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光電學院光電科技學程

使用 SMT 表面黏著技術評估銅柱凸塊覆晶元件封裝之研究

Study of Surface Mount Technology on

Copper Pillar Bump Flip-Chip Package

研 究 生:許翰誠

指導教授:林建中 副教授

(2)

使用 SMT 表面黏著技術評估銅柱凸塊覆晶元件封裝之研究

Study of Surface Mount Technology on

Copper Pillar Bump Flip-Chip Package

研 究 生:許翰誠 Student:Han-Cheng Hsu

指導教授:林建中 Advisor:Chien-Chung Lin

國 立 交 通 大 學

光 電 科 技 學 程

碩 士 論 文

A Thesis

Submitted to Degree Program of Photonic Technology College of Photonics

National Chiao Tung University in partial Fulfillment of the Requirements

for the Degree of Master

In

Photonic Technology

July 2013

Tainan, Taiwan, Republic of China

(3)

-I-

使用 SMT 表面黏著技術評估銅柱凸塊覆晶元件封裝之研究

學生:許翰誠

指導教授:林建中

國立交通大學 光電科技學程碩士班

覆晶封裝技術是指在晶圓上完成凸塊製程後將晶圓切割成單顆晶粒,

再透過覆晶銲接機將晶粒與 IC 載板進行接合,之後透過迴銲製程完成封裝

元件的固定。此新的封裝型態符合電子元件市場上的高功能、高可靠度和

低價位的技術需求。早期凸塊製程是以錫鉛凸塊或是錫銀銅凸塊為主,但

隨著晶圓製程的微縮,晶粒尺寸的縮小,錫鉛凸塊或是錫銀銅凸塊已無法

符合新一代技術需求,因此,能符合小間距的銅柱凸塊漸漸獲得重視。

為增加覆晶製程的彈性配置以及與系統化構件(SIP)、2.5D IC…等新

型態封裝構件快速整合的作業需求,本研究評估使用表面黏著技術在相同

銅柱凸塊覆晶條件下,搭配不同成份之錫膏、導線架材料將晶粒與 IC 載板

進行接合並預期逹到高可靠度的需求。透過銲接製程參數的調整、最佳化

後進行可靠度與加速壽命試驗。將測試結果分析確認符合韋布分布後計算

(4)

-II-

出相關參數並使用 Arrhenius relationship 公式預測產品使用壽命。

研究發現搭配表面黏著技術搭配三種不同成份的錫膏-① 錫 96.5%/銀

3%銅/0.5%、② 錫 97%/銀 3%/與 ③ 錫 95.5%/銀 4%/銅 0.5% ,在純銅表面

處理的導線架基板上可以達到 10 年以上的使用壽命並符合電子元件在可靠

性上的需求,其中,以相同製程搭配錫 95.5%/銀 4%/銅 0.5% 的錫膏可以得

到最好的可靠性結果。

(5)

-III-

Study of Surface Mount Technology on

Copper Pillar Bump Flip-Chip Package

Student: Han-Cheng Hsu

Advisors: Dr. Chien-Chung Lin

Degree Program of Photonic Technology

National Chiao Tung University

ABSTRACT

Flip chip assembly technology means to deposit bumps on the chip pads on

the topside of a wafer, the second step is to saw the wafer into chip units and use

flip chip bonder to mount chips on carriers like substrates or lead frames. The

final step is to use IR reflow oven to firm the package. Solder bump technology

has been developed in the beginning of flip chip package technology and has

high volume production today, but now the copper pillar bump trends up due to

the process limit of solder bump.

To meet the high flexible operation in flip chip process and integrate with

other packages such as System in Package (SiP), 2.5D IC…etc, we investigate

surface mount technology (SMT) and daisy-chain chip with copper pillar bump

in this study. The materials are also considered for different components of

solder paste and lead frame surface treatment. After process optimization, the

samples proceed reliability test and Accelerated Lifetime Test (AL). After

(6)

-IV-

confirmed the data can meet Weibull distribution, we use Arrhenius relationship

equation to predict the use lifetime.

Finally, we found the SMT process with 3 types of solder pastes (Sn 96.5%/

Ag 3%/ Cu 0.5%, Sn 97%/ Ag 3%, Sn 95.5%/ Ag 4%/ Cu 0.5%) and pure

copper treatment on lead frame surface can reach use lifetime and high

reliability requirement for ten years, the best result for the reliability

performance is the same process with Sn 95.5%/ Ag 4%/ Cu 0.5% solder paste.

(7)

-V-

誌 謝 Acknowledgement

當初一聽到光電學院要開在職專班時,就下定決心要來這兒進修,經過

一番比試,果然也順利進到這兒與來自四面八方的英雄好漢齊聚一堂,努

力精進學問。

就學期間,除了承蒙課堂上諸位良師教導之外最感恩的是指導教授林建

中教授,一路上義氣相挺,悉心指導,在研究主題上給學生很大的發展空

間,在研究方法上也不吝將拿手絕技傾囊相授,適時提點,讓學生功力大

進,此外,平易近人的教授更常將之前的經驗、產業現況與當前學術研究

趨勢與學生分享,讓學生思路大開,也得以在學術之海更清晰的遨遊。

另外要感謝的是南茂科技公司對學生的研究全力支持,在材料準備、製

程檢驗、作業機台及可靠度測試設備的提供等,都能盡力滿足學生的需求,

使學生的研究得以順利完成。

有家人的支持,這個結果才別具意義。在此也要感謝我的牽手淑貞,在

學生忙碌於事業與學業間分身乏術之時,這期間家中恰巧發生了許許多多

的事情,而她總能夠一一化解,不但照顧好家中的老老少少,包含二個可

愛的小搗蛋-潪銘與縈熒,也將這些突如期來的事情處理得順遂圓融,果真

是一位賢內助。

最後要將這份論文獻給在西方的母親,雖然她無緣親眼見到她的寶貝兒子

在學業上又更進一步,但相信這份榮耀她可以感應得到。

(8)

-VI-

Table of Contents

Chinese Abstract

………

i

English Abstract

………

iii

Acknowledgement

………

v

Table of Contents

………

vi

List of Tables

………

viii

List of Figures

………

ix

List of Abbreviations

………

xii

List of Symbols

………

xiii

I.

Introduction………

1

1.1

The trend chart on the IC package market ………

1

1.2

Flip chip package………

2

1.2.1

Assembly process of Flip chip package ………

3

1.3

Surface-mount technology (SMT) ………

8

II.

Motivation and Theory………

9

2.1

Motivation………

9

2.2

Theory ………

12

2.2.1

The Bath-tube curve model ………

12

2.2.2

Weibull distribution ………

14

2.2.3

Arrhenius relationship equation………

19

2.3

Reliability test ………

20

2.3.1

Environment test ………

21

2.3.2

Stress test ………

22

III.

Evaluation plan and procedure………

25

3.1

Evaluation plan………

25

3.1.1

Fixed materials on the design of experiments (DoE) …

26

3.1.2

Key factor materials on the design of experiments (DoE)

29

3.1.3

Design of experiments (DoE) matrix………

31

3.2

Examination items for process check ………

32

3.3

Process optimization………

36

3.4

Test sample manufacturing ………

42

3.4.1

The assembly process flow ………

42

3.4.2

Quality inspection result ………

43

IV.

Evaluation Result Analysis ………

50

(9)

-VII-

4.2

Temperature cycling test (TCT) failure distribution……

51

4.3

Weibull distribution ………

52

4.3.1

Weibull distribution for PCT………

53

4.3.2

Weibull distribution for TCT………

57

4.4

Life time prediction………

61

4.5

Failure mode analysis………

63

4.6

Summary………

64

V.

Summary and Future Work………

65

Bibliographies

………

67

Appendix 1

………

69

Appendix 2

………

70

(10)

-VIII-

List of Tables

Table. 1-1 Moisture Sensitivity Levels

Table. 2-1 process comparison of flip chip package

Table. 2-2 Moisture Sensitivity Levels

Table. 3-1 The comparison table of solder paste

Table. 3-2 The comparison table of solder paste

Table. 3-3 The full factorial DoE

Table. 3-4 The shearing test result

Table. 3-5 Initial resistance measurement data

Table. 4-1 PCT test result

Table. 4-2 TCT test result

Table. 4-3 Resistance measurement after TCT test

Table. 4-4 Weibull distribution for PCT

Table. 4-5 Weibull distribution for PCT

Table. 4-6 The life time prediction

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-IX-

List of Figures

Fig. 1-1 Overall Wafer level packaging demand

Fig. 1-2 Conventional IC package (T/QFP)

Fig. 1-3 The cross-section of Flip chip package

Fig. 1-4 Solder bumps on wafer

Fig. 1-5 Copper pillar on wafer

Fig. 1-6 Illustration of die sawing process

Fig. 1-7 Illustration of die bonding process

Fig. 1-8 IR reflow profile

Fig. 1-9 Under-fill adhesive dispensing process and molding process

Fig. 2-1 The main process flow of flip chip package

Fig. 2-2 The main process flow of flip chip package for SMT method

Fig. 2-3 The Bath-tube curve model

Fig. 2-3 The Bath-tube curve model

Fig. 2-4 The reliability function for lifetime and failure rate

Fig. 2-5 The PDF shapes of the Weibull distribution

Fig. 2-6 the value of β on the Weibull failure rate Fig. 2-7 the value of η on the Weibull failure rate Fig. 3-1 Evaluation procedure

Fig. 3-2 Cross-section view of flip chip CSP package

Fig. 3-3 Cross-section view of a copper pillar bump

Fig. 3-4 Top view of chip with daisy-chain design

Fig. 3-5 The bumping process flow

Fig. 3-6 Solder paste

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-X-

Fig. 3-8 The die shear testing method

Fig. 3-9 The HP-34970A Ohmic testing equipment

Fig. 3-10 Hitachi Temperature cycling test oven

Fig. 3-11 HIRAYAMA Pressure cooker

Fig. 3-12 Fuji NXP chip place machine

Fig. 3-13 BTU IRreflow oven

Fig. 3-14 Solder paste printing process

Fig. 3-15 IR-reflow profile

Fig. 3-16 Solder plating on copper leadframe

Fig. 3-17 Appearance check result of solder paste printing by different stencil opening

Fig. 3-18 Abnormal photo for insufficient solder

Fig. 3-19 FC CSP process flow

Fig. 3-20 The appearance inspection

Fig. 3-21 The appearance inspection after molding process

Fig. 3-22 Die shearing test analysis

Fig. 3-23 The breaking mode after die shearing test

Fig. 3-24 The X-ray inspection for a defect unit

Fig. 3-25 The X-ray inspection for normal units

Fig. 3-26 CSAM inspection result

Fig. 3-27 Cross-section

Fig. 4-1 Weibull distribution for PCT Cell-1

Fig. 4-2 Weibull distribution for PCT Cell-2

Fig. 4-3 Weibull distribution for PCT Cell-3

Fig. 4-4 Weibull distribution for PCT Cell-4

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-XI-

Fig. 4-6 Weibull distribution for PCT Cell-6

Fig. 4-7 Weibull distribution for TCT Cell-1

Fig. 4-8 Weibull distribution for TCT Cell-2

Fig. 4-9 Weibull distribution for TCT Cell-3

Fig. 4-10 Weibull distribution for TCT Cell-4

Fig. 4-11 Weibull distribution for TCT Cell-5

Fig. 4-12 Weibull distribution for TCT Cell-6

(14)

-XII-

List of Abbreviations

SIP

: System in Package

POP

:

Package on Package

SMT

: Surface mount technology

TQFP

: Thin quad-flat package

JEDEC : Join electron Device Engineering Council

AL

: Accelerated lifetime test

MUF

: Molding under fill

C4

: Controlled collapse chip connection

AOI

: Automatic Optical Inspection

FEM

: Finite Element Method

PDF

: Probability density function

RDL

: Redistribution layer

MSL

: Moisture Sensitivity Level

CSP

: Chip scale package

CTE

: Coefficient of Thermal Expansion

CSAM

: Scanning Acoustic Microscopy

PCT

: Pressure cooker test

TCT

: Temperature cycling test

PPF

: Pre-plated leadframe

(15)

-XIII-

List of Symbols

F(x)

: the failure function

ƒ(x)

: the failure probability density function

t

: the length of the period of time

h

: constant failure rate

β

: shape parameter (or slope)

η

: characteristic life time or scale parameter

γ

: location parameter.

R

:

reaction rate

K

: Boltzmann’s constant (8.617×10-5 ev/k )

AF

: acceleration factor

T

L

: low temperature

T

H

: high temperature

Luse

. :

lifetime during normal use

Laccl

: lifetime during acceleration use

RH.

: humidity

n.

: integer constant from 1 to 7

Ttest.

:

temperature during test ( [K] = 273 +temperature in ˚C) Tuse.

:

temperature during use

(16)

-1-

Chap 1. Introduction

The demands of 3C products in consumer market, especially for portable devices like

smart phones and tablets have been highly grown in recent years. New products with light,

slim and portable characters are changing human’s work way and life style today, as well as

the communication method.

As following the demands from the market, the electronic devices trends to high speed,

multi-function, low power consumption and large capacity integration. The conventional

assembly packages slows down and new packages to meet this market trend are widely

developed, like Flip chip package, Chip scale package (CSP), System in package (SiP),

Package on Package (PoP), 2.5D IC, 3D IC, WLCSP...etc.

1-1 The trend chart on the IC package market

Following the evolution of semiconductor technology, the volume and transistors density

of Integrated Circuit (IC) device is increasing. The popularly known as Moore's Law, which

was described by Intel co-founder Gordon E. Moore in his 1965 paper, states that the number

of transistors on a chip will double approximately every two years. Now this rule is still

working even over 4 decades.

For the demand from the market view, the IC package size trends to become smaller, in

addition, with more function, higher reliability performance and lower cost are also strongly

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-2-

Fig. 1-1 Overall Wafer level packaging demand

(Source: Equipment & Materials for 3DIC and Wafer-Level-Packaging (Yole),2011)

From the combo of wafer level package, the major portion is flip chip package, because it

can meet all the requirements in today’s market and for other combo packages, it will grow 20

percent per year in the future.

1.2 Flip chip package

Flip chip technology is a way to connect different types of electronic components directly

by using conductive solder bumps instead of wires.

The traditional technology is to mount the chip face-up on the leadframe or substrate, and

bond gold wires from alumina pad of the chip to the lead land for circuit connection, then

molding capsulation process is performed as Figure 1-2, the conventional IC package.

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-3-

No bonding wire is needed on flip chip technology, it replaces wire bonding process and

allows integrated circuit chips to be directly connected with external circuits through

conductive bumps present on the chip's surface. A direct chip-attach or controlled collapse

chip connection (C4) is also called. This process becomes very popular and large resources

are invested because it reduces packaging size and offers better electrical performance.[1] The

Figure 1-3 shows the cross- sectioning of flip chip package.

Fig. 1-3 The cross-sectioning of flip chip package

(Source: http://www.faraday-tech.com/html/Product/ASICService/Package/FlipChip.htm)

1-2-1 Assembly process of Flip chip package

The assembly process is to place the bump onto the chip pads on the topside of the wafer,

the second step is to saw the wafer to chip unit and use flip chip bonder to mount the chip on

substrate. The final step is to use IR reflow oven to firm the package and isolate the chip by

epoxy, the below lists the detail process.

1. Wafer bumping process

The wafer bumping process is to deposit the bump onto the alumina pads of chip on

the topside of the wafer during the final wafer process, the below Figure 1-4 and Figure

(19)

-4-

Fig. 1-4 Solder bumps on wafer

Fig. 1-5 Copper pillar bumps on wafer

There are two types of bumps well used in the flip chip package: solder bump and

copper pillar bump. Solder bump is popular and highly manufactured, because this

material is evaluated and introduced to mass production from the beginning of package

development. But the situation is changed now due to the copper pillar bumps has

below advantages:

a. Better electrical performance than the conventional solder bump for high power

application devices.

b. The diameter of copper pillar bump is smaller than solder bump and can be used on

high density or high pin count devices.

(20)

-5-

since 2010.

The base band platform - OMAP 4430 from Texas Instruments (TI) applied on

Amazon Kindle Fire tablet and Motorola Droid X cell phone are also used copper pillar

bump on flip chip technology.

Considering to the view of package cost, the major communication chip design house,

like Qualcomm, Marvell, Broadcom, Infineon, Mediatek all follow this trend to develop

flip chip with copper pillar bump. So based on the prediction by market research

institute, the market share will be 30 % ata least in 2015.

2. Die sawing process

The die sawing process is to groove bumped wafers to single unit. Two methods are

used for this process, one is to employ a high-speed spindle fitted with an extremely

thin diamond blade to saw the wafer and the other method is to use laser energy to

groove the wafer. Generally the fist method is abroad use and the second method is

applied on low-K wafer for die crack, peeling abnormality prevention.

Fig. 1-6 Illustration of die sawing process

3. Die bonding process

(21)

-6-

connection purpose. The rubber tip with vacuum is used to pick up the chip from the

wafer and flip the die 180°. The die is attached on the substrate with precisely alignment

the bump position to the topside land on the substrate.

Fig. 1-7 Illustration of die bonding process

4. Infra-Red (IR) reflow process

The IR reflow process is subjected to controlled heat, which melts the solder,

permanently connecting the joint from bump to land of substrate. For conventional

reflow oven, infrared lamps are used to keep the temperature, so it is called infrared

reflow. There are usually four heating stages in the IR reflow oven as below Figure

1-8, each having a distinct thermal profile for better temperature control. The first is a

pre-heat zone, where the temperature of the die and substrates is gradually, uniformly

raised, and substrates then transfer to another zone automatically where the

temperature is high enough to melt the solder, uniformly cooling down is the next to

prevent the damage on package from the stress of temperature change.

Die

substrate

Bump

Rubber tip

(22)

-7-

Fig. 1-8 IR reflow profile

(Source: IPC/JEDEC J-STD-020D.1, Moisture/Reflow Sensitivity Classification for Nonhermetic Solid State Surface Mount Devices)

5. Isolation process

The process is subjected to provide a stronger mechanical connection, a heat bridge,

and to ensure the solder joints between bump and the substrate are not stressed and

damaged due to differential heating of the chip. Two methods are applied to protect

the chip, one is to use dispenser. Generally the electrically-insulating adhesive is used

in this process. Another method is to use molding method to inject the MUF (molding

underfill) into the package.

Fig. 1-9 Under-fill adhesive dispensing process and molding process

adhesive

Molding under-fill Epoxy Dispenser

(23)

-8-

1-3 Surface-mount technology (SMT)

The surface-mount technology is a method for making electronic circuits in which the

components are placed directly onto the surface of substrate or printed circuit boards (PCBs).

After IR relow or wave reflow process, the components are connected. This process was

developed in the 1960s and became widely used in the late 1980s.

The first step is to print the solder paste on the substrate. Solder paste, a sticky mixture of

flux and tiny solder particles, is applied to pads of substrate or PCBs with a stainless steel

stencil using a screen printing process. It can also be applied by a jet-printing mechanism for

fine pitch devices. After finished printing process, the substrate proceeds to the

pick-and-place machines. The components are placed on the substrate by rubber tip with

vacuum. Then the substrate is inspected by an Automatic Optical Inspection (AOI) to make

sure all the components are at the correct position. Next, the substrate transfers into the IR

reflow oven.

The surface tension of the molten solder helps keep the components in place, and if the

solder pad geometries are correctly designed, surface tension automatically aligns the

components on their pads.

After IR-reflow process, AOI is applied again to inspect all components are well to place

(24)

-9-

Chap 2. Motivation and Theory

2-1 Motivation

For the high demand on mobile and tablet portable products, the package size of Integrate

circuit devices (IC) trends to get thin and small. The saved space is designed to enlarge the

cell capacity. This purpose is to reach longer standby and operation time on 3C products.

Chip scale package (CSP) is developed in this intension, so we will focus on chip scale

package with copper pillar bump in this study. Moreover, it also can be extended to the

application of System in Package (SiP). SiP is a number of integrated circuits enclosed in a

single package. They are connected internally by bonding wires or with a flip chip assembly,

solder bumps to join the circuit.

The major process for flip chip package is to use die bonder to mount the chip with copper

bumps on substrate/ lead frame, as below figure. Through this method, only Sn/Pb bump or

Cu/Sn bump can be applied on this process.

(25)

-10-

As we mentioned on above paragraph, this study is focused on surface mount technology

to mount chips on lead frame or substrate, a SMT and molding processes are used in this CSP ,

as show in Figure 2-2.

Fig. 2-2 The main process flow of flip chip package for SMT method

Besides the SMT process evaluation, we include solder materials and surface treatment of

lead frame on it. By this way, we plan to extend the machine application from SiP to flip chip

package, also expect to integrate more function on multi packages.

We think this could be a simple way to get good reliability performance through Interfacial

Bonding Behavior between Sn-Ag-Cu Series solder materials and lead frame surface

treatment. Through the join of different solder composition ( Sn/Ag/Cu base) and lead frame

treatment, the intermetalic compound (IMC) is formed between the Cu pillar bump and the

leadframe surface. This intermetalic compound will affect the interfacial bonding strength and

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-11-

The below table shows the advantage and disadvantage comparison of both processes of flip

chip package.

Traditional (original) New method

Advantage 1.Mature production process 2.High pint count application 3.High thermal dispatch

1.High reliability performance 2.No need solder cap on bump/ pillar

3.Flexibility for application on other package

Disadvantages 1.Reliability concern on high level 2.Solder cap on bump is needed

1.Limit on high I/O chip application 2.Narrow process window in process

Table. 2-1 process comparison of flip chip package

The weakness point on Flip chip package is the solder joint of copper pillar bump to lead

frame or substrate, there are many papers submitted to use Finite Element Method software

(FEM) for the simulation. A paper issued by Yunn-Horng Guu mentioned the pillar bump

with a copper base and eutectic solder cap had a higher resistance to fatigue failure in

comparison with a pure eutectic solder bump, the mechanical behavior of the flip-chip packag

is a crucial issue in the packaging industry, and it is also related to the reliability of electronic

devices[3].

The solder paste is highly related to the solder join of the bonding interface, refer to the

study result of paper [4] [5], the solder paste with Ag content 3.0% to 4.0 % has below

characters :

1. Better thermal fatigue resistance and reliability result

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-12-

3. Broader process window

4. Better Joint reliability compared to non-silver lead-free and tin-lead alloys.

Based on these data, three types of solder paste: Sn 96.5%/ Ag 3%/ Cu 0.5%, Sn 97%/

Ag 3% and Sn 95.5%/ Ag 4%/ Cu 0.5% are chose for this study.

2-2 Theory

The reliability test is used to exam the result of the evaluation on this study.

Reliability is defined as the probability that a device or system will perform its intended

function during a designated period of time under stated conditions.

2-2-1 The Bath-tube curve model

The bathtub curve is used in reliability engineering and is generated by mapping the rate of

early "infant mortality" failures when first introduced, the rate of random failures with

constant failure rate during its "useful life", and finally the rate of "wear out" failures as the

product exceeds its design lifetime. Please refer the below Figure 2-3, the first part is a

decreasing failure rate, known as early failures., the second part is a constant failure rate,

known as random failures and the third part is an increasing failure rate, known as wear-out

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-13-

Fig. 2-3 The Bath-tube curve model

The probability of reliability function is as

R(t) = P{T > t} = 1 − P{T ≤ t} = 1 − FT(t), t ≥ 0 (2-1) From (2-1)

𝑓𝑓T(t) = −R′(t) and 1 − R(t) = FT(t) = P{T ≤ t} (2-2) where F(x) is the failure function, and

ƒ(x) is the failure probability density function,

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Fig. 2-4 The reliability function for lifetime and failure rate

h means constant failure rate or can be called hazard rate. It is defined for non repairable populations as the rate of failure for the survivors to time t during the next instant of time, and

the function is as h(t) = lim∆𝑡𝑡→0P(t < T ≤ t + ∆t|T > t) Δt = lim∆𝑡𝑡→0P(t < T ≤ t + ∆t)Δt ∙ P(T > 𝑡𝑡) = lim∆𝑡𝑡→0F(t+∆t)−F(t) Δt ∙ 1 R(t) = F′T(t) 1−FT(t) = 𝑓𝑓T(t) R(t) (2-3)

MTTF is Mean Time To Failures (for non-repairable equipments), and the equation is

MTTF = 1 / h

The cumulative distribution function corresponding to a bathtub curve and may be analyzed

using a Weibull distribution chart.

2-2-2 Weibull distribution

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the Swedish physicist Waloddi Weibull. He used it for modeling the distribution of breaking

strength of materials, now this distribution is applied to model many different failure

distributions.

This distribution can handle increasing, decreasing or constant failure rates. The Weibull

distribution is flexible and fits to a wide range of data, including normal distributed data. Only

Log-Normal data does not fit in the Weibull distribution and needs separate analysis.

For a comprehensive review of applications, we refer the readers to Johnson et al. (1994)

and Murthy et al. (2003)[7]. Given a shape parameter, β, and characteristic life time, η, the three-parameters Weibull distribution probability density function (PDF) and reliability

function are given by:

𝑓𝑓T(t) = β η� t−γ η � β−1 e−�t−γη � β , t ≥ γ (2-4) FT(t) = 1 − e−� t−γ η � β (2-5) where t ≥ 0, β> 0, η> 0, γ> 0 , and

β : shape parameter (or slope)

η: characteristic life time or scale parameter

γ: location parameter.

t = time, cycles, miles, or any appropriate parameter;

Generally, the location parameter is not used and the value can be set to zero, so the PDF

equation can be reduced to two-parameter Weibull distribution.

𝑓𝑓T(t) = β η� t η� β−1 e−�ηt� β , t ≥ γ (2-6)

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Weibull Parameters

The shape parameter, BETA (β) is known as Weibull slope, it shows how the failure rate

develops in time. Different values of the shape parameter can have responded effects on the

behavior of the distribution. Figure 2-5 shows the effect of different values of the shape

parameter, β, on the shape of the PDF (while keeping γ constant), we can see the shape of the PDF can take on a variety of forms based on the value of β.

Fig. 2-5 The PDF shapes of the Weibull distribution

(Source: http://www.weibull.com/hotwire/issue14/relbasics14.htm)

Another characteristic of the distribution where the value of β has a distinct effect is the failure rate. Figure 2-6 shows the effect of the value of β on the Weibull failure rate.

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Fig. 2-6 the value of β on the Weibull failure rate

(Source: http://www.weibull.com/hotwire/issue14/relbasics14.htm)

This is one of the most important aspects of the effect of β on the Weibull distribution. Weibull distributions with β < 1 have a failure rate that decreases with time, also known as infantile or early-life failures. Weibull distributions with β close to or equal to 1 have a fairly constant failure rate, indicative of useful life or random failures. Weibull distributions with

β > 1 have a failure rate that increases with time, also known as wear-out failures. Corresponding to below equation (2-3) and (2-4) , we also can find the failure rate as

h

(t)

=

𝑓𝑓T(t) R(t)

=

β η

t−γ η

β−1 (2-7)

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The ETA (η) is characteristic life time or scale parameter, increasing the value of η while holding β constant has the effect of stretching out the PDF. Since the area under a PDF curve is a constant value of one, the "peak" of the PDF curve will also decrease with the increase of

η, as indicated in the following figure.

Fig. 2-7 the value of η on the Weibull failure rate

(Source: http://www.weibull.com/hotwire/issue14/relbasics14.htm)

If η is increased, while β and γ keep the same, this distribution gets stretched out to the right and its height decreases, while maintaining its shape and location.

If η is decreased, while β and γ keep the same, the distribution gets pushed in towards the left, and its height increases.

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2-2-3 Arrhenius relationship equation

The semiconductor and system manufacturers face strong pressure to develop new and

higher reliability products in short term today. The instant time-to-market becomes the

success factor of new product promotion. Accelerated Test (AT) is developed based on this

concept. Refer the readers to Thomas P. Ryan et al. (2007, chapter 14) [8], an accelerated

failure model relates the time-to-failure distribution to the stress level. The general idea is that

the level of stress is only compressing or expanding time and not changing the shape of the

time-to-failure distribution.

With this assumption, changing stress is equivalent to transforming the time scale used to

record the time at which failures occur, so it is a matter of “decelerating” back to normal use

by using an appropriate acceleration factor. This is accomplished by using acceleration

models.

Arrhenius relationship equation is commonly used on the accelerated test for the life time

prediction in normal use condition and environment. It is expected that as stress is increased,

like temperature, humidity, a reaction such as a chemical reaction, will occur more rapidly.

The Arrhenius equation reflects this idea and is named after S. A. Arrhenius (1859–1927).

The equation when applied to accelerated testing is given by

𝐿𝐿(temp) = A ∙ e�𝑘𝑘∙tempK−𝐸𝐸𝐸𝐸 � (2-8)

where L is the reaction rate, A is an unknown non-thermal constant, temp K is temp

C+273.15, is thermodynamic temperature in kelvin (K), k is Boltzmann’s constant

(8.617×10-5 ev/k ) or the universal gas constant and Ea is the activation energy based on

characteristics of product or material.

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accelerated life test conditions to a failure rate indicative of normal use temperature for

electrical devices. From the equation (2-8), the AF is found

AF = Luse Laccl = A∙e�−𝐸𝐸𝐸𝐸𝑘𝑘∙TL� A∙e� −𝐸𝐸𝐸𝐸𝑘𝑘∙TH �= e Ea k�TL1−TH1� (2-9)

where AF is acceleration factor, Luse is lifetime during normal use, Laccl is lifetime during

acceleration use, TL is low temperature ( [K] = 273 +temperature in ˚C) and

TH is high temperature.

For the relationship about humidity and temperature, from the study by D. Stewart Peck in

1986, an acceleration formula is described which provides direct extrapolation from test

results on humidity and temperature[9], the equation is given

Time to failure (RH)n∙ e�𝑘𝑘∙T𝐸𝐸𝐸𝐸� (2-10) AF = Luse Laccl = � RHtest RHuse� n ∙ e�𝑘𝑘∙T𝐸𝐸𝐸𝐸��ttest1 − tuse1 � (2-11)

where RH is humidity, n is integer constant from 1 to 7, Ttest is temperature during test ( [K]

= 273 +temperature in ˚C) and Tuse is temperature during use.

2-3 Reliability test

The “Reliability” is the ability of a system or component to perform its required functions

under stated conditions for a specified period of time.[10] Reliability is theoretically defined

as the probability of failure, the frequency of failures, or in terms of availability, in other

words, failure rate, average life, mean time to failure (MTTF), etc. From the test data, the

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play an important role in improving reliability by analyzing failures which occur during tests

and clarifying these failure mechanisms. Reliability tests provide the greatest effects when

statistics and failure physics function reciprocally.

2-3-1 Environment test

The environment test is identified the classification level of nonhermetic solid state surface

mount devices (SMDs) that are sensitive to moisture-induced stress so that they can be

properly packaged, stored, and handled to avoid damage during assembly solder reflow

process.

There are eight levels defined for this test and is called Moisture Sensitivity Level (MSL),

as shown in Table 2-2. This standard is used to determine what classification or

preconditioning level should be used for SMD package qualification.[11]

Table. 2-2 Moisture Sensitivity Levels

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appropriate electrical testing and acoustic microscope, if one or more devices are failed, the

package shall be considered to have failed the test and stop to go to next stress test.

2-3-2 Stress test

The purpose of stress test is to precipitate failures in an accelerated manner compared to

normal use conditions. Test units are subjected to higher than usual levels of one or more

accelerating variables such as temperature, humidity, voltage and current. Then the test results

are used to analysis packaging failures or predict life of the units at use conditions. Anand

model[12] was employed to represent the constitutive equation of solders in stress model and

developed to life prediction model in the accelerated thermal test. [13]

There are many industry-standard package-level reliability tests. The test is chosen based

on the failure mechanism, as different stress tests accelerate different failure mechanisms. It is

also important to select test methods which are as standardized as possible in consideration of

test reproducibility, cost effectiveness, data compatibility and other factors [14]. These tests

are described as below.

1. Biased Highly Accelerated Stress Test (HAST) (JESD22-A110)

The purpose is to simulate extreme operating conditions. Devices are baked in a

chamber at an extreme temperature and humidity for various lengths of time. The

devices are subjected to bias while the devices are in the chamber. The devices are then

ATE tested for electrical failures. Variables: Temp = 130°C / Humidity = 85% RH/

Time = 96 hours

2. Temperature Cycle Test (TCT) (JESD22-104)

The purpose is to accelerate the effects of thermal expansion mismatch among

different components of the package and circuit. It is used to determine package

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transportation and use.

The devices are ATE tested for function verification. Failed devices are checked for

interface cracks. Variables: Temp = 150°C (top) and -65° C (bottom)

3. Pressure Cooker Test (PCT) (JESD22-A102)

The purpose is to test moisture resistance of plastic encapsulated devices. Devices

are baked in an autoclave (on a tray) at high temperatures and humidity for an extended

period of time under static conditions. An ATE test is performed after the autoclave.

Failed devices are checked for delamination, shorts, etc.

Variables: Temp = 121°C / Pressure = 15 Psi / Humidity = 100 % RH

4. High Temperature Storage (HTS) (JESD22-A103)

The purpose is to determine the effect of time and temperature, under storage

conditions, for thermally activated failure mechanisms of solid state electronic devices.

Devices are baked in a chamber at an extreme temperature and humidity for various

lengths of time. The devices are then ATE tested for electrical failures. Variables: Temp

= 150°C / Time = 1000 hours

5. Temperature Humidity Bias (THB) (JESD22-A101)

The purpose is to determine device/package resistance to prolonged temperature,

humidity, and electrical stress. Devices are baked in an oven at extreme temperature and

humidity for various lengths of time. The devices are subjected to maximum differential

bias on alternating pins while the devices are in the oven. The devices are then ATE

tested for electrical failures.

Variables: Temp = 85°C / Humidity = 85% RH.

6. Unbiased Highly Accelerated Stress Test (UHAST) (JESD22-A118)

The purpose is to simulate extreme operating conditions. Devices are baked in a

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devices are then ATE tested for fuction verification.

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Chap 3. Evaluation plan and procedure

The detail evaluation plan and the procedure of the test sample manufacturing are

described in this chapter. We use the design of experiments (DoE) method to run a matrix

evaluation. After test samples are completed, the quality inspection, electrical test and

reliability test are following. Figure3-1 shows the detail flow of this test.

Fig. 3-1 Evaluation procedure

3-1 Evaluation plan

There are four types of materials included in flip chip package, solder material, substrate,

underfill and chips with bumps. In this study, we focus on the package performance on the

reliability for surface mount technology process, so the considered factors in this experiment

are solder materials and surface treatment of lead frame. For chips with copper pillar bumps

and underfill materials, we fix these factors in this evaluation.

The flip chip chip-scale package (CSP) is chosen for this experiment and the package

structure is shown as below Figure 3-2. For CSP, it means the package must have an area no

greater than 1.2 times of the chip size and it must be a direct surface mountable package. On

this package, the stress between interface layers is greater than that of conventional package,

thus CSP is a good candidate for this evaluation.

Material preparation Process optimization Sample build Quality Inspection Electrical test Environment test Electrical test Stress test Electrical test Result Analysis

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Fig. 3-2 Cross-section view of flip chip CSP package

3-1-1 Fixed materials on the design of experiments (DoE) 1. Chip with copper pillar bump

Several kinds of bump processes have been used for mass production in electronic

devices assembly, like solder bumps, copper/solder bumps, copper bumps…etc, and the

most popular one is solder bumps including Pb/Sn or SAC elements. For copper pillar

bumps, it plays a more important role in today’s IC device market due to fine-pitch

application and better electrical performance, thus we choose copper pillar bump in this

study. Figure 3-3 shows the cross-section view of a copper pillar bump.

Fig. 3-3 Cross-section view of a copper pillar bump

The composition of a copper pillar bump is Cu/Ni/ Au, and the thickness of each layer

is Cu : 22um, Ni: 2-3um and Au: 5um. The purpose of gold layer is to prevent the

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for electrical test, as shown in Figure 3-4. The daisy-chain pattern is a method of

propagating signals along a bus in which bumps/ pads are connected in series and the

signal passed from one bump to the next.

Fig. 3-4 Top view of chip with daisy-chain design

Copper pillar bump process contains two major parts, redistribution layer (RDL) and

bump. The process flow of RDL includes polymide coating, lithography, developing,

electroplating and photoresist stripping. The process flow of copper pillar bumping is as

shown in Figure 3-5, photoresist coating, exposure, developing, electroplating,

photoresist stripping, under bump metallurgy(UBM) removal and annealing.

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2. Molding under fill (MUF)

Molding underfill is a kind of polymer material which includes several composite

components, like epoxy resins, phenolic hardeners, catalysts, and release agents. The

purpose is to encapsulate semiconductor devices to prevent the defects from moisture,

crack, package stress and interfacial delamination.

Package warpage is one of the major thermo-mechanical reliability concerns in

electronic packaging. The cause is come from CTE (Coefficient of Thermal Expansion)

mismatch on materials which comprise in a package. The occurrence of warpage during

the assembly process can lead to misalignment of parts and a variety of operational

failures. [15 ]

Kyocera low stress molding underfill is chosen for this experiment. With this material,

we can lower the process variation during the sample assembly, therefore, the test result

should be more reliable. The Table 3-1 shows the material property of a Kyocera molding

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Table 3-1 The property of molding underfill

3-1-2 Key factor materials on the design of experiments (DoE) 1. Solder paste

Solder paste is the key material used in the process of surface mount technology.

It includes a sticky mixture of flux and tiny solder particles. Flux is added to act as a

temporary adhesive, holding the components until the solders melt in the soldering process,

leading to a stronger physical connection. The purpose of solder paste is to connect the

leads of IC packages to attachment points. The solder paste is chosen based on its intended

use purpose. In this experiment, we refer to the study of Ikuo Shohji in 2005, the SAC base

solder pastes have better workability and reliability, so three types of solder pastes are

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a. SAC305 solder paste

Component: 96.5Sn/3Ag/0.5Cu, particle size: 15~5 um

b. SAC300 solder paste

Component: 96.5Sn/3.5Ag, particle size: 15~5 um

c. SAC405 solder paste

Component: 95.5Sn/4Ag/0.5Cu, particle size: 15~5 um

Fig. 3-6 Solder paste

Table 3-2 Comparison table of solder pastes

A (SAC305) B (SAC300) C (SAC405)

Melting point, o C 217~221 221~225 217~219 reflow temperature, o C 238~248 238~248 238~248 Coefficient of Thermal Expansion (20-100) 21.6 21.5 21.8 Electrical Resistivity , (μohm-cm) 13.0 12.3 12.7 Tensil Strength, MPa 41.1 40.6 43.7 Thermal Conductivity,

W/m.K

63.2 62.6 61.1 Elengation 41.0 41.2 40.6 Young’s Modulus, GPa 50 50 52 Poison’s Ratio 0.36 0.36 0.35

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The added flux on above materials is the same and the change item is focused on the

component percentage of tin, silver and copper.

2. Surface treatment of lead frame

The surface treatment is to plate gold above the copper layer to prevent oxidation on

the surface, which can cause poor adhesion or cold joint on the solder-joint interface

between bump and substrate. In addition, the worst issue is the micro-crack defect

penetrating the package and resulting IC device function fail.

In this experiment, we use the lead frame material for CSP package. Two treatments

are considered in parallel, one is gold treatment and another one is pure copper treatment.

a. Pure Copper Leadframe (LF), as shown in Figure 3-7

b. Gold(Au) plated Leadframe (LF)

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3-1-3 Design of experiments (DoE) matrix

A full factorial experiment is designed in this study. There are two factors that contain

two and three levels, respectively. Total 6 cells (2x3 matrix) are generated in this experiment.

The below table shows the detail of the full factorial DoE:

Cell

leadframe

Solder type

Remark

1

LF-PPF

Solder -A

SAC305

2

LF-PPF

Solder -B

SAC300

3

LF-PPF

Solder -C

SAC405

4

LF-Cu

Solder -A

SAC305

5

LF-Cu

Solder -B

SAC300

6

LF-Cu

Solder -C

SAC405

Table 3-3 The full factorial DoE

Two reliability tests are performed in this study, thermal cycling test (TCT) and pressure cooking test ( PCT). Therefore, total 300 units (50 ea x 6 cell) will be prepared in the test.

3-2 Examination items for process check

To verify whether the quality of samples can meet the requirement of the test, there are

several examination items employed in this study. These inspections are very important and

essential; the purpose is to assess the feasibility of the SMT process and material whether can

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1. Die shear testing

Die shear testing is a method to determining the strength of adhesion on a

semiconductor chip to the attach lead frame. A shearing stress is performed and

subjected on the chip to examine the overall quality of adhesion interface. The pass

criteria is based on the definition of the MIL-Std-883 method 2019 as appendix 1, it

depends on the strength of the bonding area.

Fig. 3-8 The die shear testing method

2. X-ray inspection

X-ray inspection is a non-destructive analysis technique. The method is to use

X-radiation that is a form of electromagnetic radiation to penetrate the package and

inspect the image which is transformed by the scattered energy.

After molding process, the solder connections are underneath the chip and not visible

by optical microscope inspection. The use of X-ray inspection is to ensure that the

manufacturing process is able to accommodate the quality requirement.

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a. Dry joints due to insufficient solder

b. Bridging/Shorts due to surplus solder

c. Voiding due to gas bubbles within the solder

d. Misplacement/Misalignment due to inaccurate placement of chip

3. Scanning Acoustic Microscopy (CSAM) inspection

Scanning Acoustic Microscopy (SAM) is a quick analysis technique without

destroying the package. SAM uses ultrasound waves to detect changes in acoustic

impedances in integrated circuits (IC) and other similar materials, pulses of different

frequencies are used to penetrate various materials to examine different interfaces and

determine the mechanical integrity of the assembly.

The following categories can be observed in this test:

a. Internal voids due to parameter or underfill issue

b. Interface delamination due to material CTE mismatch

c. Dry joints due to insufficient solder

d. Missing bump due to poor adhesion issue

4. Electrical test

The Ohmic testing is used to measure the resistance and analysis the electrical

performance. The resistance increases as the interconnection condition declines and can

be traced by the Ohmic measurement system. The resistance test can be performed as

two-wire measuring as well as with the high-accuracy 4-wire measuring. Precise and

stable measuring results up to the mOhm-range are detected. Figure 3-9 shows the

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Fig. 3-9 The HP-34970A Ohmic testing equipment

5. Environment test

The environment test is to simulate the packaging, handling of electronic devices

which are sensitive for the introduction of moisture. When moisture traps inside packages

can damage them during soldering, as the moisture vaporizes and expands. The

expansion of trapped moisture can result in internal delamination of the package from the

die or lead-frame, and cause internal cracks.

We expect to simulate the strict use condition in this test, hence the Moisture

Sensitivity Level (MSL) requirement is Level 1 and the condition is as below:

Condition : 85℃ temperature, 85% RH and 168 hrs aging time.

6. Stress test

Temperature and humidity are major causes to make IC package failure, below

tests are applied in this study.

Temperature cycling test (TCT) - the thermal expansion mismatch among different

components of the package especially on the solder joint can be enhanced. Figure 3-10

shows the Hitachi ES63LMV Temperature cycling test oven.

Pressure cooking test (PCT) - the humidity impact and metal joint corrosion on the

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model and calculate the acceleration factor, therefore, the time-to-failure distribution in

normal use condition can be estimated. Figure 3-11 shows the HIRAYAMA PC-242HS

pressure cooker.

The detail test conditions are as below:

a. Pressure cooker test (PCT), Condition : 121℃, 100% RH,

100/ 200/ 300/ 500/ 1000 hours

b. Temperature cycling test (TCT), Condition : -65℃, +150 ℃,

100/200/500/1000/1500/2000/3000/ 3500 cycles

Fig. 3-10 HITACHI Temperature cycling test oven

Fig. 3-11 HIRAYAMA Pressure cooker

3-3 Process optimization

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solder joint interface between copper pillar bump and lead frame is also the key point. The

below lists the machine information and process flow for SMT

1. Machine type:

a. Chip / component place machine: Fuji NXP -1450 with integrated wafer handler

function, as shown in Figure 3-12

Fig. 3-12 Fuji NXP chip place machine

b. Auto optical inspection machine: OMRON-3F5VT

Cyber-FLEX ULTRA 8

c. IR reflow oven: BTU-PYRAMAX,

-10 Zone heating Oven

- Maximum temperature rating (all zones): 350°C

- Oven atmosphere: Air/N2

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Fig. 3-13 BTU IR reflow oven

2. Operation procedure of surface mount assembly:

a. Cover stainless stencil on topside of lead frame

b. Print solder paste on the land of Lead frame/ substrate

c. Place bare die on lead frame land area

d. Auto optical inspection (AOI) for quality control

e. IR reflow process to fix the chip and Flux cleaning, Figure 3-15 shows the IR

profile

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Fig. 3-15 IR-reflow profile

3. DoE for bonding join strength optimization

Solder paste is the key material to join the copper pillar and lead frame, if the solder

paste is insufficient, it may cause the poor bonding strength and affect the reliability. The

process optimization and affected factors are reported [16, 17]. To make sure the

bonding strength in the best condition, the process optimization to fit this experiment is

an essential work. We design four different opening of printing stencils and they are

100um / 125um/ 150um/ 180um opening. The purpose is to control the solder paste

printing size and thickness.

Test Parameter:

a. Printing speed : 20 mm/s

b. Printing pressure : 6.0 kg

c. Cycle time : 29.2 sec

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Test method:

a. Die shear testing for bonding strength adjustment is performed

b. Appearance check after solder paste printing

Fig. 3-16 Solder plating on copper lead frame

Test result

From die shearing test result, the 150um and 180um opening tools can meet the

requirement. Comparing to 150um and 180um opening tools, the solder height of 180um

is higher than that of 150um opening, it has risk to bleed out the solder paste and

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Fig. 3-17 Appearance check result of solder paste printing by different stencil opening

Fig. 3-18 Abnormal photo for insufficient solder

After the test and data analysis, the printing stencil with 150um opening got better

performance and met the quality requirement, the thickness of solder paste also can

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3-4 Test sample manufacturing

After process optimization, the best condition for sample manufacturing is determined.

We implement it on the Flip-chip CSP assembly process and confirm the samples quality to

meet our requirement.

3-4-1 The assembly process flow

There are several processes in package assembly, here we list the major process flow:

1. L/P : the process is to grind the wafer to the designate thickness

2. D/S : to saw the wafer to the unit by high speed diamond blade

3. Chip attach : to bond the chip on the lead frame or substrate

4. IR reflow : an oven with several heating zones for soldering process

5. M/D : molding, to encapsulate the chip with molding underfill material

6. S/P : solder plating, to plate the tin on the outer lead, this process is for lead package

only

7. P/S : package sawing, to cut the leadframe/ substrate into units

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Fig. 3-19 FC CSP process flow

3-4-2 Quality inspection result

Quality inspection is about inspection, measuring, or testing of product characteristics. To

make sure all samples can meet the quality requirement and can release to next evaluation

without abnormal phenomenon, we perform tests in production.

1. Appearance inspection

The optical microscope is used to check the outlook quality. All units are inspected

and the test result can meet the specification on solder paste print, bonding position

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Fig. 3-20 The appearance inspection

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2. Die shear testing

The die shear testing for six cells has been done to confirm the solder joint strength.

Fifteen units per cell are examined and the result could pass the specification. The defect

mode after shear testing is solder ball-neck broken, and this failure phenomenon meets

the standard. The test readings are listed on Table 3-4.

The cell 4, cell5 and cell 6 with bare copper LF got better test result, there is no

significant test difference from cell 1 to 3 and the PPF treatment lead frame is used in

these cells.

unit: Kg

Table 3-4 The shearing test result

Cell 1 2 3 4 5 6 1 0.959 1.083 0.967 3.257 3.288 3.213 2 1.185 0.995 0.883 3.033 3.088 3.262 3 0.887 0.954 0.882 3.183 2.672 3.332 4 1.168 1.068 1.083 3.446 3.249 3.397 5 0.852 0.877 0.928 2.541 2.751 3.078 6 0.895 0.898 0.868 3.332 2.825 3.208 7 1.126 1.078 0.892 3.193 3.014 3.574 8 0.994 0.874 1.048 3.224 3.279 3.334 9 0.972 1.056 0.961 3.206 2.905 2.687 10 1.254 0.931 0.898 2.948 3.016 3.275 11 1.065 0.956 1.218 3.152 2.962 3.078 12 0.986 1.185 0.922 2.913 3.303 2.875 13 1.169 0.848 0.972 3.101 3.011 3.371 14 1.193 1.021 1.025 2.763 2.694 2.986 15 1.194 0.908 1.017 3.228 2.948 3.258 max 1.254 1.185 1.218 3.446 3.303 3.574 min 0.852 0.848 0.868 2.541 2.672 2.687 mean 1.060 0.982 0.971 3.101 3.000 3.195 sigma 0.132 0.097 0.095 0.231 0.212 0.224 Spec 0.080 0.080 0.080 0.080 0.080 0.080 Ppk 2.469 3.092 3.122 4.357 4.589 4.643

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Fig. 3-22 Die shearing test analysis

Fig. 3-23 The breaking mode after die shearing test

3. X-ray inspection

The X-ray inspection has been done for six cells to confirm the solder joint

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under bump connection interface should be scraped.

Fig. 3-25shows the X-ray inspection result for normal unit.

Fig. 3-24 The X-ray inspection result for a defect unit

Fig. 3-25 The X-ray inspection result for normal units

4. Scanning Acoustic Microscopy (CSAM) inspection

CSAM inspection is confirmed for six cells to exam the delamination in different

interfaces within packages. Figure 3-26 shows the result of normal units and defect units.

All units are inspected and the result could pass the specification. No delamination

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Fig. 3-26 CSAM inspection result of normal units and defect units

5. Cross sectioning inspection

After package separation process, we performed cross-section to confirm the

package structure, chip tilt. The unit is grinded from side of package to bonding area and

inspected by optical microscope. No abnormal phenomenon was found in the sample.

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6. Electrical test

The judgment of reliability test is based on the electrical test results, therefore, all

samples are confirmed by electrical test. We use high-accuracy 4-wire measuring system

in the test. Table 3-5 shows all initial test readings of resistance. From the test results, the

cell 1 to 3 show higher resistance than those of cell 4 to 6 and that is due to the solder

plating thickness deviation of package outer-lead. The data is for reference only, because

we judge the device by open or short condition.

Unit: mOhm

Table 3-5 Initial resistance measurement data

unit Cell-1 Cell-2 Cell-3 Cell-4 Cell-5 Cell-6

1 56 46 54 46 41 48 2 49 48 48 46 48 50 3 51 48 49 48 46 47 4 58 48 50 48 43 47 5 48 46 46 48 44 48 6 53 52 56 48 44 52 7 50 56 59 48 48 48 8 46 54 51 48 45 49 9 46 60 56 52 44 50 10 51 53 54 48 47 51 11 57 60 57 48 49 44 12 55 57 58 48 45 46 13 55 45 59 48 49 48 14 49 49 60 48 45 49 15 56 59 52 50 45 48 16 51 52 52 53 44 44 17 54 53 54 48 44 50 18 52 53 54 48 44 48 19 50 56 48 46 47 51 20 54 51 59 39 46 49 21 52 52 59 44 47 48 22 55 52 52 46 50 50 23 51 58 59 46 46 45 24 53 51 52 48 46 42 25 48 49 53 46 46 49

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Chap 4. Evaluation Result Analysis

In this chapter, we confirm the feasibility assessment of surface mount assembly for flip

chip CSP package application and analyze the reliability test result including Weibull

distribution, fail point in stress test and the defect mode analysis.

4-1 Pressure cooker test (PCT) failure distribution

Through the resistance measurement method on the package with daisy-chain design, we

can know the electrical performance precisely. All units in six DoE Cells are measured after

every test point. The test points are 100, 200, 300, 500, 1000 hours. The below table is the

failure distribution. Check points PCT 0hr PCT 100hrs PCT 200hrs PCT 300hrs PCT 500hrs PCT 1000hrs Cell 1 0 0 0 0 1 3 Cell 2 0 0 0 1 2 4 Cell 3 0 0 0 1 2 5 Cell 4 0 0 0 0 0 2 Cell 5 0 0 0 0 0 3 Cell 6 0 0 0 0 0 2

Table 4-1 PCT test result

We observed the first failure point is at PCT 300 hours for cell 2 and cell 3. Based on the

JEDEC standard definition, the pass criteria is 168 hours, so all these units can meet this

requirement and have no concern on the reliability performance. For the test results of other

cells, we see cell 1, the first failure point is at 500hrs and cell 4, cell 5 and cell 6, the failure

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4-2 Temperature cycling test (TCT) failure distribution

Following the resistance measurement method as PCT, all units in six DoE Cells are

measured after every test point. The test points are 100, 200, 500, 1000, 1500, 2000, 3000 and

3500cycles. The below table is the failure distribution.

Table 4-2 TCT test result

We observed the first failure point is at TCT 200 cycles for cell 1 and cell 2, for cell 3, the

failure point is at TCT 500 cycles, for cell 4, cell 5 and cell 6, the first failure point is at TCT

3000 cycles. Based on the definition of JEDEC standard, the pass criteria is 1000cycles, so

test units from cell 4, cell 5 and cell 6 can meet this requirement.

Table 4-3 shows the electrical test result, we measured the resistance after every test points

and then generated the chart using average data. We observed the electrical performance was

stable for cell 4, cell 5 and cell 6. The cell 1, cell2 and cell 3 shows worse resistance after

TCT 500C test, and the same lead frame material are used for these three cells.

Cycles MSL 1 TCT 100c TCT 200c TCT 500c TCT 1000c TCT 1500c TCT 2000c TCT 3000c TCT 3500c Cell 1 0 0 2 3 6 8 12 17 -Cell 2 0 0 1 4 8 10 14 19 -Cell 3 0 0 0 2 3 5 9 14 -Cell 4 0 0 0 0 0 0 0 2 3 Cell 5 0 0 0 0 0 0 0 1 3 Cell 6 0 0 0 0 0 0 0 2 3

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Table 4-3 Resistance measurement after TCT test

4-3 Weibull distribution

From the reliability test result in the PCT and TCT test, the Weibull distribution can be

drew to model the lifetime data. Through the equation (2-4) we discussed in chapter 2.-2-2,

we can find the shape parameter (β) and characteristic life time (η).

𝑓𝑓T(t) = βη�t−γη � β−1

e−�t−γη � β

, t ≥ γ (2-4)

A commercial software - Mimitab is used for data calculation and result analysis in this study. Mimitab is distributed by Minitab Inc, and is a powerful statistic and process

management software which is used in statistics-based process improvement methods, like Six-sigma, DoE, reliability and other statistics-based process improvements.

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4-3-1 Weibull distribution for PCT

The experimental result and time interval are fitted into the Minitab software and use the

Reliability/ Survival function to analysis these data, the distribution is drew, and then the

shape parameter (β) and characteristic life time (η), hazard rate (h) can be estimated.

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Fig. 4-2 Weibull distribution for PCT Cell-2

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Fig. 4-4 Weibull distribution for PCT Cell-4

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Fig. 4-6 Weibull distribution for PCT Cell-6

The shape parameter (β) for all 6 cells are larger than one, it means the distribution that

can meet the Weibull normal distribution. The shape parameter and the scale parameter for 6

cells are summarized as following table.

Cell 1 Cell 2 Cell 3 Cell 4 Cell 5 Cell 6

Shape parameter (β) 2.69 2.26 3.69 2.9 3.05 2.78

Scale parameter (η) 2720 1049 1131 3648 2797 3958

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4-3-2 Weibull distribution for TCT

Following the same method, we input the failure result and time interval into the Minitab

software and use the Reliability/ Survival function to analysis these data, the shape parameter

(β) and characteristic life time (η), hazard rate (h) can be estimated.

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Fig. 4-8 Weibull distribution for TCT Cell-2

數據

Fig. 4-6 Weibull distribution for PCT Cell-6  Fig. 4-7 Weibull distribution for TCT Cell-1  Fig
Fig. 1-6 Illustration of die sawing process
Fig. 1-7 Illustration of die bonding process
Fig. 1-8 IR reflow profile
+7

參考文獻

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