Chapter 4 Conclusions and Suggested Future Works
4.2 Suggestion for Future Works
There are many issues and measurement skills that we can’t discuss completely.
We list some goals for future work as follows.
1. Fast transient pulsed Id-Vg measurement is also used to evaluate charge-trapping phenomena precisely.
2. How much flow rate of CF4 gas can makes the FSG passivation layer optimixed
that will not deteriorate the device and result in the degraded performance and reliability.
3. HRTEM is essential to verify real thickness and estimate value of the dielectric constant for HfO2/SiON gate stack.
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