Lithium manganese oxide as an effective buffer layer between organic and metal layers
in organic light-emitting devices
Tswen-Hsin Liu
Citation: Applied Physics Letters 89, 102101 (2006); doi: 10.1063/1.2339028
View online: http://dx.doi.org/10.1063/1.2339028
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/89/10?ver=pdfcov Published by the AIP Publishing
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Lithium manganese oxide as an effective buffer layer between organic
and metal layers in organic light-emitting devices
Tswen-Hsin Liua兲
Department of Photonics, National Chiao Tung University, Hsinchu 300, Taiwan, Republic of China; Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, Republic of China; and AU Optronics Corporation, Hsinchu 300, Taiwan, Republic of China
共Received 6 March 2006; accepted 7 July 2006; published online 5 September 2006兲
Tris共8-hydroxyquinolinato兲aluminum 共Alq3兲-based organic light-emitting devices using a thermally
deposited lithium manganese oxide layer between aluminum 共Al兲 cathode and Alq3 have been
fabricated. The highest luminance efficiency obtained with a 1-nm-thick LiMnxOy layer is very
similar to that of the device with 1-nm-thick LiF. However, the device with an 18 nm LiMnxOylayer
obtained a longer operational stability although the luminance efficiency is lower. The improvements are attributed to lithium extractions of the lithium manganese oxide layer and the interfacial properties between Alq3 and Al are discussed. © 2006 American Institute of Physics.
关DOI:10.1063/1.2339028兴
Organic light-emitting devices 共OLEDs兲 are charge in-jection devices consist of organic thin layers that are essen-tially insulating materials. It is, therefore, important to re-duce barrier heights for the carrier injection at the organic/ electrode interfaces to realize low driving voltages and to balance the hole and electron injections to achieve high quantum efficiency. For improving electron injection, several cathode materials have been developed. Mg:Ag was the first alloy cathode and was introduced by Tang and Van Slyke in 1987.1Later, lithium-based cathodes such as Al:Li alloy2 and a double-layer cathode of Li/ Al 共Ref. 3兲 were developed to reduce the driving voltage. Double-layer cath-odes using a thin cathode interface layer, such as Li2O / Al
共Ref. 4兲 and LiF/Al,5
were also developed and are now widely used. Recently, Kido and Matsumoto demonstrated an effective electron-injection system by using a Li-doped organic layer with a molecular ratio of Li/ Alq3 at unity.6In
OLEDs with a configuration of indium tin oxide 共ITO兲/N,N
⬘
-bis共1-naphthyl兲-N,N⬘
-diphenyl-1 , 1⬘
-biphenyl-4 , -biphenyl-4⬘
diamine 共NPB兲/tris共8-hydroxyquinolinato兲aluminum 共Alq3兲/Li-doped Alq3/ Al, the current density increasesdramatically with increasing the thickness of the doped Alq3 layer.
Lithium manganese oxide, LiMn2O4, is one of the most
prominent materials used as cathode for rechargeable lithium batteries.7 The lattice electronic conductivity of amorphous LiMn2O4 can reach values of 2⫻10−5– 5⫻10−5S cm−1,7,8
which is well described by a hopping conduction model with an activation energy of about 0.16 eV, declaring that the electron exchange between Mn3+ and Mn4+ ions should be responsible for the conductive property.7,9The melting point of commercial LiMn2O4powder is around 400 ° C; hence, it is appropriate to form film by thermal evaporation, which is commonly used in OLEDs. In this letter, we report the pos-sibility of employing thermally deposited LiMnxOy as an
electron-injection layer for efficient and stable OLEDs. The devices used in this study have a multilayer struc-ture of ITO/copper phthalocyanine 共CuPc兲/NPB/Alq3,
where CuPc is the injection layer, NPB is the hole-transport layer, and Alq3 is the emission as well as
electron-transport layer. All organic layers were prepared by conven-tional vapor deposition at ambient temperature.10 The thicknesses were 15, 60, and 75 nm, for CuPc, NPB, and Alq3, respectively. A layer of LiMnxOy or LiF was
subse-quently deposited from a tungsten boat. Without breaking vacuum, the top electrode was prepared by sequential depo-sition of a thick Al overlayer using resistive heating. The electrochemical grade 共99.99%兲 LiMn2O4 powder in this study was purchased from Aldrich and used without further purification. The thickness of each layer was monitored by a calibrated quartz thickness monitor. In particular, the tooling factor of LiMnxOywas calculated according to the thickness
measured by scanning electron microscope.
The current density and luminance as a function of op-erating voltage for OLEDs that contain the LiMnxOy
thick-nesses共0, 1, 6, 18, 30, and 42 nm兲 or 1 nm LiF are shown in Figs. 1共a兲 and 1共b兲, respectively. It can be seen that by in-serting the LiMnxOy layers between Alq3 and Al both the
current-voltage 共I-V兲 and luminance-voltage 共L-V兲 curves are shifted towards a lower voltage. However, there are no significant differences in I-V and L-V characteristics in de-vices with different LiMnxOylayer thicknesses. As the anode
contact for hole injection in all these devices was the same, this also indicates that the presence of a LiMnxOy layer
be-a兲Author to whom correspondence should be addressed; electronic mail:
FIG. 1. I-V and L-V characteristics of a series of device with different LiMnxOythicknesses and 1 nm LiF.
APPLIED PHYSICS LETTERS 89, 102101共2006兲
0003-6951/2006/89共10兲/102101/3/$23.00 89, 102101-1 © 2006 American Institute of Physics
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tween Alq3 and Al in Alq3-based OLEDs greatly improves
the electron injection over a wide range of thicknesses. Figure 2 exhibits the plot of luminance efficiency along with the applied current density. It is clear that the device with 1-nm-thick LiMnxOy displayed the highest luminance
efficiency共⬃5 cd/A兲 among the devices, which is approxi-mately five times higher than the LiMnxOy-free device. Gap
states, which act as quenching centers, resulting from chemi-cal bonding between Al and Alq3 at the Al/ Alq3 interface,
have been suspected to be one of the causes behind the poor performance seen in OLEDs based on Al cathode.11–13The results have indicated that a LiMnxOythickness of only 1 nm
is sufficient to remove these states completely by avoiding a direct contact between Al and Alq3.14 However, a further
increase in the LiMnxOy layer thickness may result in a
gradual decrease in efficiency. It is understood that the addi-tion of a LiMnxOy layer between Alq3and Al will alter the
internal electric field distribution leading to a change in both the hole and electron injections. The attenuation in lumi-nance efficiency of the devices due to the presence of LiMnxOy layers between Alq3 and Al might results from a
less balanced charge injection. On the other hand, Fig. 3 shows the optical absorption spectrum of a deposited LiMnxOy film in the wavelength range of 250– 800 nm. A
sizable absorption was observed at visible light regime. The inset of Fig. 3 also shows the electroluminescent spectra of the devices driven at 20 mA/ cm2. Obviously, the optical
length between the reflective cathode and the half mirror ITO for these devices has been changed by inserting different thicknesses of LiMnxOy films. The spectrum shifts to the
longer-wavelength regime indicate that electroluminescence
was enhanced at red wavelengths and was suppressed at green wavelengths. Therefore, the deterioration of luminance in the thicker LiMnxOy domain might also result from the
destructive interference of green light in the half-cavity OLEDs incorporated with the light absorption property of LiMnxOy.
At present, the physical origin of the improved electron-injection characteristics is not certain. Previous studies on the LiF / Al double-layer cathode have revealed that the ther-modynamically allowed reaction, expressed as 3LiF + Al + 3Alq3→AlF3+ 3Li+Alq3−,
15–17
can induce electron injection due to the formation of a thin n-doped Alq3 layer as in the cases of using Li-doped Alq3 as the electron-injection layer
or using Li as the low-work-function cathode.6,18Similarly, the chemical reactions 关e.g., 3LiMnxOy+ Al+ 3Alq3
→Al共MnxOy兲3+ 3Li+Alq3
−兴 at the interface of Al, LiMn
xOy,
and Alq3 to generate 3Li+Alq3 −
are also possible. However, the results suggest that the high injected current was also achieved at larger LiMnxOythicknesses. It is unlikely that Al,
LiMnxOy, and Alq3will contact each other to undergo
reac-tions considering the coverage of LiMnxOyat the thicknesses
of 18, 30, and 42 nm. Since electrochemical extraction of Li ions in LiMn2O4 cathode occurs at 4 V in rechargeable
lithium batteries,7 therefore, it is more likely due to the lithium extraction of LiMnxOyat LiMnxOy/ Al interface, and
forms a Li–Al alloy at the interface. Nevertheless, when a bilayer cathode of LiMnxOy共18 nm兲/Al 共200 nm兲 is acting
as an electron-injection contact on an Alq3layer, the Li ions
extracted at Alq3/ LiMnxOyinterface can form a thin n-doped
Alq3 layer and is advantageous for reducing the electron-injection barrier to Alq3 layer.
Figure 4 shows the operational stability driven at 40 mA/ cm2 for devices that contain typical LiMn
xOy
thick-nesses 共0, 1, and 18 nm兲 as well as device with 1 nm LiF. One noteworthy feature in the inset of Fig. 4 is the occur-rence of two distinctly separate time scales in the luminance decay when there is no buffer layer between Al and Alq3,
with an early rapid decay to 50% of the initial luminance at the initial 5 h. This instability may be attributed to a number of factors, including the formation of deep carrier traps in the bulk, interface degradation, and mismatch between the Fermi level of the Al layer and the lowest unoccupied molecular orbital edge of the Alq3 layer.19 However, by adding a
LiMnxOyor LiF buffer layer of a suitable thickness between
Alq3 layer and Al cathode, reliability can be significantly improved. As mentioned in Fig. 2, the highest luminance FIG. 2. Absorption spectrum of a deposited LiMnxOyfilm taken at room
temperature in the wavelength range of 250– 850 nm. Inset: Normalized electroluminescent spectra of a series of device with different thicknesses of LiMnxOyat 20 mA/ cm2.
FIG. 3. Luminance efficiency vs current density curves of devices made with different LiMnxOythicknesses and 1 nm LiF.
FIG. 4. Normalized luminance as a function of operational time for the devices with 0, 1, and 18 nm LiMnxOyand 1 nm LiF. Inset: The device
without the lithium manganese oxide or LiF layer shows distinctly separate time scales in the luminance decay.
102101-2 Tswen-Hsin Liu Appl. Phys. Lett. 89, 102101共2006兲
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efficiency is obtained with a LiMnxOy thickness of 1 nm,
which is very similar to that of the device with 1-nm-thick LiF. But the device incorporating a 1-nm-thick LiMnxOy
shows a lower operational stability than the conventionally used LiF device. The longer operational stability can be ob-tained by the device with 18-nm-thick LiMnxOy, which
shows a somewhat lower efficiency than the one using 1 -nm-thick LiF. The work of Zhan et al. shows that a sodium stearate buffer layer can improve current injection and device thermal stability of the OLEDs, as a result of the decrease of the interfacial roughness at Alq3/ Al.20Since the electron
in-jection is nearly independent of the LiMnxOythickness over
the range of 1 – 42 nm in Fig. 1, we suspect that the differ-ence in the interfacial stability between Alq3, LiMnxOy, and
Al owing to morphology change of the thicker LiMnxOymay
very well play a role to enhance the durability. In our atomic force microscopy共AFM兲 studies, an Alq3film with a
thick-ness of 75 nm was evaporated on an ITO-coated glass sub-strate, and then 1-nm-thick or 18-mm-thick LiMnxOy was
deposited on the top. AFM images of the 1-mm-thick LiMnxOy/ Alq3film showed flat surfaces with a mean
rough-ness of approximately 0.85 nm. However, the AFM image of the 18-nm-thick LiMnxOy/ Alq3 film shows a relatively
rough and uneven surface with a mean roughness of approxi-mately 3.02 nm, which cannot add support to the observation of Zhan et al. The improvement indicates that some other mechanisms are operating.
Since the electrochemical properties of LiMn2O4 might be affected by surface morphologies which are dependent on preparation methods, to shed more light on understanding the mechanism 共or mechanisms兲 of thermally deposited LiMnxOyfilms resulting in improved performance and
life-time, it is important to know the nature of the interfaces, as well as the deposited LiMnxOy chemical content. In this
re-gard, studies using time-of-flight secondary ion mass spec-troscopy, and angle-resolved high-resolution x-ray photo-electron spectroscopy, of the deposited LiMnxOy film, as
well as Al/insulator contact, are currently in progress. The author would like to thank Shih-Feng Hsu, Chi-Hung Liao, and Chieh-Wei Chen for discussion and their valuable help in this work.
1C. W. Tang and S. A. Van Slyke, Appl. Phys. Lett. 51, 913共1987兲. 2L. S. Hung, Thin Solid Films 47, 363共2000兲.
3J. Kido, K. Nagai, and Y. Okamoto, IEEE Trans. Electron Devices 40,
1342共1993兲.
4T. Wakimoto, Y. Fukuda, K. Nagayama, A. Yokoi, H. Nakada, and M.
Tsuchida, IEEE Trans. Electron Devices 44, 1245共1997兲.
5L. S. Hung, C. W. Tang, and M. G. Mason, Appl. Phys. Lett. 70, 152
共1997兲.
6J. Kido and T. Matsumoto, Appl. Phys. Lett. 73, 2866共1998兲.
7Y. Shimakawa, T. Numata, and J. Tabuchi, J. Solid State Chem. 131, 138
共1997兲.
8H. Kawata, M. Nagatab, H. Kageyamac, H. Tukamoto, and A. R. West,
Electrochim. Acta 45, 315共1999兲.
9C. V. Ramana, M. Massot, and C. M. Julien, Surf. Interface Anal. 37, 412
共2005兲.
10S. A. Van Slyke, C. H. Chen, and C. W. Tang, Appl. Phys. Lett. 69, 2160
共1996兲.
11Y. Gao, K. T. Park, and B. R. Hsieh, J. Appl. Phys. 73, 7894共1993兲. 12Y. Gao, K. T. Park, and B. R. Hsieh, J. Chem. Phys. 97, 6991共1992兲. 13S. A. Jeglinski, O. Amir, X. Wei, Z. V. Vardeny, J. Shinar, T. Cerkvenik,
W. Chen, and T. J. Barton, Appl. Phys. Lett. 67, 3960共1995兲.
14F. Li, H. Tang, J. Anderegg, and J. Shinar, Appl. Phys. Lett. 70, 1233
共1997兲.
15L. S. Hung, R. Q. Zhang, P. He, and G. Mason, J. Phys. D 35, 103共2002兲. 16M. G. Mason, C. W. Tang, L. S. Hung, P. Raychaudhuri, J. Madathil, L.
Yan, Q. T. Le, Y. Gao, S.-T. Lee, L. S. Liao, L. F. Cheng, W. R. Salaneck, D. A. dos Santos, and J. L. Brédas, J. Appl. Phys. 89, 2756共2001兲.
17Q. T. Le, L. Yan, Y. Gao, M. G. Mason, D. J. Giesen, and C. W. Tang,
Appl. Phys. Lett. 87, 375共2000兲.
18E. I. Haskal, A. Curioni, P. F. Seidler, and W. Andreoni, Appl. Phys. Lett. 71, 1151共1997兲.
19K. L. Wang, B. Lai, M. Lu, X. Zhou, L. S. Liao, X. M. Ding, X. Y. Hou,
and S. T. Lee, Thin Solid Films 363, 178共2000兲.
20Y. Q. Zhan, Z. H. Xiong, H. Z. Shi, S. T. Zhang, Z. Xu, G. Y. Zhong, J.
He, J. M. Zhao, Z. J. Wang, E. Obbard, H. J. Ding, X. J. Wang, X. M. Ding, W. Huang, and X. Y. Hou, Appl. Phys. Lett. 83, 1656共2003兲.
102101-3 Tswen-Hsin Liu Appl. Phys. Lett. 89, 102101共2006兲
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