鈰金屬,鉿金屬閘極絕緣層及複晶矽氮氧化層之研究
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(2) 鈰金屬閘極絕緣層、鉿金屬閘極絕緣層 及複晶矽氮氧化層之研究 The Study of Cerium-based Gate Dielectrics, Hafnium-based Gate Dielectrics, and Interpoly oxynitride 研 究 生：江國誠 指導教授：雷添福 博士. Student: Kuo-Cheng Chiang Advisor: Dr. Tan-Fu Lei. 國 立 交 通 大 學 電子工程學系. 電子研究所碩士班. 碩士論文 A Thesis Submitted to Institute of Electronics College of Electrical Engineering and Computer Science National Chiao Tung University In Partial Fulfillment of the Requirements For the Degree of Master of Science in Electronic Engineering June 2004 Hsinchu Taiwan Republic of China. 中華民國 九十三年六月.
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