4.3 結合微電漿產生單元之氧化鋅氣體感測裝置之氣體感測表現
4.3.4 電漿氣氛對氧化鋅氣體感測裝置之氣體感測表現影響
敏度提高時，應是由於短時間之處理下尚不足以將原沉積之硝酸鋅完全轉化為氧
0 5000 10000 15000 20000 100
1000 10000 100000 1000000
plasma treatment 10 min plasma treatment 20 min plasma treatment 30 min
R
g(M )
concentration (ppm)
圖4.21 於 90%氬氣與 10%氧氣之混合氣體下之不同電漿處理時間之指叉狀電極設 計氣體感測裝置於通入含乙醇乾燥空氣後的氣體感測裝置平衡電阻與濃度之關係。
微電漿產生條件：使用Vp-p為1.43 kV、頻率為 21.5 kHz 之交流電。
0 5000 10000 15000 20000 10
100 1000 10000 100000
plasma in air, 10 min
plasma in 10% O2+ 90% Ar, 30 min
R
g(M )
concentration (ppm)
圖4.22 比較使用不同氣氛產生之微電漿對氣體感測表現之影響。微電漿產生條件：
(1)於空氣下，使用 Vp-p為2.60 kV、頻率為 21.5 kHz 之交流電，處理時間 10 分鐘，
(2)於 90%氬氣與 10%氧氣之混合氣體下，使用 Vp-p為1.43 kV、頻率為 21.5 kHz 之 交流電，處理時間30 分鐘。
第 5 章 結論與未來展望
由調配前驅物溶液，如：添加其他金屬鹽類，而於第二步之微電漿進行轉化時，選 擇合適之微電漿產生條件，而製備出摻雜其他金屬之氧化鋅，提供一增進氧化鋅氣 體感測性質之可能性。
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