氮化鎵厚膜之選擇性化學蝕刻特性研究
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(2) 氮化鎵厚膜之選擇性化學蝕刻特性研究 Selective Chemical Etching Characteristics of GaN Thick Film. 研 究 生:曾虹諭. Student: Hung-Yu Zeng. 指導教授:李威儀 博士. . Advisor: Dr. Wei-I Lee. 國立交通大學 電子物理研究所 碩士論文. A Thesis Submitted to Institude of Electro-Physics College of Science National Chiao Tung University in partial Fulfillment of the Requirements for the Degree of Master of Science In Electro-Physics July 2005 Hsinchu, Taiwan, Republic of China. 中華民國九十五年七月 1.
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