Professor of Chemistry Appointed for the Hong Kong University of Science and Technology

12/F World Shipping cenrre. 7 Canton Rood. Tsimshorsui, Kowloon, Hong Kong. Facsimile No. ,

Vice-Chancellor and Preudent Professor Chta-Wei Woo. DS. MA. PhD

Press Release

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PmssQr of ChemMQ

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rnted for the Hona Kona lJm of Science ad Teem

The Hong Kong University of Science and Technology today announces the appointment of Prof. Hiroyuki Hiraoka ( v W % 2 @ E ) , presently Senior Research Staff Member of the Polymer Science and Technology Department at the IBM Almaden Research Center in San Jose, California, as Professor of Chemistry.

Professor Hiraoka has researched widely in advanced materials. His current research interests include laser photoetching, studies in new resist preparations and new process developments in microlithography, photochemistry and radiation chemistry of polymers, and basic photochemistry of simple molecules. He has published more than 140 papers and book chapters, made numerous presentation, and holds 16 patents. His paper in 1981 initiated the UV-hardeninglphotostabiliration process of resists images, an important process which has become a standard practice in industry. His patent and his publication in macromolecules were the first to report the use of PMGI as a resist material.

Professor Hiraoka earned his BS, MS, and PhD from Kyoto University. He also holds an MBA from Golden Gate University. Professor Hiraoka has received many awards from the IBM Corporation, the latest being the Outstanding Technical Achievement Award on UV-hardening of resists presented to him in 1987. During 1987 and 1988 he was a Visiting Adjunct Professor at Colorado State University. In 1990, on leave of absence from IBM Research, he spent half a year as a Visiting Professor in Universite de Bordeaux I.

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‘._ . Professor Hiraoka is married with two sons.

The Hong Kong University of Science and Technology 21 June 1990

Professor

of Chemistry

Prof. Hiroyuki

Hiraoka,

presently

Senior

Research

Staff Member

of

the Polymer

Science

and Technology

Department

at the IBM Almaden

Research

Center in San Jose, California,

has been appointed

Professor

of

Chemistry.

Professor

Hiraoka has researched

widely in advanced

materials.

His

current

research

interests

include

laser

photoetching,

studies

in new

resist

preparations

and new process

developments

in microlithography,

photochemistry

and

radiation

chemistry

of

polymers,

and

basic

Photochemistry

of simple

molecules.

He has published

more than

140

papers

and book chapters,

made numerous

presentation,

and holds

16

patents.

His paper

in 1981 initiated

the UV-hardening/photostabilization

process

of resists

images,

an important

process

which

has become

a

standard

practice

in

industry.

His

patent

and

his

publication

in

macromolecules

were

the first

to report

the use of PMGI

as a resist

material.

,

>i ,/q r; -.

Professor

Hiraoka

earned

his B.S.,

M.S.,

and

Ph.D.

from

Kyot d

University.

He also holds an M.B.A. from Golden Gate University.

Professor

Hiraoka

has received

many awards

from the IBM Corporation,

the latest

being the Outstanding

Technical

Achievement

Award on UV-hardening

of

resists presented to him in 1987.

During 1987 and 1988 he was a Visiting

Adjunct

Professor

at Colorado

State University.

In 1990 he spent

half a

year as a Visiting

Professor

in Universite

de Bordeaux

1 on leave

of

absence from IBM Research.

-i-p y fi j

Professor

Hiraoka is married with two sons.

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