國立臺灣大學電機資訊學院光電工程學研究所 碩士論文
Graduate Institute of Photonics and Optoelectronics College of Electrical Engineering and Computer Science
National Taiwan University Master Thesis
從奈米到微米結構設計以達成氮化銦鎵/氮化鎵元件 之高效能光擷取/光萃取
Efficient Light Harvesting/Extraction Schemes Employing Structure Designs from Microscale to
Nanoscale for InGaN/GaN Devices
研究生: 何政翰 Cheng-Han Ho
指導教授:何志浩 博士 Advisor:Jr-Hau He, Ph.D.
中華民國 101 年 6 月
致謝
在研究所短短兩年時間,能完成這篇碩士論文及其餘的研究成果,我要特別
感謝我的指導教授何志浩老師、賴昆佑老師及林冠中學長,也要感謝實驗室的每
一位成員對我的幫助與給我的建議,這段時間能有你們的陪伴真的很好,不論是
課業、研究實驗及日常生活上,大家彼此互助,有困處也不吝於給予幫助,使我
們實驗室像個溫暖的家,謝謝大家。另外,也要感謝所有的口試委員,能特地撥
空前來給予我指導,使本篇論文內容更加地完整。
回想剛進研究所的前半年,實驗上遭遇了種種的不順利及不愉快,多虧了實
驗室政營學長、伯康學長的建議及鼓勵,才使我的實驗漸漸步上軌道,一步步的
從做實驗、模擬到寫出論文,也感謝老師平時在研究之外,教導我們做人處事應
有的態度及觀念,對我受益良多,也確實讓我學到了課本以外學不到的東西,我
想老師、學長教給我的想法觀念,應該會一輩子在我的生活、工作裡時時提醒、
督促著我,讓我不斷進步、成長。研究所的這兩年,我覺得是我求學生涯裡過得
最有價值的兩年,最後,感謝並祝福所有曾給予我幫助的老師、同學們。
政翰 謹誌於台大
2012 年 6 月
摘要
在本篇論文中,我們將先討論氮化鎵系的太陽能電池,接著為氮化鎵系的發 光二極體,最後是我們的總結。
首先,在氮化銦鎵系的多重量子井太陽能電池上,利用自組裝的銀奈米小球 當作蝕刻遮罩,去做反應式離子蝕刻,製做出二氧化矽奈米柱陣列。由於光捕捉 效應及折射率的匹配(在空氣及元件間),使此二氧化矽奈米柱陣列可有效地降低 元件的表面反射率(從 330 至 570 奈米波段)。電池在模擬太陽光源(air mass 1.5G) 的照射下,其短路電流明顯提升,而轉換效率可增加 21 %。模擬軟體的分析也 進一步証明此表面結構能改善電池的光伏特性。
第二,將太陽能電池的 p 型氮化鎵層製做成微米鐘的結構,也可以顯著的提 升其轉化效率達 102 %之多。此微米鐘結構能降低元件表面的反射率,增加電池 的光吸收能力,並提升短路電流及填充因子。此經由磊晶直接成長出微米鐘的方 法,可有效的改善元件的光伏特性。
第三,二氧化矽奈米柱陣列/p 型氮化鎵微米鐘的分層結構被應用在氮化銦 鎵的多層量子井太陽能電池上,以當作光擷取層。同樣以自組裝的銀球當作蝕刻 遮罩來做反應式離子蝕刻,來將二氧化矽奈米柱陣列製作於 p 型氮化鎵微米鐘之 上。由於此粗糙結構的光捕捉效應以及奈米柱具匹配的折射率,使得介面的菲涅 耳反射(Fresnel reflection)能被更有效地降低。具此分層結構的電池表現出優 異的光伏特性,能提升短路電流及填充因子,進而使轉換效率增加 1.47 倍。此 外 , 元 件 光 吸 收 能 力 的 增 加 與 以 有 限 差 分 時 域 法 (finite-difference time-domain, FDTD)分析的結果相吻合。
最後,我們將此分層結構應用在 LED 上,發現能增加 LED 的出光強度。與表 面未經粗化的 LED 相比,在 20mA 注入電流下,微米鐘 LED 出光強度增強 16.7 %,
而奈米柱/微米鐘 LED 則增強了 36.8 %之多。此結果歸因於粗化結構能使出射光
散射並提供一等效折射率,來降低元件的內部全反射,進而提高光萃取率。此 LED 出光強度的增加也同樣可由有限差分時域法來分析得到。
關鍵字: 太陽能電池,氮化銦鎵/氮化鎵,反應式離子蝕刻,奈米柱,抗反射,
光擷取,微米鐘,發光二極體,內/外部量子效率,光萃取效率。
Abstract
In this thesis, we will firstly focus on InGaN/GaN solar cells, and secondly we move to GaN/InGaN light emitting diodes. The final is our conclusion.
First, SiO2 nanorod arrays (NRAs) are fabricated on InGaN-based multiple quantum well (MQW) solar cells using self-assembled Ag nanoparticles as the etching mask and subsequent reactive ion etching. The SiO2NRAs effectively suppress the undesired surface reflections over the wavelengths from 330 to 570 nm, which is attributed to the light-trapping effect and the improved mismatch of refractive index at the air/MQW device interface. Under the air mass 1.5 global illumination, the conversion efficiency of the solar cell is enhanced by ~21 % largely due to increased short-circuit current from 0.71 to 0.76 mA/cm2. The enhanced device performances by the optical absorption improvement are supported by the simulation analysis as well.
Second, InGaN-based multiple quantum well (MQW) solar cells (SCs) employing the p-GaN microdome were demonstrated to significantly boost the conversion efficiency by 102 %. The improvements in short-circuit current density (Jsc, from 0.43 to 0.54 mA/cm2) and fill factor (from 44 % to 72 %) using the p-GaN microdome are attributed to enhanced light absorption due to surface reflection suppression. The concept of microdome directly grown during SC epitaxial growth preserving mechanical robustness and wafer-scale uniformity proves a promising way in promoting the photovoltaic performances of SCs without any additional process.
Third, the hierarchical structure of SiO2nanorod arrays/p-GaN microdomes was applied as a light harvesting scheme on InGaN-based multiple quantum well solar
cells. Using self-assembled Ag nanoparticles as the etching mask and subsequent reactive ion etching, SiO2NRAs were fabricated upon the p-GaN microdomes. Due to the light trapping effect of the roughness and the improved match of refractive index by SiO2 nanorod arrays, the undesired Fresnel reflections are effectively suppressed.
Cells with the hierarchical surfaces exhibit excellent photovoltaic performances including enhanced short-circuit current densities and fill factor, and the measured conversion efficiency is enhanced by 1.47-fold. The improved light absorption in device is consistent with the finite-difference time-domain analysis.
Finally, we report the enhanced light extraction efficiency of the hierarchical structure, SiO2 nanorods/p-GaN microdomes, fabricating on InGaN/GaN LEDs.
Compared with conventional flat LEDs, the light output intensity of bare microdome LED presents an improvement of 16.7 % at 20 mA, yet it boosts to 36.8 % for SiO2
NRA/p-GaN microdome LED. The results are attributed to the scattering effect and the effective refraction indexes of the textured structures that reduce the total internal reflection, contributing to the most light extraction. The enhanced optical performances are supported by the improved light output power calculated by finite-difference time-domain analysis.
Keywords: Solar cell (SC), InGaN/GaN, Reactive ion etching (RIE), Nanorod, Antireflection, Light harvesting, Microdome, Light-emitting diode (LED), Internal/External quantum efficiency (IQE/EQE), Light extraction efficiency.
List of Contents
口試委員會審定書...I 致謝...II 摘要...III Abstract...V List of Contents...VII List of Figures and Tables...IX Chapter 1 Introduction
Introduction ...1
Chapter 2 Experimental setup Experimental setup……….3
Chapter 3 An efficient light-harvesting scheme using SiO2nanorods for InGaN MQW solar cells 3-1 Introduction ...4
3-2 Experiment...6
3-3 Results and Discussion ...8
3-4 Summary...15
3-5 References…...16
Chapter 4 Microdome InGaN-Based Multiple Quantum Well Solar Cells 4-1 Introduction ...19
4-2 Experiment...21
4-3 Results and Discussion ...22
4-4 Summary ...30
4-5 References...31
Chapter 5 Efficient light harvesting scheme for InGaN-based quantum well solar cells employing the hierarchical structure: SiO2 nanorods/p-GaN microdomes
5-1 Introduction ...34
5-2 Experiment...37
5-3 Results and Discussion ...38
5-4 Summary ...46
5-5 References...47
Chapter 6 Light emission enhancement of GaN-based light -emitting diodes via the hierarchical structure: SiO2nanorods/p-GaN microdomes 6-1 Introduction ...49
6-2 Experiment...52
6-3 Results and Discussion ...53
6-4 Summary ...60
6-5 References...61
Chapter 7 Conclusion Conclusion...64
Cheng-Han Ho curriculum vitae………,…….………66
Publication list………..….……….67
List of Figures and Tables
Chapter 3
Figure 3.1 Schematic of fabrication procedures for the antireflective nanostructures on InGaN MQW solar cells.
Figure 3.2 (a) Top-view and (b) 45-degree tilted-view SEM images of the SiO2 NRAs.
Figure 3.3 Specular reflectance measured on the MQW solar cells with bare and SiO2 NRA surfaces.
Figure 3.4 Time-averaged, normalized TE electric field distribution, |Ey|, simulated by FDTD analysis for the MQW solar cells with (a) bare and (b) SiO2
NRA surfaces with a 380-nm incident light. (c) Normalized optical power, integrated over the MQW region, as a function of times for two kinds of solar cells.
Figure 3.5 (a) EQEs and (b) J–V characteristics measured on the MQW solar cells with bare and SiO2NRA surfaces.
Table 3.1 Device characteristics of the MQW solar cells with bare and NRAs surfaces.
Chapter 4
Figure 4.1 45 degree-tilted SEM image of the MQW SCs with p-GaN microdomes.
The inset shows the cross-sectional SEM image.
Figure 4.2 Specular reflection measured on the MQW SCs with flat and microdome-like p-GaN surfaces.
Figure 4.3 Time-averaged and normalized TE electric field distribution simulated by FDTD analysis with two surface structures: (a) flat and (b) p-GaN microdomes. (c) Normalized optical power, integrated over the MQW region, as a function of times for the two kinds of SCs at 400 nm wavelength.
Figure 4.4 J–V characteristics measured on the MQW SCs with two kinds of surface structures.
Figure 4.5 (a) EQE curves and (b) IQE curves for the SCs with two kinds of surface structures.
Figure 4.6 The absorption spectra of InGaN MQW SCs with and without microdome structures.
Table 4.1 PV characteristics of InGaN MQW SCs with two kinds of surface structures.
Chapter 5
Figure 5.1 Schematic of fabrication procedures for the SiO2 nanorod/p-GaN microdome structure on InGaN/GaN SCs.
Figure 5.2 (a) and the inset are cross-sectional and 45 degree SEM images of p-GaN microdome device, respectively. (b) and the inset are cross-sectional and 45 degree SEM images of SiO2 NRA/p-GaN microdome device, respectively.
Figure 5.3 Specular reflection measured on the MQW SCs with planar, p-GaN microdome and SiO2NRA/p-GaN microdome surfaces.
Figure 5.4 Time-averaged and normalized TE electric field distribution, |Ey| , simulated by FDTD analysis with different surface structures, (a) Planar, (b) p-GaN microdomes, (c) SiO2NRAs/p-GaN microdomes with a 400-nm incident light. (d) Normalized optical power, integrated over the MQW region, as a function of times for the three SCs.
Figure 5.5 (a) J–V characteristics and (b) EQE curves measured on the MQW SCs with three surface conditions.
Table 5.1 Device characteristics of InGaN MQW SCs with three surface structures.
Chapter 6
Figure 6.1 (a) and the inset are 45-degree tilted and cross-sectional surface images of p-GaN microdome LED respectively. (b) and the inset are 45-degree tilted and cross-sectional surface images of SiO2NRA/p-GaN microdome LED respectively.
Figure 6.2 Light-output intensity versus injection currents (L-I curves) of flat, p-GaN microdome, and SiO2NRA/p-GaN microdome LEDs. The insets are the corresponding I-V characteristics and EL spectra at the 20 mA
driving current, respectively.
Figure 6.2 Light-output intensity versus injection currents (L-I curves) of flat, p-GaN microdome, and SiO2NRA/p-GaN microdome LEDs. The insets are the corresponding I-V characteristics.
Figure 6.3 Time-averaged and normalized TE electric field distribution, |Ey|, simulated by FDTD analysis with different surface conditions at 460 nm wavelength, (a) Flat, (b) p-GaN microdome, (c) SiO2 NRA/p-GaN microdome, (d) Normalized optical power, integrated over the framed regions, as a function of times for the three LEDs.
Figure 6.4 Radiation patterns of the three LEDs under a 20 mA injected current.
Chapter 1 Introduction
Recently, since much attention has been paid to the issue of energy shortage,
III-V based optoelectronic devices, such as solar cells (SCs) and light-emitting diodes
(LEDs), gradually become the promising elements with the remarkable potential of
energy reserve. Extensive researches have been devoted to the development of
InGaN-based SCs and LEDs. The light-harvesting and light-extracting layers are
crucial for eliminating optical loss for optical elements, and have many practical
applications to SCs and LEDs.
In this thesis, we firstly use an efficient method to have the SiO2 nanorods to
harvest much light. The approach by using process of self-assembled Ag
nanopraticles and RIE for the SiO2 nanorod fabrication is a useful and low cost
technique. To further enhance the solar-energy harvesting of SCs, approaches to
fabricate antireflection coatings or subwavelength structures with the additional
photo-lithography and wet/dry etching processes have been devoted. However, these
approaches are relatively complex and may further damage the devices. In this regard,
we secondly performed self-assembled p-GaN microdome structure which is directly
grown during the epitaxial growth of SCs. This simple and direct fabrication
preserves the nanostructured device with mechanical robustness, wafer-scale
uniformity and stability. The microdomed structure improves the device performances
by reducing the internal piezoelectric field and increasing the light absorption by light
trapping effect. Integrating microdomes with SiO2 nanorods is supposed to bring
about the most energy-harvesting ability for both SC and LED devices, which will be
demonstrated in the following contents. This would in turn lead to nitride-based SCs
and LEDs with high efficiency. We believe that this approach is of great interest for
researchers working in solar cell devices and III-Nitride optoelectronics device
technologies.
Chapter 2 Experimental setup
The SEM images were recorded by a JEOL JSM-6500 field emission scanning
electron microscope (SEM). The specular reflection spectra were obtained using a
standard UV-visible spectrometer (JASCO ARN-733) at the incident angle of 5o. An
external quantum efficiency (EQE) measurement was carried out under the
monochromatic illumination by a halogen lamp coupled to a monochromator. The
current density-voltage (J-V) curves of solar cells were measured with a Keithley
4200 source meter under the illumination of air mass 1.5 global solar simulator (100
mW/cm2). The electrical characteristics (I-V curves) of LEDs were measured with a
Keithley 2400 source meter. The electroluminescence (EL) spectrum was measured
using an Ocean Optics USB2000 spectrometer.
Chapter 3 An efficient light-harvesting scheme using SiO
2nanorods for InGaN MQW solar cells
§ 3-1 Introduction
InGaN-based solar cells have recently drawn much research attention due to
many desired photovoltaic (PV) characteristics, including the potential to realize
nearly full absorption of solar spectrum, high absorption coefficients, and high
mobilities.[1-3] In addition, InGaN alloys have superior radiation resistance, thermal
stability, and chemical tolerance.[3] In consideration of the structure design for active
regions, multiple quantum wells (MQWs) consisting of the InGaN layers thinner than
the critical thickness on GaN not only prevent the formation of undesired crystal
defects, but also provide an additional control of light absorption through the
quantized energy levels.[4]
A number of methods have been developed to improve the performances of
InGaN-based MQW solar cells.[5-8]For example, Ag nanoparticles have been utilized
to induce plasmonic resonance on the device surface to enhance light absorption in
the InGaN active region.[7] Kuwahara et al. reported that the PV performances of
InGaN solar cells with supperlattice active layers can be enhanced by optimizing the
barrier thickness.[8]
Recently, it is reported that subwavelength nanostructures exhibit superior
antireflective (AR) performances to their quarter-wavelength thin-film
counterparts.[9,10] It can be clarified by the light trapping effect at short wavelength
regions and the effective medium effect at long wavelength regions [11,12], where the
nanostructures can be regarded as an effective medium with the effective refractive
index (neff) increasing gradually from air to device surfaces. As the incident light is
reflected at different depths in nanostructured layers, the suppression of the reflection
over a wide range of wavelengths can occur through destructive interferences among
the reflected waves. Periodic subwavelength nanostructures have been fabricated with
various techniques, such as the nanosphere lithography[13,14]and the anodic aluminum
oxide templates.[15,16] For the practical applications, the interests in the AR
nanostructures have been extended to disordered nanostructures using a simple yet
scalable method with low cost.[6,9,17,18]
In this study, we fabricated AR SiO2 nanorod arrays (NRAs) utilizing
self-assembled Ag nanoparticles as a mask and reactive ion etching (RIE) techniques
with photoresist-free and wafer-scale-uniformity capabilities. SiO2 NRAs effectively
reduce surface reflections over a wide wavelength range and thus InGaN MQW solar
cells employing the SiO2 NRAs generate additional photocurrents, corresponding to
the conversion efficiency enhancement of 21 % due to increased short-circuit current
(Jsc) from 0.71 to 0.76 mA/cm2. Simulation results based on finite-difference
time-domain (FDTD) analysis also indicate that the improved device performance is
due to the enhanced optical absorption in the MQW layers upon the application of
SiO2 NRAs. The proposed concept in this study is applicable to other optoelectronic
devices.
§ 3-2 Experiment
The MQW solar cells were grown by metal-organic chemical vapor deposition
on c-plane sapphire substrates. The layer structures consist of nine periods of
intentionally undoped In0.3Ga0.7N (3 nm)/GaN (17 nm) MQWs, sandwiched by a
2.5-μm n-type and a 0.2-μm p-type GaN layer. In content in the MQWs determined by
x-ray diffraction is around 30 %. Following the growth, transparent Ohmic contacts to
p-GaN were formed with indium tin oxide (ITO) deposited by the electron beam
evaporation. The 1×1 mm2diode mesas were then defined by chlorine-based plasma
etching. The contact scheme consists of fingered Ti/Al/Ni/Au metal grids deposited
on the ITO and the n-GaN.
Fig. 3.1 describes the fabrication procedure for SiO2NRAs. First, the SiO2/Ag
layers with the thickness of 300/15 nm were deposited on the ITO layer of
InGaN/GaN MQW solar cells by the electron beam evaporation [Fig. 3.1(a)]. For
forming Ag nanoparticles, a thermal annealing process was carried out in the furnace
at 270 ℃ for 2 min [Fig. 3.1(b)]. Using these Ag nanoparticles as etching masks, the
SiO2layer was patterned by the RIE process with CHF3gas (30 SCCM) and rf power
of 90 W for 9 min [Fig. 3.1(c)]. After removing the remaining Ag nanoparticles by
HNO3, the SiO2NRAs were obtained, as shown in Fig. 3.1(d). It should be mentioned
that we had controlled Ag thickness from 5 nm to 30 nm, annealing temperatures from
250 ℃ to 350 ℃, and annealing times from 1 min to 30 min, which contribute to the
different geometries of self-assembled Ag nanoparticles. Changing etching times from
5 min to 10 min of RIE increased nanorod lengths. After experimental parameter
optimization, the best photovoltaic conversion efficiency of our solar cells devices can
be obtained using 15-nm-thick Ag films combining an annealing process at 270 ℃ for
2 min and subsequent RIE process for 9 min.
Figure 3.1 Schematic of fabrication procedures for the antireflective nanostructures forming Ag nanoparticles, a thermal annealing process was carried out in the furnace
at 270 ℃ for 2 min [Fig. 3.1(b)]. Using these Ag nanoparticles as etching masks, the
SiO2layer was patterned by the RIE process with CHF3gas (30 SCCM) and rf power
of 90 W for 9 min [Fig. 3.1(c)]. After removing the remaining Ag nanoparticles by
HNO3, the SiO2NRAs were obtained, as shown in Fig. 3.1(d). It should be mentioned
that we had controlled Ag thickness from 5 nm to 30 nm, annealing temperatures from
250 ℃ to 350 ℃, and annealing times from 1 min to 30 min, which contribute to the
different geometries of self-assembled Ag nanoparticles. Changing etching times from
5 min to 10 min of RIE increased nanorod lengths. After experimental parameter
optimization, the best photovoltaic conversion efficiency of our solar cells devices can
be obtained using 15-nm-thick Ag films combining an annealing process at 270 ℃ for
2 min and subsequent RIE process for 9 min.
Figure 3.1 Schematic of fabrication procedures for the antireflective nanostructures forming Ag nanoparticles, a thermal annealing process was carried out in the furnace
at 270 ℃ for 2 min [Fig. 3.1(b)]. Using these Ag nanoparticles as etching masks, the
SiO2layer was patterned by the RIE process with CHF3gas (30 SCCM) and rf power
of 90 W for 9 min [Fig. 3.1(c)]. After removing the remaining Ag nanoparticles by
HNO3, the SiO2NRAs were obtained, as shown in Fig. 3.1(d). It should be mentioned
that we had controlled Ag thickness from 5 nm to 30 nm, annealing temperatures from
250 ℃ to 350 ℃, and annealing times from 1 min to 30 min, which contribute to the
different geometries of self-assembled Ag nanoparticles. Changing etching times from
5 min to 10 min of RIE increased nanorod lengths. After experimental parameter
optimization, the best photovoltaic conversion efficiency of our solar cells devices can
be obtained using 15-nm-thick Ag films combining an annealing process at 270 ℃ for
2 min and subsequent RIE process for 9 min.
Figure 3.1 Schematic of fabrication procedures for the antireflective nanostructures
on InGaN MQW solar cells.
§ 3-3 Results and Discussion
Fig. 3.2(a)-(b) respectively reveal the top-view and 45-degree cross-sectional
images of the fabricated MQW device with SiO2 NRA surfaces. With Ag
nanoparticles as etching masks, the underlying SiO2 layer was selectively etched
using a CHF3 RIE. Because the metal Ag was slowly eroded away during the RIE,
slightly tapered NRAs can be created on the MQW solar cells through prolonged
etching. Using the CHF3 gas for RIE maintains a smoth surface finish. The average
lengths of the NRAs are around 230 nm, and the diameters are in the range of 50-100
nm, which are controlled by annealing times and temperatures for Ag thin films.
According to Fig. 3.2(a), the area density of the NRAs, defined as the number of
nanorods per unit area, is approximately 1.5×1010 cm-2. The coverage of NRAs is
characterized by the fill factor, which is defined by the area ratio of NRAs to the
entire substrate surfaces using the top-view SEM images of Fig. 3.2(a). The fill factor
of the NRA surface is 0.68. The determined fill factor will be used later for
calculating effective refractive index (neff). It is worth mentioning that the dependence
of AR properties on geometric features for nanorods has been widely studied.[9,19,20]In
particular, it is found that increasing the diameter and the length of the naorods leads
to reduced surface reflectance and improved omnidirectionality. However, it is also
found that the over-lengthened nanorods may lead to the degraded Jsc despite their
lowest reflection, which is attributed to the excessive absorption of the lengthened
nanorods.[6] Accordingly, an appropriate length of nanorods is needed for maximizing
the Jscenhancement. The robustness of the SiO2nanorods can be confirmed during the
fabrication process. For the removal of Ag nanoparticles after etching, the SiO2
nanorods were immersed in 70 % HNO3solvent at 40 ℃-50 ℃ for a few minutes.
Fig. 3.2 shows that the geometries of the overall NRAs are still well preserved after
HNO3 treatment. These results indicate that the rod-like nanostructure can be
fabricated with controllable manner and good yield for achieving low-cost solar
devices.
Figure 3.2 (a) Top-view and (b) 45-degree tilted-view SEM images of the SiO2
NRAs.
Fig. 3.3 is the specular reflection spectra with the wavelengths ranging from 330
to 570 nm. The surface reflectance of the SiO2NRA surface is much lower than that
on the bare surface for the entire studied wavelengths. The significantly low
reflectance at 330-450 nm is particularly important to the efficiency enhancement of
the MQW solar cell, which will be shown in the EQE measurements later. The
suppressed reflection by NRA structures is attributed to several effects. As the
incident wavelength is much higher than the geometric size of NRAs at the long
wavelength region, the reduced reflectance can be explained by the effective medium
theory. Due to the subwavelength dimensions and the refractive index (around 1.56 at
400 nm) of SiO2 [21]
, the SiO2 NRAs behave like an effective medium with the neff
between the refractive indices of air (~1) and ITO (~2.3) layer. neff of the NRAs can
be estimated by the equation[22]:
neff={fnSiOq
2+ [1- fnairq ]}1/q (1)
where q is 2/3,
SiO2
n and nair are respectively the refractive indices of SiO2 and air,
and f is the fill factor. The calculated neffis 1.37 with f = 0.68. Such low neff is rarely
found in natural materials, but is of great importance to achieve broadband AR at the
air/device interface. For the short incident wavelength region, the gaps between NRAs
lead to the light trapping effect. As the light impinges on the nanostructrued surface, it
diffracts to several beams with different diffraction angles, and then re-bounces
between NRAs until the light propagates into MQW regions at a high angle from the
normal, which increases the opportunity of optical absorption by the MQWs due to
the increase of light propagation paths in MQW regions. This speculation will be
further demonstrated by PV measurements and simulations later. We note that the
subwavelength nanostructures result in the suppressed reflectance not only over a
wide range of wavelengths, but also a wide range of incident angles, which can be
clarified by the effective medium theory and the light trapping effect.[23-25]
Figure 3.3 Specular reflectance measured on the MQW solar cells with bare and SiO2
NRA surfaces.
In order to reveal the light propagation across the interfaces, the distributions of
electromagnetic fields within the device structures were simulated by FDTD analysis.
We modeled the devices with bare and SiO2NRA surfaces. Fig. 3.4(a)-(b) visualize
the time-averaged TE-polarized electric field intensity distributions, |Ey|, for the
MQW solar cells with two surface conditions at 380 nm as considering n and k of all
materials.[26] All of the calculated values are normalized to the ones of the excitation
source. It can be seen that the field intensities inside the InGaN MQW region are
enhanced with SiO2NRAs. In the inset of Fig. 3.4(b), where the region of SiO2NRAs
is enlarged, one can see strong field intensity between nanorods, indicating that the
nanorods behave as effective scattering centers. The strong scattering within the
NRAs therefore prevents the incident waves bouncing back to the air and prolongs the
optical path, giving rise to the light-trapping effect. Fig. 3.4(c) shows the normalized
optical power, integrated over the MQW region, as a function of times for bare and
NRA surfaces. The steady-state power values for the cells with bare and NRA
surfaces are 0.744 and 0.824, respectively. The results indicate that the NRAs increase
the number of the photons reaching the MQW region, which benefits the conversion
efficiency of the MQW solar cell.
Figure 3.4 Time-averaged, normalized TE electric field distribution, |Ey|, simulated by FDTD analysis for the MQW solar cells with (a) bare and (b) SiO2NRA surfaces with a 380-nm incident light. (c) Normalized optical power, integrated over the MQW region, as a function of times for two kinds of solar cells.
Fig. 3.5(a) presents the spectra of the EQE for the MQW solar cells with two
kinds of surface conditions, showing the influence of the light-harvesting SiO2NRAs
on PV performances. The EQE for MQW solar cells with SiO2NRAs is improved at
370-440 nm, which agrees with the reduced reflectance seen in Fig. 3.3. Fig. 3.5(b)
shows the J-V curves of the two kinds of solar cells. The PV data summarized from Figure 3.4 Time-averaged, normalized TE electric field distribution, |Ey|, simulated by FDTD analysis for the MQW solar cells with (a) bare and (b) SiO2NRA surfaces with a 380-nm incident light. (c) Normalized optical power, integrated over the MQW region, as a function of times for two kinds of solar cells.
Fig. 3.5(a) presents the spectra of the EQE for the MQW solar cells with two
kinds of surface conditions, showing the influence of the light-harvesting SiO2NRAs
on PV performances. The EQE for MQW solar cells with SiO2NRAs is improved at
370-440 nm, which agrees with the reduced reflectance seen in Fig. 3.3. Fig. 3.5(b)
shows the J-V curves of the two kinds of solar cells. The PV data summarized from Figure 3.4 Time-averaged, normalized TE electric field distribution, |Ey|, simulated by FDTD analysis for the MQW solar cells with (a) bare and (b) SiO2NRA surfaces with a 380-nm incident light. (c) Normalized optical power, integrated over the MQW region, as a function of times for two kinds of solar cells.
Fig. 3.5(a) presents the spectra of the EQE for the MQW solar cells with two
kinds of surface conditions, showing the influence of the light-harvesting SiO2NRAs
on PV performances. The EQE for MQW solar cells with SiO2NRAs is improved at
370-440 nm, which agrees with the reduced reflectance seen in Fig. 3.3. Fig. 3.5(b)
shows the J-V curves of the two kinds of solar cells. The PV data summarized from
the J-V curve is listed in Table 3.1. The agreement between the results in Fig. 3.3, Fig.
3.4, and Fig. 3.5 indicates that the light-harvesting SiO2 NRAs increase the optical
transmission and light propagation paths through the device surface, and hence
enhance the light absorption in the MQW region, giving rise to the additional
photocurrent of the MQW devices with NRA surfaces. The enhanced Jschence boosts
the conversion efficiency from 0.37 % to 0.45 %, which is an efficiency improvement
of ∼21 %.
Figure 3.5 (a) EQEs and (b) J–V characteristics measured on the MQW solar cells with bare and SiO2NRA surfaces.
(a) (b)
Table 3.1 Device characteristics of the MQW solar cells with bare and NRAs surfaces.
Note that FF stands for the fill factor of solar cells, which is defined as the ratio of the actual maximum obtainable power, to the product of Jsc and open circuit voltage (Voc).
AR Layers Jsc(mA/cm2) Voc(V) FF (%) η (%)
Bare 0.71 1.95 27.28 0.37
SiO2NARs 0.76 1.93 31.04 0.45
§ 3-4 Summary
Using self-assembled Ag nanoparticles as an etching mask and RIE method, we
successfully fabricated low-cost light-trapping SiO2 NRAs to improve the optical
absorption of InGaN MQW solar cells. The light-trapping SiO2NRA layer increases
the EQE of the solar cell mostly at 370-440 nm, corresponding to the improvement of
conversion efficiency by up to ~21 %. The superior AR performance of the SiO2
NRAs is attributed to the subwavelength dimensions and the nanorod-structured
geometry, effectively suppressing the surface reflection at the wavelengths from
330–570 nm via the light trapping effect and the graded neff, which have been
demonstrated by PV measurements and simulations. Presented concepts and
manufacturing techniques for light-harvesting nanostructures would be a viable way
to boost the efficiency for a variety of PV devices.
§ 3-5 References
[1] K. Y. Lai, G. J. Lin, Y.-L. Lai, Y. F. Chen, J. H. He, Effect of indium fluctuation on the photovoltaic characteristics of InGaN/GaN multiple quantum well solar cells, Appl. Phys. Lett. 96 (2010) 081103.
[2] K. Y. Lai, G. J. Lin, Y.-L. Lai, J. H. He, Origin of hot carriers in InGaN-based quantum-well solar cells, IEEE Electron Dev. Lett. 32 (2011) 179–181.
[3] J. Wu, W. Walukiewicz, K. M. Yu, W. Shan, J. W. Ager, E. E. Haller, H. Lu, W.
J. Schaff, W. K. Metzger, S. Kurtz, Superior radiation resistance of In1−xGaxN alloys: full-solar-spectrum photovoltaic material system, J. Appl. Phys. 94, (2003) 6477–6482.
[4] K. W. J. Barnham, G. Duggan, A new approach to high-efficiency multi-band-gap solar cells, J. Appl. Phys. 67 (1990) 3490–3493.
[5] E. Matioli, C. Neufeld, M. Iza, S. C. Cruz, A. A. Al-Heji, X. Chen, R. M.
Farrell, S. Keller, S. DenBaars, U. Mishra, S. Nakamura, J. Speck, C. Weisbuch, High internal and external quantum efficiency InGaN/GaN solar cells, Appl.
Phys. Lett. 98 (2011) 021102.
[6] G. J. Lin, K. Y. Lai, C. A. Lin, Y.-L. Lai, J. H. He, Efficiency enhancement of InGaN-based multiple quantum well solar cells employing antireflective ZnO nanorod arrays, IEEE Electron Dev. Lett. 32 (2011) 1104–1106.
[7] I. M. Pryce, D. D. Koleske, A. J. Fischer, H. A. Atwater, Plasmonic nanoparticle enhanced photocurrent in GaN/InGaN/GaN quantum well solar cells, Appl. Phys. Lett. 96 (2010) 153501.
[8] Y. Kuwahara, T. Fujii, T. Sugiyama, D. Iida, Y. Isobe, Y. Fujiyama, Y. Morita, M. Iwaya, T. Takeuchi, S. Kamiyama, I. Akasaki, H. Amano, GaInN-based solar cells using strained-layer GaInN/GaInN superlattice active layer on a
freestanding GaN substrate, Appl. Phys. Express 4 (2011) 021001.
[9] Y. C. Chao, C. Y. Chen, C. A. Lin, Y. A. Dai, J. H. He, Antireflection effect of ZnO nanorod arrays, J. Mater. Chem. 20 (2010) 8134–8138.
[10] K. Y. Lai, Y. R. Lin, H. P. Wang, J. H. He, Synthesis of anti-reflective and hydrophobic Si nanorod arrays by colloidal lithography and reactive ion etching, Cryst. Eng. Comm. 13 (2011) 1014–1017.
[11] P. Beckman, A. Spizzichno, The scattering of electromagnetic waves from rough surfaces, Pergamon, Oxford, 1963.
[12] P. B. Clapham, M. C. Hutley, Reduction of lens reflexion by the ‘moth eye’
principle, Nature 244 (1973) 281–282.
[13] L. Li, T. Y. Zhai, H. B. Zeng, X. S. Fang, Y. Bando, D. Golberg, Polystyrene sphere-assisted one-dimensional nanostructure arrays: synthesis and applications, J. Mater. Chem. 21 (2011) 40–56.
[14] X. D. Wang, E. Graugnard, J. S. King, Z. L. Wang, Large-scale fabrication of ordered nanobowl arrays, Nano Lett. 4 (2004) 2223–2226.
[15] Z. Fan, J. C. Ho, Self-assembly of one-dimensional nanomaterials for cost-effective photovoltaics, Int. J. Nanoparticles 4 (2011) 164–183.
[16] Z. Fan, R. Kapadia, P. W. Leu, X. Zhang, Y.-L. Chueh, K. Takei, K. Yu, A.
Jamshidi, A. A. Rathore, D. J. Ruebusch, M. Wu, A. Javey, Ordered arrays of dual-diameter nanopillars for maximized optical absorption, Nano Lett. 10 (2010) 3823–3827.
[17] Y. J. Lee, D. S. Ruby, D. W. Peters, B. B. McKenzie, J. W. P. Hsu, ZnO nanostructures as efficient antireflection layers in solar cells, Nano Lett. 8 (2008) 1501–1505.
[18] H. C. Chang, K. Y. Lai, Y. A. Dai, H. H. Wang, C. A. Lin and J. H. He,
Nanowire arrays with controlled structure profiles for maximizing optical collection efficiency, Energy Environ. Sci. 4 (2011) 2863–2869.
[19] Y. R. Lin, H. P. Wang, C. A. Lin and J. H. He, "Surface profile-controlled close-packed Si nanorod arrays for self-cleaning antireflection coatings," J.
Appl. Phys. 106 (2009) 114310.
[20] Y. A. Dai, H. J. Chang, K. Y. Lai, C. A. Lin, R. J. Chung, G. R. Lin and J. H. He,
"Subwavelength Si nanowire arrays for self-cleaning antireflection coatings," J.
Mater. Chem. 20 (2010) 10924–10930.
[21] E. D. Palik, Handbook of Optical Constants of Solids, Academic Press.
[22] D. G. Stavenga, S. Foletti, G. Palasantzas, K. Arikawa, Light on the moth-eye corneal nipple array of butterflies, Proc. R. Soc. B 273 (2006) 661–667.
[23] J. Q. Xi, M. F. Schubert, J. K. Kim, E. F. Schubert, M. Chen, S. Y. Lin, W. Liu, J. A. Smart, Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection, Nat. Photonics 1 (2007) 176–179.
[24] J. Q. Xi, J. K. Kim, E. F. Schubert, Silica nanorod-array films with very low refractive indices, Nano Lett. 5 (2005) 1385–1387.
[25] S. L. Diedenhofen, G. Vecchi, R. E. Algra, A. Hartsuiker, O. L. Muskens, G.
Immink, E. P. A. M. Bakkers, W. L. Vos, J. G. Rivas, Broad-band and omnidirectional antireflection coatings based on semiconductor nanorods, Adv.
Mater. 21 (2009) 973–978.
[26] S. Laux, N. Kaiser, A. Zoller, R. Gotzelmann, H. Lauth, H. Bernitzki, Room-temperature deposition of indium tin oxide thin films with plasma ion-assisted evaporation, Thin Solid Films 335 (1998) 1–5.
Chapter 4 Microdome InGaN-Based Multiple Quantum Well Solar Cells
§ 4-1 Introduction
To date, InGaN-based MQW SCs have drawn much research attention due to
their favorable photovoltaic (PV) characteristics, including direct and tunable
bandgaps covering nearly the entire solar spectrum, high absorption coefficient, high
mobility, superior radiation resistance, and additional control of the light absorption
through the quantized energy levels.1,2 Despite these promising characteristics, the
conversion efficiencies of InGaN-based MQW SCs are still unsatisfactory. To
improve the PV performances of InGaN SCs, much research has been reported.3-7 In
order to mitigate the abrupt change in refractive indices from GaN (or ITO) to air,
which blocks a great portion of photons propagating through the air-GaN (or air-ITO)
interface,5a variety of roughened structures have been employed on the top of InGaN
MQW SCs.3,6,7 Periodic subwavelength structures can be fabricated with various
techniques, such as the anodic aluminum oxide templates8 and the nanosphere
lithography.9,10 For the practical applications, the interests in the subwavelength
structures have been extended to disordered structures.3,11,12However, the processing
complexity and the mechanical robustness of the additional roughened structures on
the top of SCs might be a limit to PV applications.
Among various roughened structures, the microdomes (or lens-like
microstructures) have been used for increasing the light escape cone in InGaN
light-emitting diodes (LEDs),13-15resulting in improved light extraction efficiency and
engineered far-field.15 Recently, the use of colloidal microlens arrays had also been
implemented for increasing the light extraction in organic light-emitting diodes,16 as
well as improving the light collection in SCs.17 Additionally, it is found that
roughened p-GaN structures in InGaN LEDs can effectively reduce reflectance loss in
GaN,18 and provides an effective way to make p-metal contact deposition without
using a filling process with the insulating materials in the air gaps caused by
nanostructing/microstructing processes at the device surface, which is required for the
axial p-n nanorod devices to form electrical connection.19 Moreover, the roughened
p-GaN also leads to a reduction of piezoelectric field and improved crystal qualities
due to the relaxation of in-plane strain.20,21Roughening p-GaN is expected to benefit
the PV performances of InGaN MQW SCs since numerical studies have demonstrated
the detrimental effects of strain-induced piezoelectric polarization, forcing the
photocurrent to the opposite direction and thus resulting in low Jsc and open-circuit
voltage (Voc).22 Thus, the pursuit of microdome/lens-like structure via roughening
p-GaN is of great importance for increasing the critical angle and collection efficiency
in InGaN SCs.
In this study, we realize the p-GaN microdome surfaces with the attempt to boost
the conversion efficiencies (η) of InGaN MQW SCs. Compared with flat p-GaN, the
p-GaN microdomes not only generate additional photocurrents (from 0.43 to 0.54
mA/cm2) by suppressing surface reflections considerably but also exhibit an improved
fill factor (from 44 % to 72 %), indicating the strain relaxation and the piezoelectric
field reduction. Accordingly, the p-GaN microdome leads to a 102 % enhancement of
η. The optical enhancement is confirmed using the simulation based on
finite-difference time-domain (FDTD) analysis, reflection measurements and external
quantum efficiency (EQE) measurements. The internal quantum efficiency (IQE)
measurements indicate the possible improvement in photocarrier separation/collection
due to the strain relaxation. The concept of the microdome directly grown during SC
growth preserving mechanical robustness and wafer-scale uniformity without any
additional process represents a viable, promising path toward high-efficiency SCs.
§ 4-2 Experiment
The multiple quantum well (MQW) solar cells (SCs) were grown by
metal–organic chemical vapor deposition on c-plane sapphire substrates. The layer
structures consist of fifteen periods of intentionally undoped In Ga N (2.4
nm)/GaN (14 nm) MQWs, sandwiched by a 2.5-μm n-type (Si-doped) and a 0.2-μm
p-type (Mg-doped) GaN layer. The free carrier concentrations for n-type and p-type
GaN are around 2×1018 cm-3 and 5×1017 cm-3, respectively. Ammonia (NH3),
trimethylgallium (TMGa) for n-GaN and p-GaN, triethylgallium for MQWs, and
trimethylindium were used as the precursors. Surface morphologies of p-GaN were
controlled by TMG flows and substrate temperatures during the p-GaN growth. In
device fabrication, ITO was deposited by electron beam evaporation on p-GaN to
form transparent ohmic contacts. The 1×1 mm2 mesas were then defined by
chlorine-based plasma etching. The contacting scheme consists of fingered
Ti/Al/Ni/Au metal grids with the thicknesses of 20/400/20/2000 nm deposited on the
ITO and the n-GaN.
§ 4-3 Results and Discussion
Surface morphologies of p-GaN were controlled by TMGa flows and substrate
temperatures during the p-GaN growth. For flat p-GaN, TMGa flow rate was 40-50
μmol/min and substrate temperature was in the range of 950-1100 °C. To fabricate the
micro-roughened p-GaN, TMGa flow rate was increased to more than 55 μmol/min
and substrate temperature was decreased to lower than 920 °C. Fig. 4.1 shows
scanning electron microscopy (SEM) images of the MQW SCs with p-GaN
microdome surfaces. The p-GaN microdomes are 530 250 nm in height and the base
of microdomes are 600370 nm in diameter. Fig. 4.2 is the specular reflection
spectra obtained on flat and microdome surfaces at the wavelengths ranging from 340
to 600 nm. One can see that the MQW SC with p-GaN microdome surfaces exhibits a
low reflectance for all studied wavelengths, demonstrating that surface reflectance can
be effectively suppressed by the p-GaN microdomes.
Figure 4.1 45 degree-tilted SEM image of the MQW SCs with p-GaN microdomes.
The inset shows the cross-sectional SEM image.
Figure 4.2 Specular reflection measured on the MQW SCs with flat and microdome surfaces. The p-GaN microdomes are 530 250 nm in height and the base
of microdomes are 600 370 nm in diameter. Fig. 4.2 is the specular reflection
spectra obtained on flat and microdome surfaces at the wavelengths ranging from 340
to 600 nm. One can see that the MQW SC with p-GaN microdome surfaces exhibits a
low reflectance for all studied wavelengths, demonstrating that surface reflectance can
be effectively suppressed by the p-GaN microdomes.
Figure 4.1 45 degree-tilted SEM image of the MQW SCs with p-GaN microdomes.
The inset shows the cross-sectional SEM image.
Figure 4.2 Specular reflection measured on the MQW SCs with flat and microdome surfaces. The p-GaN microdomes are 530 250 nm in height and the base
of microdomes are 600 370 nm in diameter. Fig. 4.2 is the specular reflection
spectra obtained on flat and microdome surfaces at the wavelengths ranging from 340
to 600 nm. One can see that the MQW SC with p-GaN microdome surfaces exhibits a
low reflectance for all studied wavelengths, demonstrating that surface reflectance can
be effectively suppressed by the p-GaN microdomes.
Figure 4.1 45 degree-tilted SEM image of the MQW SCs with p-GaN microdomes.
The inset shows the cross-sectional SEM image.
Figure 4.2 Specular reflection measured on the MQW SCs with flat and
For the incident wavelengths comparable or shorter than the geometric sizes of the
microdomes, the low reflectance can be caused by the light trapping effect due to
severe light scattering. As light impinges on the structured surface, it is diffracted to
several beams with different diffraction angles. The diffracted beams re-bounces
between the p-GaN microdomes, which prevents the light from escaping back to air,
and thus increases the opportunity of optical absorption by the underneath material. It
should be mentioned that the light trapping effect results in the suppressed reflectance
over not only a wide range of wavelengths but also a wide range of incident angles.
23,24
In order to reveal the light propagation across the surface structures, the
distributions of electromagnetic fields within the device structures were simulated by
FDTD analysis. We modeled two kinds of device surfaces: flat p-GaN and p-GaN
microdomes. Fig. 4.3 visualizes the time-averaged TE-polarized electric field
intensity distributions for the MQW SCs with two surface conditions at the incident
wavelength of 400 nm. All of the calculated values in Fig. 4.3 are normalized to those
of the excitation source. It can be seen that the light propagating in the MQW region
for the SC with p-GaN microdomes is strongly and widely scattered, as compared
with the case of flat surface. One can also notice that strong fields are confined within
the p-GaN microdomes. The normalized optical power integrated over the MQW
region as a function of times for the SCs with p-GaN flat and microdome surfaces is
shown in Fig. 4.3(c). The steady-state power values for the two devices are 0.65 and
0.75, respectively. These results indicate that the roughened p-GaN surface not only
helps light propagating across the interfaces but also widens the field distribution
within the device by increasing the light scattering on the surface. Strong light
scattering by the microdome surface is desired for improving the efficiencies of SCs
due to the increase in optical paths, which benefits the light absorption in MQW
regions.
Figure 4.3 Time-averaged and normalized TE electric field distribution simulated by FDTD analysis with two surface structures: (a) flat and (b) p-GaN region as a function of times for the SCs with p-GaN flat and microdome surfaces is
shown in Fig. 4.3(c). The steady-state power values for the two devices are 0.65 and
0.75, respectively. These results indicate that the roughened p-GaN surface not only
helps light propagating across the interfaces but also widens the field distribution
within the device by increasing the light scattering on the surface. Strong light
scattering by the microdome surface is desired for improving the efficiencies of SCs
due to the increase in optical paths, which benefits the light absorption in MQW
regions.
Figure 4.3 Time-averaged and normalized TE electric field distribution simulated by FDTD analysis with two surface structures: (a) flat and (b) p-GaN region as a function of times for the SCs with p-GaN flat and microdome surfaces is
shown in Fig. 4.3(c). The steady-state power values for the two devices are 0.65 and
0.75, respectively. These results indicate that the roughened p-GaN surface not only
helps light propagating across the interfaces but also widens the field distribution
within the device by increasing the light scattering on the surface. Strong light
scattering by the microdome surface is desired for improving the efficiencies of SCs
due to the increase in optical paths, which benefits the light absorption in MQW
regions.
Figure 4.3 Time-averaged and normalized TE electric field distribution simulated by FDTD analysis with two surface structures: (a) flat and (b) p-GaN
microdomes. (c) Normalized optical power, integrated over the MQW region, as a function of times for the two kinds of SCs at 400 nm wavelength.
Fig. 4.4 shows the measured current density–voltage (J–V) curves of the SCs with
two kinds of surfaces. PV characteristics obtained by the J–V curves are listed in the
inset table of Fig. 4.4. One can clearly see that the microdome surfaces lead to
enhanced Jsc, which confirms that the microstructured surface enhances light
absorption. It is also found that the fill factors are enhanced for the SCs with
microdome surfaces suspectedly due to the strain relaxation and the piezoelectric field
reduction caused by the roughened structure.18,20,21 Accordingly, for the SCs with
p-GaN microdomes, η is increased from 0.43 % (with flat surface) to 0.87 %, which is
an improvement of 102 %. The results prove that the microdomes are effective in
boosting the PV performances of the MQW SCs. Note that previous simulation works
focusing on wire SCs reported that increasing the wire length could lead to a constant
decrease in Voc in spite of increases in η.25,26 Consequently, a slight decrease in Voc is
also observed in the MQW SCs with microdome surfaces. We note that the
optimization considerations must be made in future with respect to the geometric
parameters of microdome structures due to the inverse behavior of Jscand Voc.25,26
Figure 4.4 J–V characteristics measured on the MQW SCs with two kinds of surface structures. The inset table shows PV characteristics of InGaN MQW SCs with two kinds of surface structures. FF is the fill factor of SCs, which is defined as the ratio of the actual maximum obtainable power, to the product of Jscand Voc.
To gain insight into the correlation between Jsc enhancement, optical absorption,
and carrier separation/collection efficiency in the active layer, EQE and IQE spectra
were investigated. Fig. 4.5(a) presents the EQE spectra for the two kinds of SCs,
showing the influence of p-GaN microdomes on PV performances. EQEs of the SCs
with microdomes are mostly improved in the region of 360–450 nm, which reveals
the enhancement in light collection efficiency and agrees with the suppressed
reflection on the microdome surface shown in Fig. 4.2. The results also echo with
those revealed by FDTD analysis in Fig. 4.3. Since E. Matioli et al. had found the Figure 4.4 J–V characteristics measured on the MQW SCs with two kinds of surface structures. The inset table shows PV characteristics of InGaN MQW SCs with two kinds of surface structures. FF is the fill factor of SCs, which is defined as the ratio of the actual maximum obtainable power, to the product of Jscand Voc.
To gain insight into the correlation between Jsc enhancement, optical absorption,
and carrier separation/collection efficiency in the active layer, EQE and IQE spectra
were investigated. Fig. 4.5(a) presents the EQE spectra for the two kinds of SCs,
showing the influence of p-GaN microdomes on PV performances. EQEs of the SCs
with microdomes are mostly improved in the region of 360–450 nm, which reveals
the enhancement in light collection efficiency and agrees with the suppressed
reflection on the microdome surface shown in Fig. 4.2. The results also echo with
those revealed by FDTD analysis in Fig. 4.3. Since E. Matioli et al. had found the Figure 4.4 J–V characteristics measured on the MQW SCs with two kinds of surface structures. The inset table shows PV characteristics of InGaN MQW SCs with two kinds of surface structures. FF is the fill factor of SCs, which is defined as the ratio of the actual maximum obtainable power, to the product of Jscand Voc.
To gain insight into the correlation between Jsc enhancement, optical absorption,
and carrier separation/collection efficiency in the active layer, EQE and IQE spectra
were investigated. Fig. 4.5(a) presents the EQE spectra for the two kinds of SCs,
showing the influence of p-GaN microdomes on PV performances. EQEs of the SCs
with microdomes are mostly improved in the region of 360–450 nm, which reveals
the enhancement in light collection efficiency and agrees with the suppressed
reflection on the microdome surface shown in Fig. 4.2. The results also echo with
those revealed by FDTD analysis in Fig. 4.3. Since E. Matioli et al. had found the
possible IQE change in roughened SCs and Wierer et al. had demonstrated that SC
performances including IQE can be further improved by optimizing the barrier
thickness of QWs,4,27 IQE measurements are then taken to evaluate the carrier
separation/collection occurring in the active region. EQE is converted into IQE
through
IQE = EQE/abs(λ) (1)
where abs(λ) the absorption spectra of the SCs, which is shown in Fig. 4.6. For
absorption spectrum measurements, by measuring reflection and transmission in the
spectral range from 360 to 540 nm, the absorption spectra can be obtained by
subtracting reflection and transmission from unity at every wavelength. Accordingly,
the obtained IQE in Fig. 4.5(b) may point out the possibility of IQE changes due to
p-GaN roughening. The variation in IQE after introducing p-GaN microdomes
indicates the possible change in carrier separation/collection efficiency resulted from
relaxation of in-plane strain and consequent reduction of piezoelectric fields during
p-GaN microdome growth.22 One should note that the possible inaccuracy in
determining the absorption spectra due to the difference in the surfaces for both SCs
might not enable one to provide accurate IQE comparison data for both devices. For
correctly determining the IQE for both devices, more detailed experiments in
providing conclusive comparison are required in future. In short, the p-GaN
microdome results in the increases in EQE, which are attributed to the suppressed
interface reflection and possibly efficient separation/collection of photocarriers.
Figure 4.5 (a) EQE curves and (b) IQE curves for the SCs with two kinds of surface structures.
Figure 4.6 The absorption spectra of InGaN MQW SCs with and without microdome structures.
microdome results in the increases in EQE, which are attributed to the suppressed
interface reflection and possibly efficient separation/collection of photocarriers.
Figure 4.5 (a) EQE curves and (b) IQE curves for the SCs with two kinds of surface structures.
Figure 4.6 The absorption spectra of InGaN MQW SCs with and without microdome structures.
microdome results in the increases in EQE, which are attributed to the suppressed
interface reflection and possibly efficient separation/collection of photocarriers.
Figure 4.5 (a) EQE curves and (b) IQE curves for the SCs with two kinds of surface structures.
Figure 4.6 The absorption spectra of InGaN MQW SCs with and without microdome structures.
§ 4-4 Summary
In conclusion, InGaN MQW SCs with microdome surfaces were fabricated. In
comparison with the flat surface, the microdome structures show improved fill factor
and Jsc, leading to the η enhancement by up to 102 %. The p-GaN microdomes exhibit
the enhanced optical absorption due to light trapping effects and possible
improvement of photocarrier separation/collection for the MQW SCs due to the strain
relaxation, resulting in enhanced EQE and IQE. With the advantages of the simple
process and the mechanical robustness, the microdomes grown during SC epitaxial
growth offer a viable way to boost solar efficiency of a variety of SCs.
§ 4-5 References
[1] K. Y. Lai, G. J. Lin, Y. L. Lai, Y. F. Chen, and J. H. He, Appl. Phys. Lett. 96, 81 (2010).
[2] K. Y. Lai, G. J. Lin, C.-Y. Chen, Y.-L. Lai, and J. H. He, IEEE Electron Dev. Lett.
32, 179 (2011).
[3] G. J. Lin, K. Y. Lai, C. A. Lin, Y.-L. Lai, and J. H. He, IEEE Electron Dev. Lett.
32, 1104 (2011).
[4] E. Matioli, C. Neufeld, M. Iza, S. C. Cruz, A. A. A. Heji, X. Chen, R. M. Farrell, S. Keller, S. DenBaars, U. Mishra, S. Nakamura, J. Speck, and C. Weisbuch, Appl. Phys. Lett. 98, 021102 (2011).
[5] T. Fujii, Y. Gao, R. Sharma, E. L. Hu, S. P. DenBaars, and S. Nakamura, Appl.
Phys. Lett. 84, 855 (2004).
[6] P. H. Fu, G. J. Lin, C. H. Ho, C. A. Lin, C. F. Kang, Y. L. Lai, K. Y. Lai, and J. H.
He, Appl. Phys. Lett. 100, 013105 (2012).
[7] G. J. Lin, K. Y. Lai, C. A. Lin, and J. H. He, Opt. Lett. 37, 61 (2012).
[8] Z. Fan, and J. C. Ho, Int. J. Nanoparticles 4, 164 (2011).
[9] Y. R. Lin, K. Y. Lai, H. P. Wang, and J. H. He, Nanoscale 2, 2765 (2010).
[10] Y. R. Lin, H. P. Wang, C. A. Lin, and J. H. He, J. Appl. Phys. 106, 114310 (2009).
[11] D. S. Tsai, C. A. Lin, W. C. Lien, H. C. Chang, Y. L. Wang, and J. H. He, ACS Nano 5, 7748 (2011).
[12] J. Q. Xi, M. F. Schubert, J. K. Kim, E. F. Schubert, M. F. Chen, S. Y. Lin, W. Liu, and J. A. Smart, Nature Photonic 1, 176 (2007).
[13] Y. K. Ee, P. Kumnorkaew, R. A. Arif, H. Tong, H. Zhao, J. F. Gilchrist, and N.
[14] P. Kumnorkaew, Y. K. Ee, N. Tansu, and J. F. Gilchrist, Langmuir 24, 12150 (2008).
[15] X. H. Li, R. Song, Y. K. Ee, P. Kumnorkaew, J. F. Gilchrist, and N. Tansu, IEEE Photonics Journal 3, 489 (2011).
[16] W. H. Koo, W. Youn, P. Zhu, X. H. Li, N. Tansu, and F. So, Adv. Funct. Mater.
DOI: 10.1002/adfm.201200876, (2012).
[17] M. A. Tsai, P. C. Tseng, H. C. Chen, H. C. Kuo, and P. Yu, Opt. Express 19, A28 (2011).
[18] C. Huh, K. S. Lee, E. J. Kang, and S. J. Park, J. Appl. Phys. 93, 9383 (2003).
[19] H. M. Kim, Y. H. Cho, H. Lee, S. I. Kim, S. R. Ryu, D. Y. Kim, T. W. Kang, and K. S. Chung, Nano Lett. 4, 1059 (2004).
[20] Y. H. Sun, Y. W. Cheng, S. C. Wang, Y. Y. Huang, C. H. Chang, S. C. Yang, L. Y.
Chen, M. Y. Ke, C. K. Li, Y. R. Wu, and J. J. Huang, IEEE Electron Dev. Lett. 32, 182 (2011).
[21] M. Y. Ke, C. Y. Wang, L. Y. Chen, H. H. Chen, H. L. Chiang, Y. W. Cheng, M. Y.
Hsieh, C. P. Chen, and J. J. Huang, IEEE J. Sel. Top. Quant. 15, 1242 (2009).
[22] Z. Q. Li, M. Lestradet, Y. G. Xiao, and S. Li, Phys. Status Solidi A 208, 928 (2011).
[23] H. P. Wang, K. T. Tsai, K. Y. Lai, T. C. Wei, Y. L. Wang, and J. H. He, Opt.
Express 20, A94 (2012).
[24] Y. C. Chao, C. Y. Chen, C. A. Lin, and J. H. He, Energy Environ. Sci. 4, 3436 (2011).
[25] B. M. Kayes, H. A. Atwater, and N. S. Lewis, J. Appl. Phys. 97, 114302 (2005).
[26] K. Sun, A. Kargar, N. Park, K. N. Madsen, P. W. Naughton, T. Bright, Y. Jing, and D. Wang, IEEE J. Sel. Top. Quant. 17, 1033 (2011).
[27] J. J. Wierer, Jr., D. D. Koleske, and S. R. Lee, Appl. Phys. Lett. 100, 111119 (2012).
Chapter 5 Efficient light harvesting scheme for InGaN-based quantum well solar cells employing the
hierarchical structure: SiO
2nanorods/p-GaN microdomes
§ 5-1 Introduction
InGaN-based multiple quantum well (MQW) solar cells (SCs) have a direct and
tunable bandgap, which covers nearly the entire solar spectrum. In addition, they also
possess advantages as high absorption coefficients, high mobilities, and superior
radiation resistance, which allow the operation under harsh environments.[1-3]
Employing MQW structures can provide the independent design between the
short-circuit current (Jsc) and open-circuit voltage (Voc) [4], and also avoid the
undesired trade-off between solar response and crystalline quality [4-6]. However, the
conversion efficiencies (η) of InGaN-based SCs are still limited. Methods for either
internal quantum efficiency (IQE) or external quantum efficiency (EQE)
improvements of SCs have been devoted to boost their photovoltaic (PV)
performances.[7-9]
Recently, a variety of subwavelength structures (SWSs) have been demonstrated
to effectively suppress the undesired Fresnel reflections. These roughened structures