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Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003)

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Erratum

Investigation of Cu

ÕTaN Metal Gate for Metal-Oxide-Silicon

Devices

†Journal of The Electrochemical Society, 150,

G22

„2003…‡

Bing-Yue Tsui and Chih-Feng Huang

Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan

© 2003 The Electrochemical Society. 关DOI: 10.1149/1.1566966兴 All rights reserved. Available electronically March 20, 2003.

Figure 1

共page G22兲 should appear as:

Journal of The Electrochemical Society, 150

共5兲 L10 共2003兲

0013-4651/2003/150共5兲/L10/1/$7.00 © The Electrochemical Society, Inc.

L10

) unless CC License in place (see abstract). ecsdl.org/site/terms_use

address. Redistribution subject to ECS terms of use (see 140.113.38.11

數據

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