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單晶CVD薄膜和熔化成長法製程中之不穩定熱流與使其穩定研究---子計畫一:水平單晶成長之不穩定熱流實驗與數值模擬研究(III)

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(2)   !"#$%&'$()*+*(,-.'$%&/*+0).,1234(5)*6+$7+28*(,9$*):%*(53$%&( 92%&;2()*+<%28)=230&(>+$%15)*+  ?@AB-0CDEFFGFE!EHHIEHFI JKLMBCN O C PQ CD O D P RSTBUVWXYZ[\]^_`   abcde Keywords B Thin Film Single Crystal, Buoyancy, Vortex Flow ffOghijklmn o lmpqrsltuvw xyz{b|}~ €‚ƒ„ €†‡noˆlm‰pŠ‹Œ‹q. ¦§¨B©ªa|}a«†‡. ˆa¬­®wB  © ª   ¯ ° ±  IC  ² ³ ´ w component —™µg„¶² L˜´ w·¸¹—jºZw»¼n½¾¿ © ªwÀÁbj Horizontal Vertical CVD k×ĚÅƗÇÈ

(3) „wÉʗ„¶ËÌ©ªw Defects ͯÎenfÏOLwRe®wп Ñqr CVD ©ªÀÁb—­ºZ |}ÒÓÔ

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(5)   Þßn. Abstract. Ïa†rà. rz{bslvxyŽ. €‚ƒ„ €†‡n†‘’x y{bw Opposing Buoyancy “”‘•– Mixed—Transverse and Longitudinal Rolls— ˜™šw› œnžslvŸx y‰j”‘w

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(7) ¡¤¥n. A combined numerical and experimental study was carried out in this project to investigate the effects of opposing buoyancy and the bottom plate inclination on the temporal and spatial vortex structures in a bottom heated flat duct inclined slightly from the horizontal. The results obtained from this study clearly reveal that the mixed, transverse and longitudinal vortex rolls are substantially destablized and destroyed by the opposing buoyancy. The resulting vortex flow is rather irregular . But the tapering of the flat duct by the bottom plate inclination stablizes the flow.. á­âãwŠ‹aŒ ‹—äåWÊæçè{xy˜ Opposing Buoyancy £v —«w €†‡ééê •–—žæ Transverse Rolls ëìí¿ — ™ Convection Speed  Oscillation Frequency j îïxy¢w»¼nŽ¿ Vortex Flow † ‡ ð š è w ñ ò — ‰ Oscillation Frequency “šóÙôfõj Frequency Peak í¿nö÷—¿£vxy¢ —Longitudinal Rolls øùúšûnlüw †ýewþ¶ nŽæslvŸ xy —g £v—“”‘wË. 1.

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(9)  —lü†½ Ғn. 3.Michael E. Coltrin, Robert J. Kee & James A. Miller, 1986, A mathematical model of silicon chemical vapor deposition, Solid-State Science and Technology 133, No. 6, 1206-1213. 4.Jalil Ouazzani, Kuan-Cheng Chiu & Franz Rosenberger, 1988, On the 2D modelling of horizontal CVD reactors and its limitaions, Journal of Crystal Growth 91, 497-508. 5.Greg Evans & Ralph Greif, 1989, A study of traveling wave instabilities in a horizontal channel flow with applications to chemical vapor position, Int. J. Heat Mass Transfer 32, 895-911. 6.Harry Moffat & Klavs F. Jensen, 1986, Complex flow phenomena in MOCVD reactors, Journal of Crystal Growth, 108-119. 7.H. K. Moffat & K. F. Jensen, 1988, Three-dimensional flow effects in silicon CVD in Horizontal channel, Solid-State Science and Technology 135, No. 2, 459-471. 8.Greg Evans & Ralph Grief, 1991, Unsteady three-dimensional mixed convection in a heated Horizontal channel with applications to chennal vapor deposition, Int. J. Heat Mass Transfer 34, No. 8, 2039-2051.  $aB  . a fOgw„¶xyz{b ÏÃRew Vortex Flow Structures ½¾ï. Opposing Buoyancies »¼—™ šw €

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(11)  j› ¡n „ ¶ Horizorntal CVD Growth of Single Crystal Òڄw} Îew    — Ö Ž·   É  ö î Vortex Flow w !n  "ac#B  1.Franz Rosenberger, 1980, Fluid dynamic in crystal growth from vapors, PCHPhysicoChemical Hydrodynamics 1,3-26. 2.Klavs F. Jensen, 1987, Micro-reaction engineering applications of reaction engineering to process of electronic and photonic materials, Chemical engineering Science. 42, No. 5, 923-958.. 2.

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