Optical and electrical properties of transparent conducting Zinc Oxide.
高睿言、陳昭翰
E-mail: [email protected]
ABSTRACT
This experiment is based on electroless plating method, the glass substrates must be sensitized and activated by using stannous chloride and palladium chloride in aqueous solution, respectively. Therefore, the smooth glass surface covered with palladium atoms, then the zinc oxide thin film will grow on the glass substrates in zinc nitrate and dimethylamine borane mixed aqueous solution.
Changes in zinc nitrate aqueous solution and dimethylamine borane concentration, as well as the solution of the reaction
temperature and changing the annealing temperature and activation and sensitization times, etc., to explore the properties of zinc oxide thin films. Identify the films by using optical microscopy, X-ray diffraction, optical spectroscopy, and semiconductor parameter analyzer with four-point probe, then the structure, transmittance, and resistivity of zinc oxide thin films are obtained. The
experimental results showed that the lowest dissolved oxygen in deionized water is about 1.1 mg/L. The lowest resistivity of zinc oxide thin film was obtained the following experimental conditions: the process time of activation and sensitization are all 2 minutes and the process was repeated 3 times, the zinc oxide was growth in the mixed dimethylamine borane and zinc nitrate aqueous solution at 35?aC, annealing at 550?aC under 3% hydrogen and argon mixture gas. The zinc oxide thin films annealed at 500?aC and 600?aC, the resisivity is higher. Especially, the zinc oxide thin film was growth in 0.075 M zinc nitrate mixed with 0.01 M dimethylamine borane aqueous solution, the resistance value can be about 75 kΩ by using the four-point probe measurement, and through the formula R = ρL/A, the measured resistivity of films is about 7.5 ? Pcm
Keywords : electroless plating, zinc oxide
Table of Contents
授權書...iii 中文摘要 ... iv 英文摘要
... v 誌謝 ... vi 目錄 ...
vii 圖目錄 ...ix 表目錄 ...xii 第一章 緒論 ... 1 1.1 前言 ... 1 1.2 氧化鋅的晶體結構
... 2 1.3 製備氧化鋅的方法 ... 4 1.4 研究II-VI 族氧化鋅之動機與論文大綱 ... 5 第二章 無電電鍍原理 ...7 2.1 電鍍 ...7 2.2 無 電電鍍 ...8 2.3 無電電鍍氧化鋅 ...10 第三章 實驗步驟與方法 ...11 3.1 化學藥品與耗材 ...11 3.2 製備氧化鋅薄膜流程
...12 -v i ii- 3.3 氧化鋅薄膜的特性量測 ...17 3.3.1 穿透率的量測方法 ...18 3.3.2 電阻率的量測方法 ...18 3.3.3 X 射線繞射的測量 ...20 第四章 結果與討論 ...21 4.1 玻璃的切法
...21 4.2 溶液的配製 ...21 4.3 降低溶氧度的結果
...22 4.4 溶液的反應溫度 ...24 4.5 敏化與活化的次數對膜厚與電阻值的 影響 ... 24 4.6 退火溫度對電阻值的影響 ... 25 4.7 退火處理時通入的氣體影響
... 30 4.8 成長氧化鋅使用的溶液濃度對氧化鋅穿透率之影響 ... 30 4.9 X 射線繞射圖 ...44 第五章 結論 ...45 參考文獻
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