Effects of Catalyst Plasma Pre-Treatment on Surface Morphology and Field Emission Characteristics of Carbon Nanotubes...
葉國輝、李世鴻
E-mail: 9607638@mail.dyu.edu.tw
ABSTRACT
In this work, tetrafluoromethane (CF4) and nitrogen (N2) plasma pre-treatments were carried out on the catalyst nickel films in order to study their effects on the surface morphology and field emission characteristics of the synthesized carbon nanotubes (CNTs).
Carbon nanotubes were synthesized with a thermal chemical vapor deposition system. Methane (CH4) was the main source for carbon, and argon was used as the carrier gas. CNTs were synthesized from carbon atoms obtained from catalytic thermal decomposition of methane. Raman spectroscopy, scanning electron microscope (SEM), and energy dispersive spectrometer (EDS) were employed to study the properties of synthesized CNTs after plasma treatment. From our experimental data, it is found that as the plasma pretreatment duration was increased, the diameter of CNTs became smaller and the surface density of CNTs became higher, and their field emission characteristics were thus enhanced. We can see that after 4 minutes of CF4 plasma pretreatment, the emission current density of CNTs reached 1.67mA/cm2, but after 4 minutes of N2 plasma pretreatment, the emission current density was only 0.908mA/cm2. Therefore, it is evident that CF4 plasma pretreatment can have a more pronounced enhancement on the emission characteristics of CNTs than N2 plasma pretreatment can have. Keywords : carbon nanotubes (CNTs), field emission, thermal chemical vapor deposition (thermal CVD)
Keywords : rbon nanotubes (CNTs) ; field emission ; thermal chemical vapor deposition (thermal CVD) Table of Contents
目 錄 封面內頁 簽名頁 授權書．．．．．．．．．．．．．．．．．．．．iii 中文摘要．．．．．．．．．．．．．．．
．．．．iv 英文摘要．．．．．．．．．．．．．．．．．．．v 誌謝．．．．．．．．．．．．．．．．．．．．．vi 目錄．．．．．．．．．．．．．．．．．．．．．vii 圖目錄．．．．．．．．．．．．．．．．．．．．x 表目錄．．
．．．．．．．．．．．．．．．．．．xiv 第一章 簡介．．．．．．．．．．．．．．．．． 1 1.1. 奈米碳管的歷史與 簡介．．．．．．．．．． 1 1.2. 奈米碳管的特性．．．．．．．．．．．．． 4 1.3. 奈米碳管的應用．．．．．．．．
．．．．． 7 1.4. 研究動機．．．．．．．．．．．．．．．． 8 第二章 催化劑電漿前處理文獻回顧．．．．．．． 11 2.1. 氨氣對催化劑電漿前處理文獻．．．．．．． 13 第三章 理論與研究方法．．．．．．．．．．．． 17 3.1. 電子場發 射理論．．．．．．．．．．．．． 17 3.2. 奈米碳管的成長機制．．．．．．．．．．． 20 3.2.1. 奈米碳管主要成長機制
．．．．．．．．． 20 3.2.2. 催化劑在奈米碳管成長中扮演的角色．．． 22 3.2.3. 奈米碳管成長模式分類．．．．．．．
．． 25 3.3. 奈米碳管的製程方法．．．．．．．．．．． 27 3.4. 電漿蝕刻機制．．．．．．．．．．．．．． 34 3.5. 實 驗儀器與實驗步驟．．．．．．．．．．． 35 3.5.1. 實驗流程．．．．．．．．．．．．．．． 35 3.5.2. 熱蒸鍍系統．．
．．．．．．．．．．．． 36 3.5.3. 熱化學氣相沉積系統．．．．．．．．．． 37 3.5.4. 電漿蝕刻系統．．．．．．．．
．．．．． 39 3.5.5. 掃描式電子顯微鏡系統．．．．．．．．． 41 3.5.6. 能量散佈分析儀系統．．．．．．．．．． 42 3.5.7. 拉曼光譜儀系統．．．．．．．．．．．． 44 3.5.8. 場發射量測裝置系統．．．．．．．．．． 46 第四章 實驗結果 與討論．．．．．．．．．．．． 48 4.1. 不同時間CF4電漿前處理對奈米碳管成長之影響48 4.1.1. SEM(掃瞄式電子顯微 鏡)的分析．．．．． 48 4.1.2. Raman(拉曼光譜)分析．．．．．．．．．．52 4.1.3. EDS(能量散佈分析儀)的分析．．．．
．．．55 4.1.4. 電子場發射特性分析．．．．．．．．．． 56 4.2. 不同時間N2電漿前處理對奈米碳管成長之影響 60 4.2.1.
SEM(掃瞄式電子顯微鏡)的分析．．．．．．60 4.2.2. Raman(拉曼光譜)分析．．．．．．．．．．64 4.2.3. EDS(能量散佈 分析儀)的分析．．．．．．．66 4.2.4. 電子場發射特性分析．．．．．．．．．． 67 4.3. 不同電漿前處理對奈米碳管的研 究與討論．． 71 4.3.1. 不同電漿前處理SEM表面結構比較．．．．．71 4.3.2. 不同電漿前處理拉曼比較．．．．．．．．
72 4.3.3. 不同電漿前處理EDS比較．．．．．．．．．73 4.3.4. 不同電漿前處理場發射特性比較．．．．． 74 第五章 結論
．．．．．．．．．．．．．．．．． 76 參考文獻．．．．．．．．．．．．．．．．．．．78 REFERENCES
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