建議

在初步完成圓管噴流射入橫流環境之流場運動行為與動力機制 相關研究後，為能進一步提供實際工程應用，仍需持續不斷進行相關 研究與效果評估，需持續探討之相關主題包含:

(1) 利用平面雷射誘導螢光(Planar Laser Induced Fluorescence, PLIF)進行瞬間與平均流場濃度分析。

(2) 選擇噴流與橫流不同密度流體介質進行分析探討。

(3) 設定噴流與橫流不同流體溫度條件進行溫度影響評估。

(4) 針對 y-z 剖面進行量測分析。

目前高速 PIV 量測系統所採用之高效能高頻脈衝雷射因設備費 用因素，尚無法普及推廣。如能設法利用其它光學技術解決光源與質 點問題，依據PIV 原理由國內研究單位自行發展分析軟體，配合數位 影像擷取設備快速進展與成本持續降低。相信將來高速全場瞬時流場 速度量測技術必能普及應用在各工程領域中，使得難以捉模的流場變 化特性，得以具體量化呈現。

參 考 文 獻

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Kerosene smoke vapor properties Particle diameter (

D

^p) 4.79

μ

m

Particle density (

ρ

p) 5.31 kg/m³ Air properties

(T=298 K, Velocity range=1∼12 m/s)

Density (

ρ

) 1.18 kg/m³ Dynamic viscosity (

μ

) 1.838×10^-5 N-s/m²

Mean free path (

λ

) 0.065

μ

m Calculated aerosol properties

Knudsen number (Kn) 0.027 Relaxation time (

τ

) 3.808×10^-7 sec Slip correction factor (Cc) 1.034 Stokes number (St_k)

(at characteristic length of 5mm) 9.139×10^-4∼7.616×10^-5 Terminal settling velocity (v_t) 3.732×10^-6 m/s

Stopping distance (xs) 3.808×10^-7∼4.570×10^-6 m 表2.1 白蠟油煙霧質點主要特性

Laser beam specifications Wave length 514.5 nm Output power 6.0 W Beam diameter 1.4 mm Beam divergence 0.5 mrad

Polarization 100:1 vertical Optical noise: Current mode

Power mode

≤ 0.5% rms

≤ 0.5% rms Power stability: Current mode

Power mode

± 1%

± 5%

表2.2 Stabilite-2017 Argon-ion 雷射主要特性

REDLAKE MotionPro

High Speed Digital Imaging System Specifications Camera head CMOS sensor with monochrome 1280×1024 active

pixels Pixel size 12 μm Sensor

dynamic range 59 dB Frame storage

capacity 6 GB=4913 full frames Frame rate Up to 10,000 fps

Pre-established resolutions corresponding to frame rates

Resolutions Max. Frame Rates (fps) Shutter Speed (sec)

Trigger In Trigger Out Exposure Out

表2.3 REDLAKE MotionPro 高速攝影機主要特性

Performance specifications of high-repetition rate, dual laser heads, diode-pumped Nd:YLF laser system

Wave length 527 nm Repetition rate: Dual cavity system

Per cavity system

2-20,000 Hz 1-10,000 Hz Energy: Dual cavity system

Per cavity system

≥ 10mJ, 2,000 Hz (2×1,000 Hz)

≥ 10mJ, 1,000 Hz Power: (1,000 Hz×2)

Dual cavity system Per cavity system

≥ 20 watts

≥ 10 watts Beam diameter 1.5 mm Beam divergence ≤ 3 mrad

Polarization vertical Pulse width at 1 kHz < 180 ns

Energy stability (rms %) @ 2 kHz,

20W < 1%

表2.4 高速脈衝雷射主要特性

IDT X-stream XS-4

high-speed digital imaging system specifications Pixel depth 10 bits (8 bits output)

Pixel size 16×16 micron Resolution 512H×512V pixels Center to center spacing 16 micron

Dynamic range 59 dB

Trigger modes

Internal (continuous);

External (edge-low, edge-high, pulse low and pulse high);

Pulse train and single pulse burst Memory configuration 2 GB

Minimum inter-frame rate 100 ns

Digital interface Plug-and-play with real time preview, USB-2.0 (480 Mbps)

Trigger and synchronization CMOSE level (3.3V) via BNC connector

Optical interface Standard: C-mount

C to F and cannon converters available Image resolution

512H×512V

圖1.1 噴流受橫流衝擊時所產生之不同渦漩系統。

( from Fric and Roshko [1] )

圖2.1 風洞實驗設備與儀器配置。

圖2.2 噴流供應系統。

圖 2.3 自製煙霧產生器與構造示意圖。

圖 2.4 煙霧粒徑量測分佈圖。

圖 2.5 流場觀察使用之 Argon-ion 雷射。

圖2.6 雷射光束聚焦準直原理。

圖2.7 Redlake MotionPro 高速影像擷取系統。

圖2.8 高速脈衝雷射。

圖2.9 高速脈衝雷射輸出能量與輸出功率分佈。

圖2.10 高速脈衝雷射冷卻系統。

圖2.11 IDT X-stream 高速攝影機。

圖2.12 PIV 時序控制盒。

圖2.13 高速 PIV 系統整體配置圖。

圖 2.14 高速 PIV 雷射激發與影像曝光時序控制流程。

圖2.15 高速PIV量測系統與風洞設備配置。

圖 3.1 (a)混合層式渦漩垂直剖面之高速攝影連續影像，

Re_w=2,051，R=0.08，Framing rate=3,000 fps，Exposure time=1/10,000 sec，(b)手繪剪流層渦漩結構空間衍化 示意圖。

圖 3.2 混合層式渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,051, R=0.08 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.3 混合層式渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,872, R=0.08 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.4 混合層式渦漩沿 z 方向量測之速度分佈結果，

Re_w=3,692, R=0.08 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.5 混合層式渦漩型態流場，於不同 z/d 位置之水平剖 面瞬時曝光照片，Rew=2,051，R=0.08，exposure time=1/10,000 sec。

圖 3.6 (a)向後滾轉渦漩垂直剖面之高速攝影連續影像，

Rew=2,051，R=0.21，Framing rate=3,000 fps，Exposure time=1/10,000 sec，(b)手繪剪流層渦漩結構空間衍 化示意圖。

圖 3.7 向後滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,051, R=0.21 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.8 向後滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,872, R=0.21 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.9 向後滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=3,692, R=0.21 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖3.10 向後滾轉渦漩型態流場，於不同 z/d 位置之水平剖 面瞬時曝光照片，Rew=2,051，R=0.21，exposure time=1/10,000 sec。

圖 3.11 (a)向前滾轉渦漩垂直剖面之高速攝影連續影像，

Rew=2,051，R=0.37，Framing rate=3,000 fps，Exposure time=1/10,000 sec，(b)手繪剪流層渦漩結構空間衍 化示意圖。

圖 3.12 向前滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,051, R=0.37 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方 向量測之速度分佈結果。

圖 3.13 向前滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,872, R=0.37 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方 向量測之速度分佈結果。

圖 3.14 向前滾轉渦漩沿 z 方向量測之速度分佈結果，

Re_w=3,692, R=0.37 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方 向量測之速度分佈結果。

圖3.15 向前滾轉渦漩型態流場，於不同 z/d 位置之水平剖 面 瞬 時 曝 光 照 片 ，Re_w=2,051, R=0.37, exposure time=1/10,000 sec。

圖 3.16 搖擺引致蕈狀渦漩垂直剖面之高速攝影連續影 像，Re_w=2,051，R=0.56，Framing rate=2,500 fps，

Exposure time=1/10,000 sec。

圖 3.17 噴流出口區域搖擺引致蕈狀渦漩垂直剖面之高 速攝影連續影像與對應之手繪渦漩結構衍化示 意圖，Rew=2,051，R=0.56，Framing rate=2,500 fps，Exposure time=1/10,000 sec。

圖 3.18 搖擺引致蕈狀渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,051, R=0.56 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.19 搖擺引致蕈狀渦漩沿 z 方向量測之速度分佈結果，

Re_w=2,872, R=0.56 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖 3.20 搖擺引致蕈狀渦漩沿 z 方向量測之速度分佈結果，

Re_w=3,692, R=0.56 。 (a) 瞬 時 曝 光 照 片 (exposure time=1/10,000 sec) ， (b) 長 時 曝 光 照 片 (exposure time=1/30 sec)，(c)，(d)，(e)不同 x/d 位置沿 z 方向 量測之速度分佈結果。

圖3.21 搖擺引致蕈狀渦漩型態流場，於不同 z/d 位置之水 平剖面瞬時曝光照片，Rew=2,051，R=0.56，exposure time=1/10,000 sec。

圖 3.22 噴流型式渦漩垂直剖面之瞬時曝光照片與手繪 剪流層渦漩結構示意圖，Rew=2,051，R=1.26，

Exposure time=1/10,000 sec。

圖 3.23 噴流型式渦漩沿 z 方向量測之速度分佈結果，

圖 3.23 噴流型式渦漩沿 z 方向量測之速度分佈結果，

在文檔中 受側風衝擊之噴流的剪流層動態結構與控制(II) (頁 138-200)