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Control wafers inventory management in the wafer fabrication photolithography area

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Figure 3. The relationship of new control wafers, pull control and PUR process in the 1st loop system.
Figure 4. Flow process of the MCW algorithm.
Table 1. The service rate for each process (unit: day). Loop j u j1 u j2 u j3
Table 2. The cycle time of 1st loop under MCW and simulation with demand rate ¼ 10(1)18 and re-entrant ratio ¼ 0.0(0.1)0.9 (unit: hour).
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