[PDF] Top 20 Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications
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Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications
... spectively. Very high capacitance density of 44 and 49 fF/ m 2 or capacitance-equivalent thickness 共CET兲 of ...A/cm 2 , re- spectively. Such small CET is useful ... See full document
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Very high density RF MIM capacitors (17 fF/mu m(2) using high-kappa Al2O3 doped Ta2O5 dielectrics
... proper high- dielectric requires not only higher- but also process compatible to existing VLSI backend ...Thus, high quality dielectric must be formed at a very low temper- ature of 400 limited by ... See full document
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Very high-density (23 fF/mu m(2)) RF MIM capacitors using high-k TaTiO as the dielectric
... display very high- ( ...limitation for device ...show capacitors with low leakage current and without crystallization, even after backend ...a high density of 23 fF ... See full document
3
RFIC TaN/SrTio(3)/TaN MIM capacitors with 35 fF/mu m(2) capacitance density
... Such high capacitance density provides a 35 times area reduction than the 1 fF m value provided by foundry ...obtained for the STO MIM capac- itor, which is important for ... See full document
3
High-performance SrTiO3 MIM capacitors for analog applications
... current for the N + -treated ...itance density, and overall κ ...STO for the treated ...trap density from the oxygen deficiency as shown by ... See full document
8
High-density RF MIM capacitors using high-k La2O3 dielectrics
... current density vs. voltage (J-V) characteristics of La 2 O 3 MIM ca- ...current density of 22 nm La 2 O 3 capacitors at ⫺1 V is ⬍10 ⫺5 A/cm 2 ...relatively ... See full document
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Very high density RF MIM capacitor compatible with VLSI
... record high-density (20 fF/µm 2 ) RF MIM capacitors, using TiTaO as the dielectric, where the TiTaO has a high-κ value of ~45, which is greater than the κ=25 ... See full document
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A high-density MIM capacitor (13 fF/mu m(2)) using ALD HfO2 dielectrics
... (MIM) capacitors with a dif- ferent thickness of HfO 2 have been ...capacitance density and voltage coefficients of capac- itance (VCCs) increase with decreasing the HfO 2 ...HfO ... See full document
3
High-density MIM capacitors using Al2O3 and AlTiOx dielectrics
... Al 2 O 3 and AlTiO MIM capacitors from IF (100 KHz) to RF (20 GHz) frequency ...Record high capacitance density of 0.5 and 1.0 F/cm 2 are obtained for Al ... See full document
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RF, DC, and reliability characteristics of ALD HfO2-Al2O3 laminate MIM capacitors for Si RF IC applications
... Laminate MIM Capacitor To stringently evaluate leakage characteristics of the laminate MIM capacitors, – characteristics are measured at the max- imum operating temperature 125 ...current ... See full document
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Lanthanide (Tb)-doped HfO2 for high-density MIM capacitors
... a MIM capacitor module with a ca- pacitance density ranging from 1 to 2 fF/ m using SiO - or Si N -based dielectrics ...require capacitors with a capacitance density ... See full document
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High-density MIM capacitors with HfO(2) dielectrics
... HfO 2 MIM capacitors with different metal top electrodes have been ...The MIM capacitor with Al top electrode exhibits the lowest capacitance density, while that with Cu top electrode ... See full document
5
High density and low leakage current in TiO(2) MIM capacitors processed at 300 degrees C
... Ir/TiO 2 /TaN metal–insulator–metal ca- pacitors processed at only 300 ◦ C, which show a capacitance density of 28 fF/µm 2 and a leakage current of 3 × 10 −8 (25 ◦ C) or 6 × 10 ... See full document
3
PVD HfO2 for high-precision MIM capacitor applications
... (MIM) capacitors are fabri- cated using sputtered HfO 2 with Ta and TaN for top and bottom electrodes, ...respectively. High-capacitance densities from 4.7 to 8.1 fF m ... See full document
3
High Performance Ir/TiPrO/TaN MIM Capacitors for Analog ICs Application
... Ir/TiPrO/TaN MIM Capacitors for Analog ICs Application ...demonstrate high quality material TiPrO and high density Ti x Pr 1-x O ...(MIM) capacitors using ... See full document
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High-Performance MIM Capacitors Using a High-kappa TiZrO Dielectric
... of MIM capacitors, 16 and therefore a trade-off between the ⌬E C and values is ...a high temperature is above the maximum al- lowable temperature of 400°C for very large-scale ... See full document
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High-kappa Ir/TiTaO/TaN capacitors suitable for analog IC applications
... of high- dielectrics for the MIM capacitors is the only viable ...needed for high capacitance density increases the leakage current and degrades the capacitor’s voltage ... See full document
3
High-performance MIM capacitor using ALD high-k HfO2-Al2O3 laminate dielectrics
... demonstrated high performance metal–insulator–metal (MIM) capacitors with HfO 2 –Al 2 O 3 laminate dielectric using atomic layer deposition (ALD) ...laminate MIM capacitor ... See full document
3
RF MIM capacitors using high-K Al2O3 and AlTiOx dielectrics
... In sharp contrast, the A1203 MIM capacitor has good integrity of low DC leakage current, small capacitance reduction, low loss tangent, and high reliability that can [r] ... See full document
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SrTiO3-SiO2 oxide films for possible high-k gate dielectric applications
... of SrTiO 3 –SiO 2 high-k dielectric oxides were deposited on p-Si substrate by sputtering from the targets made by SrTiO 3 and SiO 2 powder ...used for ... See full document
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