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DPD series

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DPD series

Organic Alkaline Developer

1. Outline

DPD series is designed for high resolution semiconductor device fabrication.

DPD series is TMAH(tetramethylammonium hydroxide) aqueous solution. So it is metal ion free.

It can be used in the immersion and batch spray module, ideal use is in spray and puddle process on automatic development units in Track system.

DPD series can be supplied as a concentrate. Custom dilutions are also available.

2. Characteristics

1. Scum free after development 2. Metal ion free type

3. Colorless, odorless, inorganic alkaline aqueous solution.

4. Little dependence on exposure energy and temperature of developer.

5. Very low contamination level. (Metal-ion & particles)

3. Properties

4. Specifications

ITEM UNIT SPEC.

APPERANCE - COLORLESS

YELLOWLESS SPECIFIC GRAVITY d25 1.000 ± 0.005

NORMALITY N *.** ± 0.01

Na ppb < 500

Fe ppb < 500

PARTICLE ( > 0.5 ㎛) EA/ml < 10

Developer DPD-100 DPD-200 TMAH(%) 2.15±0.1 2.38 ±0.1 Normality(N) 0.237±0.01 0.26 ±0.01 Surfactant with without

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5. Usage

• Immersion

Use DPD series developer.

Recommended development process is following.

Dipping · · · 21~23℃, 50~70 seconds.

(Controlled to within ±1℃) Rinse · · · Deionized water 20~25℃

• In-Line Spray/Puddle

Control developer temperature at the dispensing head at a constant temperature(±1℃) within the range of 21~23℃.

Spray developer at a low presure(0.2~0.4bar) on a slowly spinning wafer for 5seconds maximum to establish a puddle.

Maintain the puddle for approximately 15seconds on a stationary wafer, and overlap a deionized water rinse with the developing cycle. After a 10~15 second deionized water rinse, spin the wafer dry.

DPD-200 is packaged in 1- gallon PE bottles and 20-liter PE bottles.

6. Packaging

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How to Use the materials in Photolithography Process

Substrate Preparation ( Wafer Cleaning )

HMDS Priming

Photoresist Coating

Prebake 100~110℃

Exposure

Develop ( DPD-200) Post Exposure Bake

105~115℃

Post Bake 120~140℃

Etch/Ion Implant

Strip

( DPS-1000N & DPSS-1000)

Coating, Oven, Vaccum Chamber Wet, Dry

Spin, Roll, Spray

Hot plate, Oven

Stepper, Scanner, Aligner

Puddle, Spray, Dipping

Wet & Dry etching Metal & Ion Implantation

Spray, Dipping

參考文獻

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