膜的BOE 濕蝕刻速率很低(~4.9Å/min)，只有一般傳統 PECVD Si-rich 氮化
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自傳
科學、光學、物理、化學、統計學以及實驗設計等等的學科。而透過長時 間的整理歸納與消化，真的成長不少，也越來對這個領域感到喜歡。
再次感謝 潘扶民教授，從我一開始入學時就給予我許多的信心與鼓 勵，這淺移默化的力量，真的給予我許多的幫助，讓我對未來的路更有把 握。在未來的路上，我希望能以此為榜樣，除了努力向上之外，也要給周 圍的人信心與鼓勵，於積極又光明的環境下，造就無限的可能。