiency.

Figure 6.3 Time-averaged and normalized TE electric field distribution, |Ey|, simulated by FDTD analysis with different surface conditions at 460 nm wavelength, (a) Flat, (b) p-GaN microdome, (c) SiO2 NRA/p-GaN microdome, (d) Normalized optical power, integrated over the framed regions, as a function of times for the three LEDs.

three devices are 0.647, 0.693 and 0.791, respectively. Compared with the flat LED,

the optical power enhancement of the two textured LEDs are 7.1 % and 22.3 %,

respectively. This indicates that these textured nanostructures can increase the number

of the photons leaving LEDs, and thus enhance light extraction efficiency.

Figure 6.3 Time-averaged and normalized TE electric field distribution, |Ey|, simulated by FDTD analysis with different surface conditions at 460 nm wavelength, (a) Flat, (b) p-GaN microdome, (c) SiO2 NRA/p-GaN microdome, (d) Normalized optical power, integrated over the framed regions, as a function of times for the three LEDs.

three devices are 0.647, 0.693 and 0.791, respectively. Compared with the flat LED,

the optical power enhancement of the two textured LEDs are 7.1 % and 22.3 %,

respectively. This indicates that these textured nanostructures can increase the number

of the photons leaving LEDs, and thus enhance light extraction efficiency.

Figure 6.3 Time-averaged and normalized TE electric field distribution, |Ey|, simulated by FDTD analysis with different surface conditions at 460 nm wavelength, (a) Flat, (b) p-GaN microdome, (c) SiO2 NRA/p-GaN microdome, (d) Normalized optical power, integrated over the framed regions, as a function of times for the three LEDs.

Fig. 6.4 indicates the normalized radiation profiles of the three LED samples. The

corresponding viewing angles of flat, microdome, and NRA/microdome LEDs are

112°, 114 ° and 115°, respectively. The wider and stronger emission cone of

NRAs/microdomes LEDs is in line with the enhanced scattering effects shown in Fig.

6.3(c), confirming the excellent scattering and light-extraction abilities of the

NRAs/microdomes [16]. This lambertian light emission might be beneficial to the

applications in general lighting.

Figure 6.4 Radiation patterns of the three LEDs under a 20 mA injected current.

Fig. 6.4 indicates the normalized radiation profiles of the three LED samples. The

corresponding viewing angles of flat, microdome, and NRA/microdome LEDs are

112°, 114 ° and 115°, respectively. The wider and stronger emission cone of

NRAs/microdomes LEDs is in line with the enhanced scattering effects shown in Fig.

6.3(c), confirming the excellent scattering and light-extraction abilities of the

NRAs/microdomes [16]. This lambertian light emission might be beneficial to the

applications in general lighting.

Figure 6.4 Radiation patterns of the three LEDs under a 20 mA injected current.

Fig. 6.4 indicates the normalized radiation profiles of the three LED samples. The

corresponding viewing angles of flat, microdome, and NRA/microdome LEDs are

112°, 114 ° and 115°, respectively. The wider and stronger emission cone of

NRAs/microdomes LEDs is in line with the enhanced scattering effects shown in Fig.

6.3(c), confirming the excellent scattering and light-extraction abilities of the

NRAs/microdomes [16]. This lambertian light emission might be beneficial to the

applications in general lighting.

Figure 6.4 Radiation patterns of the three LEDs under a 20 mA injected current.

§ 6-4 Summary

In summary, we fabricated two surface-textured LEDs respectively with p-GaN

microdomes and SiO2 NRAs/p-GaN microdomes. Using self-assembled Ag

nanoparticles as etching masks and subsequent RIE, the fabricated SiO2NRA/p-GaN

microdome LED enhances light output intensity at 20 mA by up to 36.8 %, as

compared with flat LED. The SiO2 NRAs provide an effective refraction index to

reduce the total internal reflection at the air/GaN interface and the microdomes lead to

stronger light scattering effect, increasing the light extraction efficiency of LEDs. The

presented concept and manufacturing technique of surface roughening would be a

viable way to enhance the light extraction efficiency for nitride-based LEDs.

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