Physical
properties
of
amorphous
Mo-doped
In–Ga–Zn–O
films
grown
by
magnetron
co-sputtering
technique
Shiu-Jen
Liu
a,*
,
Hau-Wei
Fang
b,
Jang-Hsing
Hsieh
c,
Jenh-Yih
Juang
daDepartmentofMathematicsandScience(Precollege),NationalTaiwanNormalUniversity,LinkouDist.,NewTaipeiCity24449,Taiwan b
DepartmentofMaterialsScienceandEngineering,NationalChiaoTungUniversity,Hsinchu30010,Taiwan
c
DepartmentofMaterialsEngineering,MingchiUniversityofTechnology,TaishanDist.,NewTaipeiCity24301,Taiwan
d
DepartmentofElectrophysics,NationalChiaoTungUniversity,Hsinchu30010,Taiwan
1. Introduction
Amorphoustransparentconductingoxides(a-TCOs)are prom-ising materials owing to their applications on optoelectronic devices such as thin film transistors (TFTs) used in flat panel displays[1,2]. One of the most attractive a-TCO is amorphous InGaZnO4(a-IGZO) which hasbeendemonstratedtobeable to workastheactivelayersinthehigh-performanceTFTsfabricated onflexiblesubstratesatroomtemperature[1]andusedin large-sizepanels[3].IGZOhasacomplexstructurewithalternatingInO2 andGaZnO2layers[4].Duetotheuniqueelectronicstructurein whichtheconductionpathsofcarriersinIGZOarecomposedof extendedsphericalsorbitalsofheavymetalcations,thecarrier transportisnotaffectedbythechemicalbonddistortionandIGZO exhibitslargeelectronmobilityeveninamorphousstructure.
Manygroupsaredevotedtotheresearchanddevelopmentof a-IGZO based TFTs in recent years. Theoretical calculation of electronicstructure [4]and fundamentalstudieson opticaland electricalpropertiesofcrystallineandamorphousIGZOfilmshave also attracted much attention [5,6]. However, the physical propertiesofa-IGZOfilmsdopedwithtransition-metalimpurities
have rarely investigated [7,8]. In the meanwhile, the carrier mobility of In2O3 films has been reported to be drastically enhanced by Mo doping [9,10]. A theoretical model based on magneticinteractionswasproposedtoexplaintheenhancement ofcarriermobilityinMo-dopedIn2O3films[11].Theexperimental andtheoreticalresultsofMo-dopedIn2O3urgeustoexplorethe effectsofModopingonphysicalpropertiesofa-IGZOfilms.The enhancement of carrier mobility and room-temperature ferro-magnetisminducedbyModopingwereobserved.
2. Experimental
The Mo-doped In–Ga–Zn–O films used in this study were prepared by using magnetron co-sputtering technique. The sputtering wasconducted with a 75W rf power appliedon a InGaZnO4targetandavariousdcpowerrangingbetween2and 5Wappliedon a metallicMotarget.Bothtargetswere2in.in diameterand99.99%inpurity.Corning1737glasseswereusedas substratesandplaced458tothetargetssurfacewitha substrate-to-target distance of 10cm. During sputtering, the substrate temperaturewaskeptat1508Candtheflowratesofargonand oxygenwere17.5and10.5sccm,respectively.Thepressureofthe chamber duringsputtering was 1.2102Torr.After a 40-min sputtering,thefilmswerecooleddowntoroomtemperature.The thickness of the sputtered films was determined to be about
MaterialsResearchBulletin47(2012)1568–1571
ARTICLE INFO
Articlehistory:
Received12October2011
Receivedinrevisedform10February2012 Accepted15February2012
Availableonline24February2012
Keywords: A.Amorphousmaterials A.Semiconductors B.Sputtering D.Electricalproperties D.Magneticproperties D.Opticalproperties ABSTRACT
AmorphousthinfilmsofIn–Ga–Zn–O(a-IGZO)dopedwithMohavebeenfabricatedbyusingmagnetron co-sputteringtechnique.TheMoconcentrationina-IGZOfilmswasmodulatedbyvaryingthesputtering powerappliedontheMotarget.Theelectrical,opticalandmagneticpropertiesofMo-dopeda-IGZOfilms grownonglasseswereinvestigated.Thecarrierdensityandmobilityofa-IGZOfilmscanberemarkably enhancedbylowconcentrationModoping.Ontheotherhand,theopticalbandgapofa-IGZOfilmsisnot significantlyaffectedbyModoping.However,thetransmissionisdecreasedwithincreasingtheMo doping.Moreover,allMo-dopedfilmsexhibitroom-temperatureferromagnetism.
ß2012ElsevierLtd.Allrightsreserved.
*Correspondingauthor.Tel.:þ886277148405;fax:þ886226022617. E-mailaddress:[email protected](S.-J.Liu).
ContentslistsavailableatSciVerseScienceDirect
Materials
Research
Bulletin
j our na l ho me pa g e : w ww . e l se v i e r . com / l oca t e / m a tr e sbu
0025-5408/$–seefrontmatterß2012ElsevierLtd.Allrightsreserved.
100nmbyusingasurfaceprofilometer(AlphaStep500,Tencor Instruments).TheMocontentratio[Mo]/[In]ofthedopedIn–Ga– Zn–O films was measured by using energy dispersive X-ray spectroscopyandisdenotedasxat.%(aslistedin Table1).The crystal structure of the films was examined by using X-ray diffraction(XRD)scanswithCuK
a
radiation(PANalyticalX’Pert PROMPD).Theelectricalpropertiesincludingresistivity,carrier concentrationandcarriermobilitywerecarriedoutusingthe four-probevanderPauwmethod.Thevalence stateofMoionswas investigatedbyX-rayphotoelectronspectroscopy(XPS)analysis usingtheThermoVGScientificESCALAB250systemwithaAlKa
X-raysource(1486.6eV).Theanalysischamberisequippedwitha floodgunusedforchargecompensationwhennecessary.TheXPS spectraarereferencedtotheC1sphotoemissionlineof284.8eV. TheopticalmeasurementsofthefilmswererecordedusingaUV– Visdoublebeamspectrometer(JASCOV570)inthewavelengthof 200–900nm.Theroom-temperaturemagnetizationversus mag-netic field M(H) curves wereperformed on a Quantum Design superconductingquantuminterferencedevicemagnetometer. 3. Resultsanddiscussion
TheamorphousstructureofallfilmswasconfirmedbytheXRD scansshowninFig.1.ThereisnosharppeakobservedinallXRD curves.Thebroadpeakslocatedataround2
u
=228arecontributed bytheglasssubstrates.XPSmeasurementswereconducted onall samplesto deter-minethevalencestateofMoionsinthefilms.ThemeasuredMo3d spectraareshowninFig.2.Atthefirstglance,thereisnopeak observedintheMo3dregionforsample#1,theundopeda-IGZO film.Twopeaksareobservedforsample#2andthreepeaksare observedforsamples#3,#4and#5.ThesepeaksarelabeledasG1, G2andG3accordingtotheirlocations,i.e.,bindingenergy.The exactvaluesofbindingenergyoftheseMo3dpeaksandpossible contributionstothesepeaksarelistedinTable2.TheG1peaksare contributedbytheMo6+3d3/2level[12].TheG2peakscouldbea combinationofMo6+3d
5/2andMo4+3d3/2peaks[13].TheG3peaks
areassignedtotheMo4+3d
5/2level.Itcanbededucedfromthe datalistedinTable2,thevalenceofMoionsdopedinsample#2is 6þ,andthevalencesofMoionsdopedinsamples#3,#4and#5 are6þand4þ.Moreover,sincethebindingenergyofMo4+3d3/2is higherthanthatofMo6+3d
5/2,asshowninTable2,theshiftofthe G2peaksofsamples#3,#4and#5towardhigherenergyindicates theincreaseofthe[Mo4+]/[Mo6+]contentratiowithincreasingthe Modopingconcentration.Theincreaseof[Mo4+]/[Mo6+]content ratiocanalsobeconfirmedbytheincreaseoftheintensityofthe G3peakswithincreasingtheMoconcentration.
Fig.3displaysthedependenceofelectricalpropertiesincluding resistivity,carrierconcentration,andmobilityontheMocontent
10 20 30 40 50 60 70 80 90
#5
#4
#3
#2
Intensity (a.u.) 2θ (degrees)#1
Fig.1.XRDpatternsofallfilms.Thebroadpeakslocatedatabout2u=228come fromtheglasssubstrates.Thefiguresdenotethesamplenumber(listedinTable1). Table1
Thedcpower(P)appliedontheMotargetandMocontentratios(x=[Mo]/[In]at.%) ofthin-filmsamplesusedinthisstudy.Thesample#1istheundopedIn–Ga–Zn–O film. Sampleno. #1 #2 #3 #4 #5 P(W) 0 2 3 4 5 x(at.%) 0 3.8 7.6 9.9 18.1 Table2
ThebindingenergyofG1,G2andG3peaksobservedinXPScurvesaswellasthose ofMo4+
3dandMo6+
3dlevelsadoptedfromRefs.[12,13].
Sampleno. G1(eV) G2(eV) G3(eV)
#1 – – – #2 235.6 232.2 – #3 235.9 232.5 230.0 #4 235.5 232.7 230.4 #5 235.3 232.9 230.4 a Mo6+ 3d3/2 235.8 aMo6+3d 5/2 232.6 b Mo4+ 3d3/2 233.2 b Mo4+ 3d5/2 230.1 a Ref.[12]. b Ref.[13]. 224 226 228 230 232 234 236 238
#1
#2
#3
#4
Intensity (a.u.)
Binding Energy (eV)
G3 G2 G1
#5
Mo 3d
Fig. 2.XPS spectra intheMo 3dregionof theMo-doped a-IGZOfilms. The smoothinglines(dashlines)areobtainedbymeansofcurvefittingusingGaussian functionsandthebackgroundsarenotsubtracted.G1,G2andG3denotedasthe locationsofGaussianpeakswhichcomprisethesmoothingcurvesintheMo3d region.
ratio[Mo]/[In]ofMo-dopeda-IGZOfilm.AsshowninFig.3(a),the carrierdensity(n)ofsample#2isabout13.61019cm3,whichis muchhigherthanthatoftheundopedfilmwhosevalueofnis 2.71019cm3.Theincreaseofcarrierdensitycanbeattributed totheextraelectronsprovidedbyMo6+dopedina-IGZOfilms.On theotherhand,carrierdensitiesof samples#3,#4and #5are 3.71019, 3.41019 and 1.71019cm3, respectively, which decreasewithincreasingtheModoping.Thecarriermobilitiesof filmsareshowninFig.4(b).Itisnoteworthythat,incomparison withtheundopedfilm(sample#1),thecarriermobilityofsample #3isdistinctlyenhanced.Theenhancementofthecarriermobility similartothatobservedin Mo-dopedIn2O3 films[9,10]canbe explained by the magnetic interactions resulting in smaller effectivemass ofcarriersand largerfundamentalbandgap [11]. Exceptforthesample#3,thecarriermobilitydecreaseswiththe Modoping.ItcanbeattributedtotheincreaseofthedensityofMo ionswhichserveasstrongscatteringcentersandthussuppressthe transportofchargecarriers.Thelowcarriermobilityofsample#2, comparedtothatofsample #3,is attributedtothefree-carrier scattering,sincethecarrierdensityofsample#2ismuchhigher thanthatofothersamples.Theelectricalexperimentsrevealthat thecarrierdensityandmobilityofa-IGZOfilmscanbeenhancedby Modopingwithaproperconcentration. Ontheotherhand,the resistivitiesoflowconcentrationMo-dopedfilms(samples#2and #3) are lower than that of the undopedfilm (sample #1) but increasewithincreasingMoconcentration,asshowninFig.3(c), which is resulted from the decrease of carrier mobility with increasingtheMoconcentration(exceptforthesample#3).
ThetransmissionspectraofallfilmsareillustratedinFig.4(a). Thetransmissionoftheundopedfilm(sample#1)exceed80%in
the visible range (400–700nm); however, the transmission decreaseswithincreasingtheModoping.Moreover,the absorp-tionedgeofsample#2,thea-IGZOfilmdopedwith3.8at.%Mo, shiftstowardshorterwavelengthregion.Theopticalbandgaps(Eg) of these films can be estimated by the relationship between absorption coefficient (
a
) and photon energy (hn
) of the form (a
hn
)(hn
Eg)r with r=2 suggested by Tauc for amorphous semiconductors[14,15].TheEgofsamples#1,#3and#4isabout 2.95eVobtainedbylinearextrapolationof(a
hn
)0.5tothehn
-axis, asdepictedinFig.4(b).TheEgofsample#2isabout3.05eVwhich isslightlyhigherthanthatoftheundopedsample#1andcanbe attributed to the Burstein–Moss (BM) effect, since the carrier densityofsample#2ismuchhigherthanthatofthesample#1. ThesameEgofsamples#1,#3and#4andBMeffectobservedfor sample #2 imply the incorporation of Mo atoms in the IGZO lattices.Ontheotherhand,theEgofsample#5is2.7eVwhichis believedtoberesultedfromthehighconcentrationofModoping whichmayresultinthepossibleexistenceofMooxideimpurities. Fig.5showsthefielddependenceofmagnetizationM(H)curves measuredat300KfortheundopedandMo-dopeda-IGZOfilms. Theundopedfilm(sample#1)showsalinearM(H)curvewhich indicates paramagnetic behavior. All Mo-doped filmsobviously exhibitroom-temperatureferromagnetism.Moreover,exceptthe sample#3,themagnetizationincreaseswithincreasingtheMo doping.AccordingtoMedvedeva’sstudy,theexchangesplittingof d states results in the magnetic moments of Mo atoms [11]. However,Medvedeva’scalculationssuggestaveryweakmagnetic couplingbetweenModopantsandferromagnetismwhichwould notbeobservedinMo-dopedIn2O3.Itisnotconsistentwithour experimental results and similar ferromagnetism in Mo-doped In2O3filmswasalsoobserved[16].Theferromagnetismobserved in this workcouldbe attributed tothe free-electron mediated ferromagneticinteraction[17,18]betweenthemagneticMoions.0 2 4 6 8 10 12 14 16 18 1E-3 0.01 0.1 1
(c)
ρ
(
Ω-cm)
x
(at. %)
0 2 4 6 8 10 12 14 16 18 0 5 10 15 20 25(b)
μ
(cm
2/ Vs)
0 2 4 6 8 10 12 14 16 18 0 5 10 15#4
#5
#3
#2
#1
n
(10
19cm
-3)
(a)
Fig.3.Electricalpropertiesincluding(a)carrierdensityn,(b)carriermobilitymand (c)resistivityrofxat.%Mo-dopeda-IGZOfilms.xat.%=[Mn]/[In].
1.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0 0 500 1000 1500 #5 (x=18.1) #4 (x=9.9) #3 (x=7.6) #2 (x=3.8) #1 (x=0)
(
αh
ν)
0.5(cm
-1eV)
0.5Pho
ton
Ene
rgy
(eV)
300 400 500 600 700 800 900 0.0 0.2 0.4 0.6 0.8 1.0 #4 #3 #1 #5 #2
Transmission
Waveleng
th (nm
)
Fig.4.(a)Transmissionspectraand(b)(ahn)0.5vshnplotsforxat.%Mo-doped
a-IGZOfilms.
S.-J.Liuetal./MaterialsResearchBulletin47(2012)1568–1571 1570
Thecorrelationbetweenthehighmagnetizationandhighmobility observed for sample #3 supports the free-electron mediated model.
4. Conclusions
Inconclusion,thevalenceofMoionsis6þinlowconcentration Modopeda-IGZOfilmsandbecomesamixtureof6þand4þwith increasingtheModopinglevel.Thecarriermobilityand carrier densityof a-IGZO filmscanbeenhanced by Modopingwitha
properconcentration.Theopticaltransmissionofa-IGZOfilmsis decreasedbytheModoping.Nevertheless,theopticalbandgapis notsignificantlyaffectedbytheModoping.However,ablueshift in transmissionspectraresultedfromBurstein–Mosseffectwas observedinlow-concentrationModoping.Furthermore,all Mo-doped films exhibit room-temperature ferromagnetism. The carrier mobilityofthe Mo-dopedsample exhibiting thelargest magnetizationisremarkablyenhancedbyModoping.Theresult reveals thecorrelationbetween theenhancementofthecarrier mobilityandferromagneticcharacteristics.
Acknowledgment
ThisworkwassupportedbytheNationalScienceCouncilof Taiwan,underGrantNo.NSC98-2112-M-003-005-MY3. References
[1]Nomura,K.Ohta,H.Takagi,A.Hirano,M.Hosono,H. Nature432(2004)488. [2]Chiang,H.Q.Wager,J.F.Hoffman,R.L.Jeong,J.Keszler,D.A. Appl.Phys.Lett.86
(2005)013503.
[3]Lee,J.H.Kim,D.H.Yang,D.J.Hong,S.Y.Yoon,K.S.Hong,P.S.Jeong,C.O.Park,H.S. Kim,S.Y.Lim,S.K.Kim,S.S.Son,K.S.Kim,T.S.Kwon,J.Y.Lee,S.Y. SIDInt.Symp. DigestTech.Pap.39(2008)625.
[4]Orita,M.Tanji,H.Mizuno,M.Adachi,H.Tanaka,I. Phys.Rev.B61(2000)1811. [5]Takagi,A.Nomura,K.Ohta,H.Yanagi,H.Kamiya,T.Hirano,M.Hosono,H. Thin
SolidFilms486(2005)38.
[6]Nomura,K.Kamiya,T.Ohta,H.Shimizu,K.Hirano,M.Hosono,H. Phys.Status SolidiA205(2008)1910.
[7]Liu,S.J.Fang,H.W.Su,S.H.Li,C.H.Cherng,J.S.Hsieh,J.H.Juang,J.Y.Appl.Phys.Lett. 94(2009)092504.
[8]Liu,S.J.Su,S.H.Fang,H.W.Hsieh,J.H.Juang,J.Y.Appl.Surf.Sci.157(2011)10018. [9]Sun,S.Y.Huang,J.L.Lii,D.F. J.Mater.Res.20(2005)247.
[10]Gupta,R.K.Ghosha,K.Mishrab,S.R.Kahol,P.K. Appl.Surf.Sci.254(2008)4018. [11]Medvedeva,J.E. Phys.Rev.Lett.97(2006)086401.
[12]Wagner,C.D.Riggs,W.M.Davis,L.E.Moulder,J.F.Muilenberg,G.E.Handbookof X-rayPhotoelectronSpectroscopy, Perkin-Elmer,EdenPrairie,MN,1979. [13]Choi,J.G.Thompson,L.T. Appl.Surf.Sci.93(1996)143.
[14]Tauc,J. AmorphousandLiquidSemiconductors, Plenum,NewYork,1979. [15]Jayaraj,M.K.Saji,K.J.Normura,K.Kamiya,T.Hosono,H. J.Vac.Sci.Technol.B26
(2008)495.
[16]Park,C.Y.Yoon,S.G.Jo,Y.H.Shin,S.C. Appl.Phys.Lett.95(2009)122502. [17]Dietl,T.Ohno,H.Matsukura,F.Cibert,J.Ferrand,D. Science287(2000)1019. [18]Sato,K.Yoshida,H.K. Jpn.J.Appl.Phys.,Part239(2000)L555.
-5 -4 -3 -2 -1 0 1 2 3 4 5 -4 -3 -2 -1 0 1 2 3 4
#1
(x = 0)
#2
(x = 3.8)
#3
(x = 7.6)
#4
(x = 9.9)
#5
(x =18
.1)
Magnetization (emu/cm
3)
Magneitc Field (kOe
)
Fig.5.Field(H)dependentmagnetization(M)ofxat.%Mo-dopeda-IGZOfilms measuredatroomtemperature.