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[PDF] Top 20 Characterization and SPICE Modeling of High Voltage LDMOS

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Characterization and SPICE Modeling of High Voltage LDMOS

Characterization and SPICE Modeling of High Voltage LDMOS

... 試結構翠取出來的 MOS 模型以及藉由數值分析的 Vk 公式推導之 R D 電阻模型。 最後,LDMOS 產生的自我熱效應( Self-Heating Effect )將會藉由 TCAD 模擬來探 討元件內部溫度分佈情況,為了更進一步的瞭解 SHE,我們建立一套微秒暫態量 測電路(micro-second transient measurement circuit) ,藉著此電路的輔助,我們將 ... See full document

74

高壓元件LDMOS可靠度分析與SPICE模型建立

高壓元件LDMOS可靠度分析與SPICE模型建立

... 高壓元件 LDMOS 之特性分析與 SPICE 模型建立 Investigation of Spice Modeling and Reliability Issues in High Voltage LDMOS 研 究 生 : 杜冠潔 Student : Kuan-Chieh Tu 指導教授 : 汪大暉 博士 ... See full document

13

Fast Transistor Threshold Voltage Measurement Method for High-Speed, High-Accuracy Advanced Process Characterization

Fast Transistor Threshold Voltage Measurement Method for High-Speed, High-Accuracy Advanced Process Characterization

... the voltage overshoot might damage or breakdown the ...Pseudocode of V t measurement by OP-based ...transistor characterization during technology development and manufacture monitoring ... See full document

12

Characterization and Modeling of on-chip spiral inductors for Si RFICs

Characterization and Modeling of on-chip spiral inductors for Si RFICs

... development of process integration, device characterization, TCAD simula- tion and reliability/failure analysis of ...charge of yield enhancement and technology evaluation ... See full document

11

Improving Breakdown Voltage of LDMOS Using a Novel Cost Effective Design

Improving Breakdown Voltage of LDMOS Using a Novel Cost Effective Design

... Lin, and T. Wang, “Impact of self-heating effect on hot carrier degradation in high-voltage LDMOS,” in IEDM ...Institute of Electronics Engineering, National Chiao Tung ... See full document

5

Characterization of SOA in Time Domain and the Improvement Techniques for Using in High-Voltage Integrated Circuits

Characterization of SOA in Time Domain and the Improvement Techniques for Using in High-Voltage Integrated Circuits

... breakdown voltage from being affected by the dots, the distance between the dotted contact and the drift region has to be larger than the minimum allowable channel length ..., and the quantity ... See full document

9

Statistical Characterization and Modeling of the Temporal Evolutions of Delta V-t Distribution in NBTI Recovery in Nanometer MOSFETs

Statistical Characterization and Modeling of the Temporal Evolutions of Delta V-t Distribution in NBTI Recovery in Nanometer MOSFETs

... Gusev, and E. Cartier, “Threshold voltage insta- bilities in high-k gate dielectric stacks,” IEEE ...Saha, and M. A. Alam, “On the physical mechanism of NBTI in silicon oxynitride ... See full document

7

Impact of self-heating effect on hot carrier degradation in high-voltage LDMOS

Impact of self-heating effect on hot carrier degradation in high-voltage LDMOS

... 3(a) shows a normalized drain current (Id/W) versus Vd in small and large gate width devices in DC (Agilent.. G_ 4156) measurement.[r] ... See full document

4

SPICE compact modeling of PD-SOI CMOS devices

SPICE compact modeling of PD-SOI CMOS devices

... This PD-SO1 SPICE perforins transient simulation of tlie write-access critical path in an SRAM cornposed of 42 P D SO1 CMOS devices without convergence problerns, which are[r] ... See full document

4

Dependence of breakdown voltage on drift length and linear doping gradients in SOI RESURF LDMOS devices

Dependence of breakdown voltage on drift length and linear doping gradients in SOI RESURF LDMOS devices

... region of lateral power devices in partial SOI technology in order to achieve breakdown voltage above 200V for both off-state and on-state ...operations. LDMOS structure incorporating ... See full document

2

Characterization and modeling of metal-film microbolometer

Characterization and modeling of metal-film microbolometer

... Furthermore, an effective method of ambient temperature compensation, proposed previously by our laboratory, is demonstrated both experimentally and by simulation using [r] ... See full document

9

Characterization and Modeling of on-chip inductor substrate coupling effect

Characterization and Modeling of on-chip inductor substrate coupling effect

... Moreover, a macro model is presented for modeling quality factor and inductance of on-chip spiral inductor and associated neighboring inductor's coupling noise effect..[r] ... See full document

4

A Study of Modeling Development for High Voltage DMOS Transistors by Using Fuzzy Theory and Neural Network 陳盈德、陳勝利

A Study of Modeling Development for High Voltage DMOS Transistors by Using Fuzzy Theory and Neural Network 陳盈德、陳勝利

... density and to reduce the product ...performance of actual device have some difference as compare with the ideal ...the modeling development of the semiconductor device has become more ... See full document

2

Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist

Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist

... state and solution pH con- ...Mn and Zn in cleaning ...SPM, and BOE, are commonly applied in wafer ...Mixtures of HF and NH 4 F, known as BOE, are used for etching oxide film to avoid ... See full document

6

LDMOS Transistor High-Frequency Performance Enhancements by Strain

LDMOS Transistor High-Frequency Performance Enhancements by Strain

... conventional LDMOS. However, a comprehensive analysis of device performance enhancements under strain was not ...existence of a drift region in LDMOS, the strain effects on the LDMOS ... See full document

3

High-voltage and high-temperature applications of DTMOS with reverse Schottky barrier on substrate contacts

High-voltage and high-temperature applications of DTMOS with reverse Schottky barrier on substrate contacts

... Lee, and Tiao-Yuan Huang, Fellow, IEEE Abstract—In this letter, for the first time, application of dynamic threshold voltage MOSFET (DTMOS) with reverse Schottky bar- rier on substrate contacts ... See full document

3

Physics and characterization of various hot-carrier degradation modes in LDMOS by using a three-region charge-pumping technique

Physics and characterization of various hot-carrier degradation modes in LDMOS by using a three-region charge-pumping technique

... Abstract—Degradation of lateral diffused MOS transistors in various hot-carrier stress modes is ...) and bulk oxide charge Q ox creation in the channel and in the drift regions ...rates of N ... See full document

6

Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrate

Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrate

... removal of contaminants. For metallic contaminants, the degree of contamination depends on the thermodynamics of surface state and the cleaning ...type and the cleaning solution ... See full document

10

Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresist

Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresist

... Type II is H20 or solvent evaporation dominates, while the effect of impurity migration is not significant; therefore, the diffusion ratio decreases as temperature goes up.. In the.[r] ... See full document

9

Modeling of the Operating Characteristics of Thin Film Diamond Electronic Devices Using SPICE 張永平、李世鴻

Modeling of the Operating Characteristics of Thin Film Diamond Electronic Devices Using SPICE 張永平、李世鴻

... combination of excellent properties making it a promising candidate for high-temperature and high power ...applications of diamond thin film demand a better understanding of ... See full document

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