Effects of Nitric Acid and Chromic Acid Post-Treatments on the Surface Morphology and Field Emission Properties of Therm
詹博舜、李世鴻
E-mail: [email protected]
ABSTRACT
In this work, A simple acid treatment method was applied to functionalize the surface and to modify the structures of multi-walled carbon nanotubes (CNTs) grown on silicon substrates by thermal chemical vapor deposition (thermal CVD) using chromic acid(CrO3), nitric acid(HNO3) and a mixed solution of chromic trioxide and nitric acid Scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy, and energy dispersive spectrometer (EDS) were employed to investigate the mechanism causing the modified field emission (FE) properties of the CNT film. From our experimental data, it is found that after 20 min of CrO3+HNO3 treatment the emitted currents were enhanced by more than one order of magnitude compared with those of the untreated CNTs. We can see that after using a mixed solution of 20 min of CrO3+HNO3 treatment, the emission current density of CNTs reached 19.2mA/cm2,. and a lower turn-on electrical field than in the CNTs treated with HNO3 and CrO3. The method provides a simple, economical, and effective way to enhance the CNT field emission properties.
Keywords : carbon nanotubes (CNTs) ; emitted currents ; thermal chemical vapor deposition (thermal CVD) Table of Contents
封面內頁 簽名頁 授權書．．．．．．．．．．．．．．．．．．．．．．．．．iii 中文摘要．．．．．．．．．．．．
．．．．．．．．．．．．iv 英文摘要．．．．．．．．．．．．．．．．．．．．．．．．v 誌謝．．．．．．．．．
．．．．．．．．．．．．．．．．．vi 目錄．．．．．．．．．．．．．．．．．．．．．．．．．．vii 圖目錄．．．
．．．．．．．．．．．．．．．．．．．．．．x 表目錄．．．．．．．．．．．．．．．．．．．．．．．．．xv 第 一章 簡介．．．．．．．．．．．．．．．．．．．．．．1 1.1奈米碳管的歷史與簡介．．．．．．．．．．．．
．．．1 1.2奈米碳管的特性．．．．．．．．．．．．．．．．．．4 1.3奈米碳管的應用．．．．．．．．．．
．．．．．．．．7 1.4研究動機．．．．．．．．．．．．．．．．．．．．．9 第二章 化學溶液純化處理文獻回 顧理論．．．．．．．．．．11 2.1氧化法處理奈米碳管文獻．．．．．．．．．．．．．．11 2.2電子場發射理 論．．．．．．．．．．．．．．．．．．18 2.3奈米碳管成長機制．．．．．．．．．．．．．．．．．22 2.3.1奈米碳管主要成長機制．．．．．．．．．．．．22 2.3.2催化劑在奈米碳管成長中所扮演的角色．．．．
．23 2.3.3奈米碳管成長模式分類．．．．．．．．．．．．27 2.4奈米碳管的製程方法．．．．．．．．．
．．．．．．．30 第三章 實驗儀器與步驟．．．．．．．．．．．．．．．．．38 3.1實驗儀器．．．．．．．．
．．．．．．．．．．．．．38 3.1.1熱蒸鍍系統．．．．．．．．．．．．．．．．．38 3.1.2熱化學 氣相沉積系統．．．．．．．．．．．．．39 3.2量測儀器．．．．．．．．．．．．．．．．．．．．41 3.2.1掃描式電子顯微鏡系統．．．．．．．．．．．．41 3.2.2能量散佈分析儀系統．．．．．．．．．．．．
．43 3.2.3拉曼光譜儀系統．．．．．．．．．．．．．．．44 3.2.4場發射量測裝置系統．．．．．．
．．．．．．．46 3.3實驗流程．．．．．．．．．．．．．．．．．．．．49 3.4實驗步驟．．．．．．．．．
．．．．．．．．．．．51 3.4.1蒸鍍．．．．．．．．．．．．．．．．．．．．51 3.4.2成長奈米碳 管．．．．．．．．．．．．．．．．52 3.4.3純化後處理．．．．．．．．．．．．．．．．．52 3.4.4電性量測．．．．．．．．．．．．．．．．．．53 第四章 實驗結果與討論．．．．．．．．．．．．．．．．
．54 4.1鉻酸化學溶液後處理對CNT薄膜的研究與討論．．．．54 4.1.1 SEM分析 CNT薄膜表面型態．．．
．．．．．．55 4.1.2 TEM分析 CNT薄膜表面結構．．．．．．．．．58 4.1.3拉曼分析 CNT薄膜結晶 特性與結構．．．．．．．59 4.1.4 EDS分析 CNT薄膜元素成分構．．．．．．．．．62 4.1.5電子場發 射的分析．．．．．．．．．．．．．．64 4.2硝酸化學溶液處理對CNT薄膜的研究與討論．．．．．69 4.2.1 SEM分析 CNT薄膜表面型態．．．．．．．．．70 4.2.2 TEM分析 CNT薄膜表面結構．．．．．．．．
．72 4.2.3拉曼分析 CNT薄膜結晶特性與結構．．．．．．．73 4.2.4 EDS分析 CNT薄膜元素成分構．
．．．．．．．．75 4.2.5電子場發射的分析．．．．．．．．．．．．．．77 4.3鉻酸─硝酸混合化學溶液 處理對CNT薄膜的研究與討論．．．．．．．．．．．．．．．．．．．．．．．81 4.3.1 SEM分析 CNT薄膜表 面型態．．．．．．．．．81 4.3.2 TEM分析 CNT薄膜表面結構．．．．．．．．．84 4.3.3拉曼分析 CNT薄膜結晶特性與結構．．．．．．．85 4.3.4 EDS分析 CNT薄膜元素成分構．．．．．．．．．87
4.3.5電子場發射的分析．．．．．．．．．．．．．．89 4.4不同化學溶液後處理對CNT的討論與研究．．．．．
．94 4.4.1 SEM分析 CNT薄膜表面型態．．．．．．．．．94 4.4.2 TEM分析 CNT薄膜表面結構．．．
．．．．．．95 4.4.3拉曼分析 CNT薄膜結晶特性與結構．．．．．．．96 4.4.4 EDS分析 CNT薄膜元 素成分構．．．．．．．．．97 4.4.5電子場發射的分析．．．．．．．．．．．．．．99 第五章 結論．．．
．．．．．．．．．．．．．．．．．．．100 參考文獻．．．．．．．．．．．．．．．．．．．．．．．．103 REFERENCES
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