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[PDF] Top 20 Contact Resistance in Nanocrystalline Silicon Thin-Film Transistors

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Contact Resistance in Nanocrystalline Silicon Thin-Film Transistors

Contact Resistance in Nanocrystalline Silicon Thin-Film Transistors

... encountered in fabricating the conventional coplanar top source/drain ...crystallinity in the channel but does not conduct well electrically, with a room-temperature dark conductivity of ...shunt ... See full document

5

Double-metal-gate nanocrystalline Si thin film transistors with flexible threshold voltage controllability

Double-metal-gate nanocrystalline Si thin film transistors with flexible threshold voltage controllability

... damage in the S/D regions, and the succeeding activation process requires a high thermal ...low contact resistance could be realized by in-situ doping in the nc-Si:H thin ... See full document

6

Channel Film Thickness Effect of Low-Temperature Polycrystalline-Silicon Thin-Film Transistors

Channel Film Thickness Effect of Low-Temperature Polycrystalline-Silicon Thin-Film Transistors

... channel film thickness on LTPS-TFTs have been investigated in this ...series resistance effects have been ...channel film thickness have lower S/D series resistance and large grain size ... See full document

5

Low-Temperature Polycrystalline-Silicon Tunneling Thin-Film Transistors With MILC

Low-Temperature Polycrystalline-Silicon Tunneling Thin-Film Transistors With MILC

... dummy gate is formed to block unnecessary implanted dopant from the channel region beneath the oxide dummy gate. The T-TFTs are implanted using boron and phosphorous with a dose of 5 × 10 15 cm −2 as source and drain, ... See full document

3

Reliability of laser-activated low-temperature polycrystalline silicon thin-film transistors

Reliability of laser-activated low-temperature polycrystalline silicon thin-film transistors

... follows. Silicon wafers coated with a 500 nm thermal oxide were used as the starting ...laser-crystallized in vacuum at room ...h in a nitrogen ambient ...reduction in source/drain ... See full document

4

Electrical enhancement of polycrystalline silicon thin-film transistors using fluorinated silicate glass passivation layer

Electrical enhancement of polycrystalline silicon thin-film transistors using fluorinated silicate glass passivation layer

... tively. Since the FSG film shows poor thermal stability and the fluorine atoms may diffuse out of the FSG film during post thermal annealing, a 100-nm-thick SiN x capping layer on the FSG film was successively deposited by ... See full document

7

Thin-film transistors with polycrystalline silicon films prepared by two-step rapid thermal annealing

Thin-film transistors with polycrystalline silicon films prepared by two-step rapid thermal annealing

... at 600 ◦ C for the LT case. After opening the contact holes, the Al films were evaporated and then patterned. For evalua- tion of the simple effects of the different annealing processes on the TFT characteristics, ... See full document

4

Laser Direct Patterning of Organic Dielectric Passivation Layer for Fabricating Amorphous Silicon Thin-Film Transistors

Laser Direct Patterning of Organic Dielectric Passivation Layer for Fabricating Amorphous Silicon Thin-Film Transistors

... 2011 In this study, a laser direct patterning process application in benzocyclobutene (BCB) organic dielectric passivation-based amorphous silicon (a- Si) thin film transistor (TFT) ... See full document

5

Simple source/drain contact structure for solution-processed n-channel fullerene thin-film transistors

Simple source/drain contact structure for solution-processed n-channel fullerene thin-film transistors

... the contact resistances at the source/ drain (S/D) contacts in solution-processed n-channel organic thin-film transistors ...molecules in the blends underwent chemical reactions with the ... See full document

5

Performance Enhancement of Thin-Film Transistors With Suspended Poly-Si Nanowire Channels by Embedding Silicon Nanocrystals in Gate Nitride

Performance Enhancement of Thin-Film Transistors With Suspended Poly-Si Nanowire Channels by Embedding Silicon Nanocrystals in Gate Nitride

... are in intimate contact with the gate nitride, which would retard the detachment of suspended NWs from the gate nitride ...drop in the reverse sweeping with subthreshold swing (SS) of ∼49 ...existing ... See full document

3

The Linear Combination Model for the Degradation of Amorphous Silicon Thin Film Transistors under Drain AC Stress

The Linear Combination Model for the Degradation of Amorphous Silicon Thin Film Transistors under Drain AC Stress

... mentioned in the ON region drain AC stress section could also be used to explain this ...effective resistance for hole supply is very high for negative gate ...change in the a-Si:H ... See full document

9

Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the Cu/CuMg as source/drain metal

Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the Cu/CuMg as source/drain metal

... layers. In contrast, electrons are the majority carriers of off-state current for the a-Si: H TFT under light illumination, since electron mobility is much higher than that of ...arisen in that the Schottky ... See full document

4

High voltage characteristics of junctionless poly-silicon thin film transistors

High voltage characteristics of junctionless poly-silicon thin film transistors

... whole film like a ...state, in which the current flows from source to drain through the whole cross-section of silicon film and the behavior of JL devices indeed acts as a ...junction. ... See full document

4

Reliability of passivated P-type polycrystalline silicon thin film transistors

Reliability of passivated P-type polycrystalline silicon thin film transistors

... It can be seen that after plasma treatment, the turn on current, subthreshold swing, threshold voltage and leakage current (V~,>0 for p-type TFTs) are significantl[r] ... See full document

5

CHARACTERISTICS OF POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH THIN OXIDE NITRIDE GATE STRUCTURES

CHARACTERISTICS OF POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH THIN OXIDE NITRIDE GATE STRUCTURES

... In contrast to conventional TFTs with pure thermal oxides as gates, TFTs with 0/N gate structures can attain a higher ON/OFF current ratio and carrier mobility by reducing the equivalent[r] ... See full document

5

Origin of hysteresis in current-voltage characteristics of polycrystalline silicon thin-film transistors

Origin of hysteresis in current-voltage characteristics of polycrystalline silicon thin-film transistors

... channel. In the PD case, under the process of FS, the energy bands near the semiconductor surface 共the depletion region兲 are bent downward ...3共a兲兴. In the neutral region 共x⬎W dep 兲, there are many empty ... See full document

7

Enhanced degradation in polycrystalline silicon thin-film transistors under dynamic hot-carrier stress

Enhanced degradation in polycrystalline silicon thin-film transistors under dynamic hot-carrier stress

... degradation in the polysilicon thin-film transistors under dynamic hot-carrier ...) in static stress, m max in dynamic stress is initially increased due to the channel short- ... See full document

3

Characterization of anodic aluminum oxide film and its application to amorphous silicon thin film transistors

Characterization of anodic aluminum oxide film and its application to amorphous silicon thin film transistors

... Current density versus anodization time at 100 V anodization voltage showing the current density decreases as the anodization time increases at various pH values.. applie[r] ... See full document

7

Dimensional effects on the reliability of polycrystalline silicon thin-film transistors

Dimensional effects on the reliability of polycrystalline silicon thin-film transistors

... In spite of the increase of the threshold voltage, the great increase of acceptor-like trap density after stress enhances the kink effect and then dominates the [r] ... See full document

5

Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films

Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films

... sistor (TFT) has been fabricated using the polycrystalline silicon (poly-Si) film as-deposited by ultrahigh vacuum chemical vapor deposition (UHV/CVD) and polished by chemical[r] ... See full document

3

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